GB1432986A - Charge-coupled arrangements - Google Patents

Charge-coupled arrangements

Info

Publication number
GB1432986A
GB1432986A GB3309073A GB3309073A GB1432986A GB 1432986 A GB1432986 A GB 1432986A GB 3309073 A GB3309073 A GB 3309073A GB 3309073 A GB3309073 A GB 3309073A GB 1432986 A GB1432986 A GB 1432986A
Authority
GB
United Kingdom
Prior art keywords
charge
layer
electrodes
counter
semi
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3309073A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Publication of GB1432986A publication Critical patent/GB1432986A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/10Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/107Substrate region of field-effect devices
    • H01L29/1091Substrate region of field-effect devices of charge coupled devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/762Charge transfer devices
    • H01L29/765Charge-coupled devices
    • H01L29/768Charge-coupled devices with field effect produced by an insulated gate
    • H01L29/76866Surface Channel CCD
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/10Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
    • H01L31/101Devices sensitive to infrared, visible or ultraviolet radiation
    • H01L31/112Devices sensitive to infrared, visible or ultraviolet radiation characterised by field-effect operation, e.g. junction field-effect phototransistor
    • H01L31/113Devices sensitive to infrared, visible or ultraviolet radiation characterised by field-effect operation, e.g. junction field-effect phototransistor being of the conductor-insulator-semiconductor type, e.g. metal-insulator-semiconductor field-effect transistor

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Electromagnetism (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Light Receiving Elements (AREA)

Abstract

1432986 Charge-coupled semi-conductor devices SIEMENS AG 11 July 1973 [16 Aug 1972] 33090/73 Heading H1K Light reaches the semi-conductor layer 3 of a radiation - sensitive charge - coupled device through a transparent insulating substrate 4, e.g. of spinel. The substrate 4 and layer 3 may be about 250 Á and 1 Á thick respectively, the latter being of monocrystalline Si with SiO 2 insulation S and Al electrodes 1, 2. The semiconductor material beneath the gaps between the electrodes may be counter-doped, e.g. by ion implantation, with impurities of the opposite type to those of the layer 3 to a sufficient level only partially to compensate the original dopant concentration or to an extent sufficient to convert the counter-doped material to the opposite conductivity type.
GB3309073A 1972-08-16 1973-07-11 Charge-coupled arrangements Expired GB1432986A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19722240276 DE2240276A1 (en) 1972-08-16 1972-08-16 CHARGE SHIFTING ARRANGEMENT AS PHOTODETECTOR

Publications (1)

Publication Number Publication Date
GB1432986A true GB1432986A (en) 1976-04-22

Family

ID=5853710

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3309073A Expired GB1432986A (en) 1972-08-16 1973-07-11 Charge-coupled arrangements

Country Status (9)

Country Link
JP (1) JPS4965190A (en)
BE (1) BE803590A (en)
CH (1) CH557093A (en)
DE (1) DE2240276A1 (en)
FR (1) FR2196525B3 (en)
GB (1) GB1432986A (en)
IT (1) IT998330B (en)
LU (1) LU68227A1 (en)
NL (1) NL7311204A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102983205A (en) * 2012-12-04 2013-03-20 中国科学院新疆理化技术研究所 Silicon photodetector and manufacturing method and application thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102983205A (en) * 2012-12-04 2013-03-20 中国科学院新疆理化技术研究所 Silicon photodetector and manufacturing method and application thereof

Also Published As

Publication number Publication date
FR2196525A1 (en) 1974-03-15
BE803590A (en) 1974-02-14
IT998330B (en) 1976-01-20
FR2196525B3 (en) 1976-07-30
NL7311204A (en) 1974-02-19
CH557093A (en) 1974-12-13
JPS4965190A (en) 1974-06-24
LU68227A1 (en) 1974-02-21
DE2240276A1 (en) 1974-02-28

Similar Documents

Publication Publication Date Title
JPS5457875A (en) Semiconductor nonvolatile memory device
GB1447675A (en) Semiconductor devices
JPS56162875A (en) Semiconductor device
DE2960880D1 (en) Process for producing epitaxial layers on selectively doped silicon substrates with high impurity concentration
GB1432986A (en) Charge-coupled arrangements
JPS5713764A (en) Charge detector
GB1528946A (en) Charge coupled devices
JPS6441852A (en) Hydrogen ion sensitive semiconductor sensor
JPS567480A (en) Film transistor
JPS5769778A (en) Semiconductor device
ES484353A1 (en) Method of making a thin-film photovoltaic cell and photovoltaic cell made by this method.
JPS56126971A (en) Thin film field effect element
JPS5575264A (en) Charge transfer element
JPS5220769A (en) Longitudinal semi-conductor unit
JPS5475273A (en) Manufacture of semiconductor device
JPS53126270A (en) Production of semiconductor devices
JPS53129981A (en) Production of semiconductor device
JPS5670675A (en) Manufacture of photoelectric converter
JPS5410688A (en) Production of semiconductor device
JPS57100768A (en) Manufacture of field effect semiconductor device
JPS5339088A (en) Insulated gate type field effect semiconductor device
JPS5743432A (en) Semiconductor device
JPS5298480A (en) Semiconductor device
JPS5329668A (en) Production of semiconductor device
JPS5658288A (en) Semiconductor device

Legal Events

Date Code Title Description
CSNS Application of which complete specification have been accepted and published, but patent is not sealed