GB1408352A - Electrolytic methods of etching thin films - Google Patents

Electrolytic methods of etching thin films

Info

Publication number
GB1408352A
GB1408352A GB4878373A GB4878373A GB1408352A GB 1408352 A GB1408352 A GB 1408352A GB 4878373 A GB4878373 A GB 4878373A GB 4878373 A GB4878373 A GB 4878373A GB 1408352 A GB1408352 A GB 1408352A
Authority
GB
United Kingdom
Prior art keywords
etched
reference electrode
auxiliary electrode
periodicity
oct
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4878373A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of GB1408352A publication Critical patent/GB1408352A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/07—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process being removed electrolytically
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electrochemistry (AREA)
  • Computer Hardware Design (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Power Engineering (AREA)
  • ing And Chemical Polishing (AREA)
  • Weting (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
GB4878373A 1972-10-19 1973-10-19 Electrolytic methods of etching thin films Expired GB1408352A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29885672A 1972-10-19 1972-10-19

Publications (1)

Publication Number Publication Date
GB1408352A true GB1408352A (en) 1975-10-01

Family

ID=23152265

Family Applications (1)

Application Number Title Priority Date Filing Date
GB4878373A Expired GB1408352A (en) 1972-10-19 1973-10-19 Electrolytic methods of etching thin films

Country Status (9)

Country Link
US (1) US3798141A (fr)
JP (1) JPS4974140A (fr)
BE (1) BE806230A (fr)
CA (1) CA1026704A (fr)
DE (1) DE2351664B2 (fr)
FR (1) FR2203890B1 (fr)
GB (1) GB1408352A (fr)
IT (1) IT999661B (fr)
NL (1) NL157062B (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3898141A (en) * 1974-02-08 1975-08-05 Bell Telephone Labor Inc Electrolytic oxidation and etching of III-V compound semiconductors
NL7609816A (nl) * 1976-09-03 1978-03-07 Philips Nv Werkwijze voor het vervaardigen van een lichaam voorzien met een goudpatroon en lichaam ver- vaardigd volgens de werkwijze.
GB1539309A (en) * 1976-12-14 1979-01-31 Inoue Japax Res Electrochemical polishing
US4206028A (en) * 1976-12-14 1980-06-03 Inoue-Japax Research Incorporated Electrochemical polishing system
DE3029277C2 (de) * 1980-08-01 1983-10-20 Siemens AG, 1000 Berlin und 8000 München Aufbau von Metallschichten
AU2002224453A1 (en) 2000-10-11 2002-04-22 Microchips, Inc. Microchip reservoir devices and facilitated corrosion of electrodes
AU2002326304A1 (en) 2001-05-31 2002-12-16 Massachusetts Institute Of Technology Microchip devices with improved reservoir opening
US7175752B2 (en) * 2002-05-24 2007-02-13 Federal-Mogul Worldwide, Inc. Method and apparatus for electrochemical machining

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3566358A (en) * 1968-03-19 1971-02-23 Bevier Hasbrouck Integrated multi-computer system

Also Published As

Publication number Publication date
CA1026704A (fr) 1978-02-21
NL157062B (nl) 1978-06-15
FR2203890B1 (fr) 1976-07-23
FR2203890A1 (fr) 1974-05-17
IT999661B (it) 1976-03-10
DE2351664A1 (de) 1974-05-02
BE806230A (fr) 1974-02-15
JPS4974140A (fr) 1974-07-17
NL7314162A (fr) 1974-04-23
DE2351664B2 (de) 1975-09-18
US3798141A (en) 1974-03-19

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee