GB1413602A - Ion sources - Google Patents

Ion sources

Info

Publication number
GB1413602A
GB1413602A GB3567573A GB3567573A GB1413602A GB 1413602 A GB1413602 A GB 1413602A GB 3567573 A GB3567573 A GB 3567573A GB 3567573 A GB3567573 A GB 3567573A GB 1413602 A GB1413602 A GB 1413602A
Authority
GB
United Kingdom
Prior art keywords
electrode
scraper
diameter
voltage
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3567573A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ATMOIC ENERGY OF CANADA Ltd
Original Assignee
ATMOIC ENERGY OF CANADA Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ATMOIC ENERGY OF CANADA Ltd filed Critical ATMOIC ENERGY OF CANADA Ltd
Publication of GB1413602A publication Critical patent/GB1413602A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/022—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H01J27/10—Duoplasmatrons ; Duopigatrons

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Particle Accelerators (AREA)

Abstract

1413602 Ion beam sources ATOMIC ENERGY OF CANADA Ltd 26 July 1973 [24 Oct 1972] 35675/73 Heading H1D A conventional duoplasmation ion source is modified by the interposition of a "scraper" electrode 28 between the expansion cup 18 and the extractor electrode 19, the scraper electrode having an aperture whose diameter #s is slightly less than the plasma aperture diameter #p and the object is to remove the outer layer of ions which are said to contribute most to the transverse momentum content of the beam. The voltage on the scraper electrode is typically 300 volts for a source of 6 mm. diameter and the voltage should be chosen so as not to disturb the electric field which would prevail in the absence of the scraper electrode.
GB3567573A 1972-10-24 1973-07-26 Ion sources Expired GB1413602A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29976372A 1972-10-24 1972-10-24

Publications (1)

Publication Number Publication Date
GB1413602A true GB1413602A (en) 1975-11-12

Family

ID=23156191

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3567573A Expired GB1413602A (en) 1972-10-24 1973-07-26 Ion sources

Country Status (6)

Country Link
US (1) US3767952A (en)
JP (1) JPS49100498A (en)
CA (1) CA982708A (en)
FR (1) FR2204099B1 (en)
GB (1) GB1413602A (en)
NL (1) NL7312494A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0135366A1 (en) * 1983-08-15 1985-03-27 Applied Materials, Inc. System and method for ion implantation
GB2146836A (en) * 1983-08-12 1985-04-24 Centre Nat Rech Scient A source of ions with at least two ionization chambers, in particular for forming chemically reactive ion beams

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5923432A (en) * 1982-07-30 1984-02-06 Hitachi Ltd Plasma ion source
US4649278A (en) * 1985-05-02 1987-03-10 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Generation of intense negative ion beams
CA2836816C (en) * 2011-05-23 2018-02-20 Schmor Particle Accelerator Consulting Inc. Particle accelerator and method of reducing beam divergence in the particle accelerator

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2146836A (en) * 1983-08-12 1985-04-24 Centre Nat Rech Scient A source of ions with at least two ionization chambers, in particular for forming chemically reactive ion beams
EP0135366A1 (en) * 1983-08-15 1985-03-27 Applied Materials, Inc. System and method for ion implantation

Also Published As

Publication number Publication date
NL7312494A (en) 1974-04-26
FR2204099A1 (en) 1974-05-17
US3767952A (en) 1973-10-23
FR2204099B1 (en) 1978-04-21
CA982708A (en) 1976-01-27
JPS49100498A (en) 1974-09-24

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PLNP Patent lapsed through nonpayment of renewal fees