JPS54152B2 - - Google Patents
Info
- Publication number
- JPS54152B2 JPS54152B2 JP10785174A JP10785174A JPS54152B2 JP S54152 B2 JPS54152 B2 JP S54152B2 JP 10785174 A JP10785174 A JP 10785174A JP 10785174 A JP10785174 A JP 10785174A JP S54152 B2 JPS54152 B2 JP S54152B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54453—Marks applied to semiconductor devices or parts for use prior to dicing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US405347A US3885877A (en) | 1973-10-11 | 1973-10-11 | Electro-optical fine alignment process |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5067584A JPS5067584A (ja) | 1975-06-06 |
| JPS54152B2 true JPS54152B2 (ja) | 1979-01-06 |
Family
ID=23603326
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10785174A Expired JPS54152B2 (ja) | 1973-10-11 | 1974-09-20 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3885877A (ja) |
| JP (1) | JPS54152B2 (ja) |
| CA (1) | CA1012656A (ja) |
| DE (1) | DE2439987A1 (ja) |
| FR (1) | FR2247758B1 (ja) |
| GB (1) | GB1481099A (ja) |
| IT (1) | IT1020143B (ja) |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3989385A (en) * | 1974-09-16 | 1976-11-02 | International Business Machines Corporation | Part locating, mask alignment and mask alignment verification system |
| US4039370A (en) * | 1975-06-23 | 1977-08-02 | Rca Corporation | Optically monitoring the undercutting of a layer being etched |
| DE2539206A1 (de) * | 1975-09-03 | 1977-03-17 | Siemens Ag | Verfahren zur automatischen justierung von halbleiterscheiben |
| DD136671A1 (de) * | 1976-04-29 | 1979-07-18 | Stephan Hartung | Steuermechanismus fuer die positionierung eines objektes,insbesondere zur feinpositionierung von substratscheiben |
| DE2622283A1 (de) * | 1976-05-19 | 1977-12-08 | Bosch Gmbh Robert | Verfahren zur lokalisierung eines festkoerperplaettchens und festkoerperplaettchen zur durchfuehrung des verfahrens |
| DE2723902C2 (de) * | 1977-05-26 | 1983-12-08 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur Parallelausrichtung und Justierung der Lage einer Halbleiterscheibe relativ zu einer Bestrahlungsmaske bei der Röntgenstrahl-Fotolithografie |
| JPS5856402B2 (ja) * | 1978-08-30 | 1983-12-14 | 大日本スクリ−ン製造株式会社 | 位置決め用センサ− |
| US4353087A (en) * | 1979-03-12 | 1982-10-05 | The Perkin-Elmer Corporation | Automatic mask alignment |
| US4232969A (en) * | 1979-05-30 | 1980-11-11 | International Business Machines Corporation | Projection optical system for aligning an image on a surface |
| DE3023131A1 (de) * | 1979-06-20 | 1981-01-08 | Canon Kk | Verfahren zum herstellen eines farbfilters |
| DE3123031A1 (de) * | 1981-06-10 | 1983-01-05 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur kennzeichnung von halbleiterchips und kennzeichenbarer halbleiterchip |
| US4406949A (en) * | 1981-07-13 | 1983-09-27 | Mostek Corporation | Method and apparatus for aligning an integrated circuit |
| DE3265891D1 (en) * | 1982-01-06 | 1985-10-03 | Ibm | Alignment system for lithographic proximity printing |
| DE3219388C2 (de) * | 1982-05-24 | 1986-05-22 | Dipl.-Ing. Bruno Richter GmbH & Co. Elektronische Betriebskontroll-Geräte KG, 8602 Stegaurach | Optisch-elektrische Meßeinrichtung zum Messen der Lage und/oder der Abmessung von Gegenständen |
