FR2247758A1 - - Google Patents

Info

Publication number
FR2247758A1
FR2247758A1 FR7428148A FR7428148A FR2247758A1 FR 2247758 A1 FR2247758 A1 FR 2247758A1 FR 7428148 A FR7428148 A FR 7428148A FR 7428148 A FR7428148 A FR 7428148A FR 2247758 A1 FR2247758 A1 FR 2247758A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7428148A
Other languages
French (fr)
Other versions
FR2247758B1 (enExample
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2247758A1 publication Critical patent/FR2247758A1/fr
Application granted granted Critical
Publication of FR2247758B1 publication Critical patent/FR2247758B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W46/00—Marks applied to devices, e.g. for alignment or identification
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W46/00—Marks applied to devices, e.g. for alignment or identification
    • H10W46/501—Marks applied to devices, e.g. for alignment or identification for use before dicing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
FR7428148A 1973-10-11 1974-08-08 Expired FR2247758B1 (enExample)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US405347A US3885877A (en) 1973-10-11 1973-10-11 Electro-optical fine alignment process

Publications (2)

Publication Number Publication Date
FR2247758A1 true FR2247758A1 (enExample) 1975-05-09
FR2247758B1 FR2247758B1 (enExample) 1976-10-22

Family

ID=23603326

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7428148A Expired FR2247758B1 (enExample) 1973-10-11 1974-08-08

Country Status (7)

Country Link
US (1) US3885877A (enExample)
JP (1) JPS54152B2 (enExample)
CA (1) CA1012656A (enExample)
DE (1) DE2439987A1 (enExample)
FR (1) FR2247758B1 (enExample)
GB (1) GB1481099A (enExample)
IT (1) IT1020143B (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2349405A1 (fr) * 1976-04-29 1977-11-25 Zeiss Jena Veb Carl Mecanisme de commande pour le positionnement d'un objet, en particulier pour le positionnement precis de plaques supports
FR2352309A1 (fr) * 1976-05-19 1977-12-16 Bosch Gmbh Robert Procede pour la localisation d'une plaquette solide et plaquette solide pour l'execution du procede
FR2392421A1 (fr) * 1977-05-26 1978-12-22 Siemens Ag Procede pour ajuster une pastille semi-conductrice par rapport a un masque d'irradiation lors de la photolithographie aux rayons x

