GB1433040A - Electrodeposition of copper - Google Patents
Electrodeposition of copperInfo
- Publication number
- GB1433040A GB1433040A GB5792473A GB5792473A GB1433040A GB 1433040 A GB1433040 A GB 1433040A GB 5792473 A GB5792473 A GB 5792473A GB 5792473 A GB5792473 A GB 5792473A GB 1433040 A GB1433040 A GB 1433040A
- Authority
- GB
- United Kingdom
- Prior art keywords
- group
- dec
- electro
- quaternized
- cycloaliphatic amines
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
1433040 Electro-depositing copper M & T CHEMICALS Inc 13 Dec 1973 [14 Dec 1972] 57924/73 Heading C7B Cu is electro-deposited from an aqueous acidic bath, e.g. a sulphate or fluoborate bath, containing (A) at least one amine selected from aryl-aralkyl, alkaryl- and cycloaliphatic amines and cycloaliphatic amines containing a sulphone group in the cycloalkane ring and (B) at least one compound containing the group -S-Alk-SO 3 M wherein M is a metal cation, and -Alkis a C 1-8 aliphatic hydrocarbon group which is saturated or unsaturated, unsubstituted or inertly substituted (e.g. with OH, alkyl, alkoxy or hydroxyalkyl) and in which the carbon chain may be interrupted by hetero atoms. Extensive generalized and specific Formulae for such compounds are given; (A) may be quaternized and/or a polyamine and (B) may be a polysulphide. Other additives specified are for levelling and/or brightening the deposit and are; N-ethylthiourea, N, N'-diethylthiourea, 2-mercaptothiazoline, 2-mercaptopyridine N-oxide, the phenazine azo dyes Janus green B and Janus black, quaternized poly(2-methyl-5-vinyl pyridine), 2- hydroxyethyl ethylene thiourea, Na methylene bis(2-naphthalene sulphonic acid), nonyl phenolethylene glycol condensate, polyethylene glycol optionally copolymerized with propylene glycol and polyethyleneimine. Plating conditions specified are; temperature 10-60‹C, pH < 2À5 and cathode c.d. 0À1-50 A/dm<SP>2</SP>.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US31511272A | 1972-12-14 | 1972-12-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1433040A true GB1433040A (en) | 1976-04-22 |
Family
ID=23222945
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB5792473A Expired GB1433040A (en) | 1972-12-14 | 1973-12-13 | Electrodeposition of copper |
Country Status (11)
| Country | Link |
|---|---|
| JP (1) | JPS5727190B2 (en) |
| BE (1) | BE808564A (en) |
| CA (1) | CA1020900A (en) |
| CS (1) | CS191224B2 (en) |
| DE (1) | DE2360892A1 (en) |
| FR (1) | FR2210673B1 (en) |
| GB (1) | GB1433040A (en) |
| IT (1) | IT1000992B (en) |
| NL (1) | NL7317204A (en) |
| PL (1) | PL94267B1 (en) |
| ZA (1) | ZA739310B (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2214520A (en) * | 1988-01-27 | 1989-09-06 | Jct Controls Ltd | Electrochemical processes using independently controlled voltages in alternation |
| WO2002055568A2 (en) * | 2001-01-11 | 2002-07-18 | Raschig Gmbh | Use of polyolefins with alkaline, aromatic substituents as auxiliaries in the electrolytic deposition of metal layers |
| US8002962B2 (en) | 2002-03-05 | 2011-08-23 | Enthone Inc. | Copper electrodeposition in microelectronics |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5791594A (en) * | 1980-11-29 | 1982-06-07 | Anritsu Electric Co Ltd | Method of plating through hole with copper |
| JPS641687A (en) * | 1987-03-28 | 1989-01-06 | Toshiji Shimokawa | Water discharging device for vessel |
| JPS6482598A (en) * | 1987-09-24 | 1989-03-28 | Fujitsu Ltd | Copper plating method for printed board |
| PL2620529T3 (en) * | 2012-01-25 | 2014-09-30 | Atotech Deutschland Gmbh | Method for producing matt copper deposits |
| CN116348636A (en) | 2021-10-26 | 2023-06-27 | 宁德时代新能源科技股份有限公司 | Copper plating solution and negative composite current collector prepared from same |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3328273A (en) * | 1966-08-15 | 1967-06-27 | Udylite Corp | Electro-deposition of copper from acidic baths |
| US3542655A (en) * | 1968-04-29 | 1970-11-24 | M & T Chemicals Inc | Electrodeposition of copper |
| ZA708430B (en) * | 1970-02-12 | 1971-09-29 | Udylite Corp | Electrodeposition of copper from acidic baths |
| US3682788A (en) * | 1970-07-28 | 1972-08-08 | M & T Chemicals Inc | Copper electroplating |
-
1973
- 1973-12-06 ZA ZA739310A patent/ZA739310B/en unknown
- 1973-12-06 DE DE2360892A patent/DE2360892A1/en not_active Withdrawn
- 1973-12-12 JP JP13925873A patent/JPS5727190B2/ja not_active Expired
- 1973-12-12 BE BE138804A patent/BE808564A/en not_active IP Right Cessation
- 1973-12-12 FR FR7344403A patent/FR2210673B1/fr not_active Expired
- 1973-12-13 PL PL1973167270A patent/PL94267B1/pl unknown
- 1973-12-13 GB GB5792473A patent/GB1433040A/en not_active Expired
- 1973-12-13 IT IT9720/73A patent/IT1000992B/en active
- 1973-12-13 CA CA188,095A patent/CA1020900A/en not_active Expired
- 1973-12-14 NL NL7317204A patent/NL7317204A/xx not_active Application Discontinuation
- 1973-12-14 CS CS738691A patent/CS191224B2/en unknown
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2214520A (en) * | 1988-01-27 | 1989-09-06 | Jct Controls Ltd | Electrochemical processes using independently controlled voltages in alternation |
| WO2002055568A2 (en) * | 2001-01-11 | 2002-07-18 | Raschig Gmbh | Use of polyolefins with alkaline, aromatic substituents as auxiliaries in the electrolytic deposition of metal layers |
| WO2002055568A3 (en) * | 2001-01-11 | 2003-10-23 | Raschig Gmbh | Use of polyolefins with alkaline, aromatic substituents as auxiliaries in the electrolytic deposition of metal layers |
| US8002962B2 (en) | 2002-03-05 | 2011-08-23 | Enthone Inc. | Copper electrodeposition in microelectronics |
| US8608933B2 (en) | 2002-03-05 | 2013-12-17 | Enthone Inc. | Copper electrodeposition in microelectronics |
| US9493884B2 (en) | 2002-03-05 | 2016-11-15 | Enthone Inc. | Copper electrodeposition in microelectronics |
Also Published As
| Publication number | Publication date |
|---|---|
| CS191224B2 (en) | 1979-06-29 |
| CA1020900A (en) | 1977-11-15 |
| JPS49135832A (en) | 1974-12-27 |
| ZA739310B (en) | 1974-11-27 |
| FR2210673B1 (en) | 1977-08-19 |
| NL7317204A (en) | 1974-06-18 |
| JPS5727190B2 (en) | 1982-06-09 |
| PL94267B1 (en) | 1977-07-30 |
| BE808564A (en) | 1974-03-29 |
| DE2360892A1 (en) | 1974-06-20 |
| FR2210673A1 (en) | 1974-07-12 |
| IT1000992B (en) | 1976-04-10 |
| AU6354273A (en) | 1975-06-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PCNP | Patent ceased through non-payment of renewal fee |