| JPS59224123A (ja) * | 1983-05-20 | 1984-12-17 | Oki Electric Ind Co Ltd | ウエハアライメントマ−ク |
| JPS603620A (ja) * | 1983-06-21 | 1985-01-10 | Mitsubishi Electric Corp | 微細パタ−ンの形成方法 |
| JPS6052021A (ja) * | 1983-08-31 | 1985-03-23 | Canon Inc | 位置検出方法 |
| FR2554224B1 (fr) * | 1983-10-27 | 1987-08-28 | Telecommunications Sa | Systeme de reperage de la position angulaire d'un dispositif mecanique |
| US4600834A (en) * | 1983-10-31 | 1986-07-15 | The United States Of America As Represented By The United States Department Of Energy | Precision zero-home locator |
| GB2151350A (en) * | 1983-11-25 | 1985-07-17 | Vs Eng Ltd | Sensing arrangement |
| US4663534A (en) * | 1984-03-08 | 1987-05-05 | Canon Kabushiki Kaisha | Position detecting device utilizing selective outputs of the photodetector for accurate alignment |
| US4771180A (en) * | 1985-10-11 | 1988-09-13 | Matsushita Electric Industrial Co. Ltd. | Exposure apparatus including an optical system for aligning a reticle and a wafer |
| JPH01169926A (ja) * | 1987-12-24 | 1989-07-05 | Toshiba Corp | アライメント方法 |
| GB9307710D0 (en) * | 1993-04-14 | 1993-06-02 | Rothmans Benson & Hedges | Smoking apparatus-l |
| GB9311898D0 (en) * | 1993-06-09 | 1993-07-28 | Univ Bristol | Improvements in or relating to monitoring the spatial position and orientation of an article |
| WO2001009927A1 (en) | 1999-07-28 | 2001-02-08 | Infineon Technologies North America Corp. | Semiconductor structures and manufacturing methods |
| US7650029B2 (en) * | 2004-11-23 | 2010-01-19 | Hewlett-Packard Development Company, L.P. | Multiple layer alignment sensing |
| US9122172B2 (en) * | 2010-06-04 | 2015-09-01 | Advantech Global, Ltd | Reflection shadow mask alignment using coded apertures |
| KR101839818B1 (ko) * | 2010-06-04 | 2018-03-19 | 어드밴텍 글로벌, 리미티드 | 코딩된 어퍼처를 이용한 섀도우 마스크 정렬 |
| US9580792B2 (en) | 2010-06-04 | 2017-02-28 | Advantech Global, Ltd | Shadow mask alignment using variable pitch coded apertures |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1108925B (de) * | 1958-08-15 | 1961-06-15 | Continental Elektro Ind Ag | Einrichtung zur Kontrolle des Durchhanges oder der Lage von Wellen |
| US3622319A (en) * | 1966-10-20 | 1971-11-23 | Western Electric Co | Nonreflecting photomasks and methods of making same |
| US3802940A (en) * | 1969-08-18 | 1974-04-09 | Computervision Corp | Enhanced contrast semiconductor wafer alignment target and method for making same |
| US3796497A (en) * | 1971-12-01 | 1974-03-12 | Ibm | Optical alignment method and apparatus |
-
1973
- 1973-10-11 US US405347A patent/US3885877A/en not_active Expired - Lifetime
-
1974
- 1974-08-08 FR FR7428148A patent/FR2247758B1/fr not_active Expired
- 1974-08-21 DE DE2439987A patent/DE2439987A1/de active Granted
- 1974-08-23 IT IT26543/74A patent/IT1020143B/it active
- 1974-09-19 GB GB40804/74A patent/GB1481099A/en not_active Expired
- 1974-09-20 JP JP10785174A patent/JPS54152B2/ja not_active Expired
- 1974-09-26 CA CA210,179A patent/CA1012656A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| US3885877A (en) | 1975-05-27 |
| IT1020143B (it) | 1977-12-20 |
| FR2247758B1 (ja) | 1976-10-22 |
| DE2439987A1 (de) | 1975-04-17 |
| FR2247758A1 (ja) | 1975-05-09 |
| GB1481099A (en) | 1977-07-27 |
| JPS5067584A (ja) | 1975-06-06 |
| CA1012656A (en) | 1977-06-21 |
| DE2439987C2 (ja) | 1982-05-06 |