JPS5067584A - - Google Patents

Info

Publication number
JPS5067584A
JPS5067584A JP49107851A JP10785174A JPS5067584A JP S5067584 A JPS5067584 A JP S5067584A JP 49107851 A JP49107851 A JP 49107851A JP 10785174 A JP10785174 A JP 10785174A JP S5067584 A JPS5067584 A JP S5067584A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP49107851A
Other versions
JPS54152B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5067584A publication Critical patent/JPS5067584A/ja
Publication of JPS54152B2 publication Critical patent/JPS54152B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544—Marks applied to semiconductor devices or parts
    • H01L2223/54453—Marks applied to semiconductor devices or parts for use prior to dicing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
JP10785174A 1973-10-11 1974-09-20 Expired JPS54152B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US405347A US3885877A (en) 1973-10-11 1973-10-11 Electro-optical fine alignment process

Publications (2)

Publication Number Publication Date
JPS5067584A true JPS5067584A (ja) 1975-06-06
JPS54152B2 JPS54152B2 (ja) 1979-01-06

Family

ID=23603326

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10785174A Expired JPS54152B2 (ja) 1973-10-11 1974-09-20

Country Status (7)

Country Link
US (1) US3885877A (ja)
JP (1) JPS54152B2 (ja)
CA (1) CA1012656A (ja)
DE (1) DE2439987A1 (ja)
FR (1) FR2247758B1 (ja)
GB (1) GB1481099A (ja)
IT (1) IT1020143B (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS603620A (ja) * 1983-06-21 1985-01-10 Mitsubishi Electric Corp 微細パタ−ンの形成方法

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3989385A (en) * 1974-09-16 1976-11-02 International Business Machines Corporation Part locating, mask alignment and mask alignment verification system
US4039370A (en) * 1975-06-23 1977-08-02 Rca Corporation Optically monitoring the undercutting of a layer being etched
DE2539206A1 (de) * 1975-09-03 1977-03-17 Siemens Ag Verfahren zur automatischen justierung von halbleiterscheiben
DD136671A1 (de) * 1976-04-29 1979-07-18 Stephan Hartung Steuermechanismus fuer die positionierung eines objektes,insbesondere zur feinpositionierung von substratscheiben
DE2622283A1 (de) * 1976-05-19 1977-12-08 Bosch Gmbh Robert Verfahren zur lokalisierung eines festkoerperplaettchens und festkoerperplaettchen zur durchfuehrung des verfahrens
DE2723902C2 (de) * 1977-05-26 1983-12-08 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Parallelausrichtung und Justierung der Lage einer Halbleiterscheibe relativ zu einer Bestrahlungsmaske bei der Röntgenstrahl-Fotolithografie
JPS5856402B2 (ja) * 1978-08-30 1983-12-14 大日本スクリ−ン製造株式会社 位置決め用センサ−
US4353087A (en) * 1979-03-12 1982-10-05 The Perkin-Elmer Corporation Automatic mask alignment
US4232969A (en) * 1979-05-30 1980-11-11 International Business Machines Corporation Projection optical system for aligning an image on a surface
DE3023131A1 (de) * 1979-06-20 1981-01-08 Canon Kk Verfahren zum herstellen eines farbfilters
DE3123031A1 (de) * 1981-06-10 1983-01-05 Siemens AG, 1000 Berlin und 8000 München Verfahren zur kennzeichnung von halbleiterchips und kennzeichenbarer halbleiterchip
US4406949A (en) * 1981-07-13 1983-09-27 Mostek Corporation Method and apparatus for aligning an integrated circuit
DE3265891D1 (en) * 1982-01-06 1985-10-03 Ibm Alignment system for lithographic proximity printing
DE3219388C2 (de) * 1982-05-24 1986-05-22 Dipl.-Ing. Bruno Richter GmbH & Co. Elektronische Betriebskontroll-Geräte KG, 8602 Stegaurach Optisch-elektrische Meßeinrichtung zum Messen der Lage und/oder der Abmessung von Gegenständen
JPS59224123A (ja) * 1983-05-20 1984-12-17 Oki Electric Ind Co Ltd ウエハアライメントマ−ク
JPS6052021A (ja) * 1983-08-31 1985-03-23 Canon Inc 位置検出方法
FR2554224B1 (fr) * 1983-10-27 1987-08-28 Telecommunications Sa Systeme de reperage de la position angulaire d'un dispositif mecanique
US4600834A (en) * 1983-10-31 1986-07-15 The United States Of America As Represented By The United States Department Of Energy Precision zero-home locator
GB2151350A (en) * 1983-11-25 1985-07-17 Vs Eng Ltd Sensing arrangement
US4663534A (en) * 1984-03-08 1987-05-05 Canon Kabushiki Kaisha Position detecting device utilizing selective outputs of the photodetector for accurate alignment
US4771180A (en) * 1985-10-11 1988-09-13 Matsushita Electric Industrial Co. Ltd. Exposure apparatus including an optical system for aligning a reticle and a wafer
JPH01169926A (ja) * 1987-12-24 1989-07-05 Toshiba Corp アライメント方法
GB9307710D0 (en) * 1993-04-14 1993-06-02 Rothmans Benson & Hedges Smoking apparatus-l
GB9311898D0 (en) * 1993-06-09 1993-07-28 Univ Bristol Improvements in or relating to monitoring the spatial position and orientation of an article
WO2001009927A1 (en) * 1999-07-28 2001-02-08 Infineon Technologies North America Corp. Semiconductor structures and manufacturing methods
US7650029B2 (en) * 2004-11-23 2010-01-19 Hewlett-Packard Development Company, L.P. Multiple layer alignment sensing
WO2011153016A1 (en) * 2010-06-04 2011-12-08 Advantech Global, Ltd. Shadow mask alignment using coded apertures
US9122172B2 (en) * 2010-06-04 2015-09-01 Advantech Global, Ltd Reflection shadow mask alignment using coded apertures
US9580792B2 (en) 2010-06-04 2017-02-28 Advantech Global, Ltd Shadow mask alignment using variable pitch coded apertures

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1108925B (de) * 1958-08-15 1961-06-15 Continental Elektro Ind Ag Einrichtung zur Kontrolle des Durchhanges oder der Lage von Wellen
US3622319A (en) * 1966-10-20 1971-11-23 Western Electric Co Nonreflecting photomasks and methods of making same
US3802940A (en) * 1969-08-18 1974-04-09 Computervision Corp Enhanced contrast semiconductor wafer alignment target and method for making same
US3796497A (en) * 1971-12-01 1974-03-12 Ibm Optical alignment method and apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS603620A (ja) * 1983-06-21 1985-01-10 Mitsubishi Electric Corp 微細パタ−ンの形成方法

Also Published As

Publication number Publication date
FR2247758A1 (ja) 1975-05-09
FR2247758B1 (ja) 1976-10-22
US3885877A (en) 1975-05-27
CA1012656A (en) 1977-06-21
JPS54152B2 (ja) 1979-01-06
GB1481099A (en) 1977-07-27
DE2439987A1 (de) 1975-04-17
DE2439987C2 (ja) 1982-05-06
IT1020143B (it) 1977-12-20

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