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3989385A (en) * 1974-09-16 1976-11-02 International Business Machines Corporation Part locating, mask alignment and mask alignment verification system
US4039370A (en) * 1975-06-23 1977-08-02 Rca Corporation Optically monitoring the undercutting of a layer being etched
DE2539206A1 (de) * 1975-09-03 1977-03-17 Siemens Ag Verfahren zur automatischen justierung von halbleiterscheiben
JPS5856402B2 (ja) * 1978-08-30 1983-12-14 大日本スクリ−ン製造株式会社 位置決め用センサ−
US4353087A (en) * 1979-03-12 1982-10-05 The Perkin-Elmer Corporation Automatic mask alignment
US4232969A (en) * 1979-05-30 1980-11-11 International Business Machines Corporation Projection optical system for aligning an image on a surface
DE3023131A1 (de) * 1979-06-20 1981-01-08 Canon Kk Verfahren zum herstellen eines farbfilters
DE3123031A1 (de) * 1981-06-10 1983-01-05 Siemens AG, 1000 Berlin und 8000 München Verfahren zur kennzeichnung von halbleiterchips und kennzeichenbarer halbleiterchip
US4406949A (en) * 1981-07-13 1983-09-27 Mostek Corporation Method and apparatus for aligning an integrated circuit
EP0083710B1 (en) * 1982-01-06 1985-08-28 International Business Machines Corporation Alignment system for lithographic proximity printing
DE3219388C2 (de) * 1982-05-24 1986-05-22 Dipl.-Ing. Bruno Richter GmbH & Co. Elektronische Betriebskontroll-Geräte KG, 8602 Stegaurach Optisch-elektrische Meßeinrichtung zum Messen der Lage und/oder der Abmessung von Gegenständen
JPS59224123A (ja) * 1983-05-20 1984-12-17 Oki Electric Ind Co Ltd ウエハアライメントマ−ク
JPS603620A (ja) * 1983-06-21 1985-01-10 Mitsubishi Electric Corp 微細パタ−ンの形成方法
JPS6052021A (ja) * 1983-08-31 1985-03-23 Canon Inc 位置検出方法
FR2554224B1 (fr) * 1983-10-27 1987-08-28 Telecommunications Sa Systeme de reperage de la position angulaire d'un dispositif mecanique
US4600834A (en) * 1983-10-31 1986-07-15 The United States Of America As Represented By The United States Department Of Energy Precision zero-home locator
GB2151350A (en) * 1983-11-25 1985-07-17 Vs Eng Ltd Sensing arrangement
US4663534A (en) * 1984-03-08 1987-05-05 Canon Kabushiki Kaisha Position detecting device utilizing selective outputs of the photodetector for accurate alignment
US4771180A (en) * 1985-10-11 1988-09-13 Matsushita Electric Industrial Co. Ltd. Exposure apparatus including an optical system for aligning a reticle and a wafer
JPH01169926A (ja) * 1987-12-24 1989-07-05 Toshiba Corp アライメント方法
GB9307710D0 (en) * 1993-04-14 1993-06-02 Rothmans Benson & Hedges Smoking apparatus-l
GB9311898D0 (en) * 1993-06-09 1993-07-28 Univ Bristol Improvements in or relating to monitoring the spatial position and orientation of an article
WO2001009927A1 (en) * 1999-07-28 2001-02-08 Infineon Technologies North America Corp. Semiconductor structures and manufacturing methods
US7650029B2 (en) * 2004-11-23 2010-01-19 Hewlett-Packard Development Company, L.P. Multiple layer alignment sensing
WO2011153016A1 (en) * 2010-06-04 2011-12-08 Advantech Global, Ltd. Shadow mask alignment using coded apertures
US9580792B2 (en) 2010-06-04 2017-02-28 Advantech Global, Ltd Shadow mask alignment using variable pitch coded apertures
US9122172B2 (en) * 2010-06-04 2015-09-01 Advantech Global, Ltd Reflection shadow mask alignment using coded apertures

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1108925B (de) * 1958-08-15 1961-06-15 Continental Elektro Ind Ag Einrichtung zur Kontrolle des Durchhanges oder der Lage von Wellen
US3622319A (en) * 1966-10-20 1971-11-23 Western Electric Co Nonreflecting photomasks and methods of making same
US3802940A (en) * 1969-08-18 1974-04-09 Computervision Corp Enhanced contrast semiconductor wafer alignment target and method for making same
US3796497A (en) * 1971-12-01 1974-03-12 Ibm Optical alignment method and apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2349405A1 (fr) * 1976-04-29 1977-11-25 Zeiss Jena Veb Carl Mecanisme de commande pour le positionnement d'un objet, en particulier pour le positionnement precis de plaques supports
FR2352309A1 (fr) * 1976-05-19 1977-12-16 Bosch Gmbh Robert Procede pour la localisation d'une plaquette solide et plaquette solide pour l'execution du procede
FR2392421A1 (fr) * 1977-05-26 1978-12-22 Siemens Ag Procede pour ajuster une pastille semi-conductrice par rapport a un masque d'irradiation lors de la photolithographie aux rayons x

Also Published As

Publication number Publication date
IT1020143B (it) 1977-12-20
US3885877A (en) 1975-05-27
DE2439987A1 (de) 1975-04-17
FR2247758B1 (enExample) 1976-10-22
CA1012656A (en) 1977-06-21
JPS5067584A (enExample) 1975-06-06
DE2439987C2 (enExample) 1982-05-06
JPS54152B2 (enExample) 1979-01-06
GB1481099A (en) 1977-07-27

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Legal Events

Date Code Title Description
ST Notification of lapse