GB1400504A - Photoresist-forming composition - Google Patents

Photoresist-forming composition

Info

Publication number
GB1400504A
GB1400504A GB3319572A GB3319572A GB1400504A GB 1400504 A GB1400504 A GB 1400504A GB 3319572 A GB3319572 A GB 3319572A GB 3319572 A GB3319572 A GB 3319572A GB 1400504 A GB1400504 A GB 1400504A
Authority
GB
United Kingdom
Prior art keywords
photo
alkyl
group
tribromomethyl
carboxylic acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3319572A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Publication of GB1400504A publication Critical patent/GB1400504A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/126—Halogen compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
GB3319572A 1971-07-15 1972-07-14 Photoresist-forming composition Expired GB1400504A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP46052094A JPS5011286B1 (enExample) 1971-07-15 1971-07-15

Publications (1)

Publication Number Publication Date
GB1400504A true GB1400504A (en) 1975-07-16

Family

ID=12905234

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3319572A Expired GB1400504A (en) 1971-07-15 1972-07-14 Photoresist-forming composition

Country Status (4)

Country Link
US (1) US3859098A (enExample)
JP (1) JPS5011286B1 (enExample)
DE (1) DE2234511A1 (enExample)
GB (1) GB1400504A (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4025348A (en) * 1974-05-10 1977-05-24 Hitachi Chemical Company, Ltd. Photosensitive resin compositions
DE2750285A1 (de) * 1977-11-10 1979-05-17 Bayer Ag Elektronenstrahlvernetzbare polymere
DE3324642A1 (de) * 1983-07-08 1985-01-17 Basf Ag, 6700 Ludwigshafen Verfahren zur stabilisierung von photopolymerisierbaren mischungen
GB8321813D0 (en) * 1983-08-12 1983-09-14 Vickers Plc Radiation sensitive compounds
US4701390A (en) * 1985-11-27 1987-10-20 Macdermid, Incorporated Thermally stabilized photoresist images
WO1987003387A1 (en) * 1985-11-27 1987-06-04 Macdermid, Incorporated Thermally stabilized photoresist images
US5155044A (en) * 1987-03-13 1992-10-13 Coulter Electronics, Inc. Lysing reagent system for isolation, identification and/or analysis of leukocytes from whole blood samples
IL85532A (en) * 1987-03-13 1992-03-29 Coulter Electronics Method and lytic reagent system for isolation,identification and/or analysis of leukocytes from whole blood samples
KR101789556B1 (ko) 2015-06-03 2017-10-25 금호석유화학 주식회사 신규 아크릴계 중합체를 포함한 포토레지스트 미세패턴 형성용 조성물, 이의 제조 방법 및 이를 이용한 포토레지스트 미세패턴 형성방법

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3579343A (en) * 1967-04-25 1971-05-18 Konishiroku Photo Ind Photoresist-forming compositions
JPS4914881B1 (enExample) * 1969-10-31 1974-04-11

Also Published As

Publication number Publication date
JPS5011286B1 (enExample) 1975-04-30
US3859098A (en) 1975-01-07
DE2234511A1 (de) 1973-01-25

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee