GB1481099A - Methods of optically aligning two objects - Google Patents

Methods of optically aligning two objects

Info

Publication number
GB1481099A
GB1481099A GB40804/74A GB4080474A GB1481099A GB 1481099 A GB1481099 A GB 1481099A GB 40804/74 A GB40804/74 A GB 40804/74A GB 4080474 A GB4080474 A GB 4080474A GB 1481099 A GB1481099 A GB 1481099A
Authority
GB
United Kingdom
Prior art keywords
wafer
pattern
alignment
photo
aligning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB40804/74A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1481099A publication Critical patent/GB1481099A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W46/00—Marks applied to devices, e.g. for alignment or identification
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W46/00—Marks applied to devices, e.g. for alignment or identification
    • H10W46/501—Marks applied to devices, e.g. for alignment or identification for use before dicing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
GB40804/74A 1973-10-11 1974-09-19 Methods of optically aligning two objects Expired GB1481099A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US405347A US3885877A (en) 1973-10-11 1973-10-11 Electro-optical fine alignment process

Publications (1)

Publication Number Publication Date
GB1481099A true GB1481099A (en) 1977-07-27

Family

ID=23603326

Family Applications (1)

Application Number Title Priority Date Filing Date
GB40804/74A Expired GB1481099A (en) 1973-10-11 1974-09-19 Methods of optically aligning two objects

Country Status (7)

Country Link
US (1) US3885877A (enExample)
JP (1) JPS54152B2 (enExample)
CA (1) CA1012656A (enExample)
DE (1) DE2439987A1 (enExample)
FR (1) FR2247758B1 (enExample)
GB (1) GB1481099A (enExample)
IT (1) IT1020143B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2151350A (en) * 1983-11-25 1985-07-17 Vs Eng Ltd Sensing arrangement

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3989385A (en) * 1974-09-16 1976-11-02 International Business Machines Corporation Part locating, mask alignment and mask alignment verification system
US4039370A (en) * 1975-06-23 1977-08-02 Rca Corporation Optically monitoring the undercutting of a layer being etched
DE2539206A1 (de) * 1975-09-03 1977-03-17 Siemens Ag Verfahren zur automatischen justierung von halbleiterscheiben
DD136671A1 (de) * 1976-04-29 1979-07-18 Stephan Hartung Steuermechanismus fuer die positionierung eines objektes,insbesondere zur feinpositionierung von substratscheiben
DE2622283A1 (de) * 1976-05-19 1977-12-08 Bosch Gmbh Robert Verfahren zur lokalisierung eines festkoerperplaettchens und festkoerperplaettchen zur durchfuehrung des verfahrens
DE2723902C2 (de) * 1977-05-26 1983-12-08 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Parallelausrichtung und Justierung der Lage einer Halbleiterscheibe relativ zu einer Bestrahlungsmaske bei der Röntgenstrahl-Fotolithografie
JPS5856402B2 (ja) * 1978-08-30 1983-12-14 大日本スクリ−ン製造株式会社 位置決め用センサ−
US4353087A (en) * 1979-03-12 1982-10-05 The Perkin-Elmer Corporation Automatic mask alignment
US4232969A (en) * 1979-05-30 1980-11-11 International Business Machines Corporation Projection optical system for aligning an image on a surface
DE3023131A1 (de) * 1979-06-20 1981-01-08 Canon Kk Verfahren zum herstellen eines farbfilters
DE3123031A1 (de) * 1981-06-10 1983-01-05 Siemens AG, 1000 Berlin und 8000 München Verfahren zur kennzeichnung von halbleiterchips und kennzeichenbarer halbleiterchip
US4406949A (en) * 1981-07-13 1983-09-27 Mostek Corporation Method and apparatus for aligning an integrated circuit
EP0083710B1 (en) * 1982-01-06 1985-08-28 International Business Machines Corporation Alignment system for lithographic proximity printing
DE3219388C2 (de) * 1982-05-24 1986-05-22 Dipl.-Ing. Bruno Richter GmbH & Co. Elektronische Betriebskontroll-Geräte KG, 8602 Stegaurach Optisch-elektrische Meßeinrichtung zum Messen der Lage und/oder der Abmessung von Gegenständen
JPS59224123A (ja) * 1983-05-20 1984-12-17 Oki Electric Ind Co Ltd ウエハアライメントマ−ク
JPS603620A (ja) * 1983-06-21 1985-01-10 Mitsubishi Electric Corp 微細パタ−ンの形成方法
JPS6052021A (ja) * 1983-08-31 1985-03-23 Canon Inc 位置検出方法
FR2554224B1 (fr) * 1983-10-27 1987-08-28 Telecommunications Sa Systeme de reperage de la position angulaire d'un dispositif mecanique
US4600834A (en) * 1983-10-31 1986-07-15 The United States Of America As Represented By The United States Department Of Energy Precision zero-home locator
US4663534A (en) * 1984-03-08 1987-05-05 Canon Kabushiki Kaisha Position detecting device utilizing selective outputs of the photodetector for accurate alignment
US4771180A (en) * 1985-10-11 1988-09-13 Matsushita Electric Industrial Co. Ltd. Exposure apparatus including an optical system for aligning a reticle and a wafer
JPH01169926A (ja) * 1987-12-24 1989-07-05 Toshiba Corp アライメント方法
GB9307710D0 (en) * 1993-04-14 1993-06-02 Rothmans Benson & Hedges Smoking apparatus-l
GB9311898D0 (en) * 1993-06-09 1993-07-28 Univ Bristol Improvements in or relating to monitoring the spatial position and orientation of an article
WO2001009927A1 (en) * 1999-07-28 2001-02-08 Infineon Technologies North America Corp. Semiconductor structures and manufacturing methods
US7650029B2 (en) * 2004-11-23 2010-01-19 Hewlett-Packard Development Company, L.P. Multiple layer alignment sensing
WO2011153016A1 (en) * 2010-06-04 2011-12-08 Advantech Global, Ltd. Shadow mask alignment using coded apertures
US9580792B2 (en) 2010-06-04 2017-02-28 Advantech Global, Ltd Shadow mask alignment using variable pitch coded apertures
US9122172B2 (en) * 2010-06-04 2015-09-01 Advantech Global, Ltd Reflection shadow mask alignment using coded apertures

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1108925B (de) * 1958-08-15 1961-06-15 Continental Elektro Ind Ag Einrichtung zur Kontrolle des Durchhanges oder der Lage von Wellen
US3622319A (en) * 1966-10-20 1971-11-23 Western Electric Co Nonreflecting photomasks and methods of making same
US3802940A (en) * 1969-08-18 1974-04-09 Computervision Corp Enhanced contrast semiconductor wafer alignment target and method for making same
US3796497A (en) * 1971-12-01 1974-03-12 Ibm Optical alignment method and apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2151350A (en) * 1983-11-25 1985-07-17 Vs Eng Ltd Sensing arrangement

Also Published As

Publication number Publication date
IT1020143B (it) 1977-12-20
US3885877A (en) 1975-05-27
DE2439987A1 (de) 1975-04-17
FR2247758B1 (enExample) 1976-10-22
FR2247758A1 (enExample) 1975-05-09
CA1012656A (en) 1977-06-21
JPS5067584A (enExample) 1975-06-06
DE2439987C2 (enExample) 1982-05-06
JPS54152B2 (enExample) 1979-01-06

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee