JPS5011286B1 - - Google Patents

Info

Publication number
JPS5011286B1
JPS5011286B1 JP46052094A JP5209471A JPS5011286B1 JP S5011286 B1 JPS5011286 B1 JP S5011286B1 JP 46052094 A JP46052094 A JP 46052094A JP 5209471 A JP5209471 A JP 5209471A JP S5011286 B1 JPS5011286 B1 JP S5011286B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP46052094A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP46052094A priority Critical patent/JPS5011286B1/ja
Priority to US271534A priority patent/US3859098A/en
Priority to DE2234511A priority patent/DE2234511A1/de
Priority to GB3319572A priority patent/GB1400504A/en
Publication of JPS5011286B1 publication Critical patent/JPS5011286B1/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/126—Halogen compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP46052094A 1971-07-15 1971-07-15 Pending JPS5011286B1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP46052094A JPS5011286B1 (ja) 1971-07-15 1971-07-15
US271534A US3859098A (en) 1971-07-15 1972-07-13 Photoresist composition
DE2234511A DE2234511A1 (de) 1971-07-15 1972-07-13 Beschichtungsmasse zur herstellung von photoresistschichten und dgl
GB3319572A GB1400504A (en) 1971-07-15 1972-07-14 Photoresist-forming composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP46052094A JPS5011286B1 (ja) 1971-07-15 1971-07-15

Publications (1)

Publication Number Publication Date
JPS5011286B1 true JPS5011286B1 (ja) 1975-04-30

Family

ID=12905234

Family Applications (1)

Application Number Title Priority Date Filing Date
JP46052094A Pending JPS5011286B1 (ja) 1971-07-15 1971-07-15

Country Status (4)

Country Link
US (1) US3859098A (ja)
JP (1) JPS5011286B1 (ja)
DE (1) DE2234511A1 (ja)
GB (1) GB1400504A (ja)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4025348A (en) * 1974-05-10 1977-05-24 Hitachi Chemical Company, Ltd. Photosensitive resin compositions
DE2750285A1 (de) * 1977-11-10 1979-05-17 Bayer Ag Elektronenstrahlvernetzbare polymere
DE3324642A1 (de) * 1983-07-08 1985-01-17 Basf Ag, 6700 Ludwigshafen Verfahren zur stabilisierung von photopolymerisierbaren mischungen
GB8321813D0 (en) * 1983-08-12 1983-09-14 Vickers Plc Radiation sensitive compounds
US4701390A (en) * 1985-11-27 1987-10-20 Macdermid, Incorporated Thermally stabilized photoresist images
EP0247153A4 (en) * 1985-11-27 1988-05-19 Macdermid Inc THERMALLY STABILIZED, LIGHT-RESISTANT IMAGES.
IL85532A (en) * 1987-03-13 1992-03-29 Coulter Electronics Method and lytic reagent system for isolation,identification and/or analysis of leukocytes from whole blood samples
US5155044A (en) * 1987-03-13 1992-10-13 Coulter Electronics, Inc. Lysing reagent system for isolation, identification and/or analysis of leukocytes from whole blood samples
KR101789556B1 (ko) 2015-06-03 2017-10-25 금호석유화학 주식회사 신규 아크릴계 중합체를 포함한 포토레지스트 미세패턴 형성용 조성물, 이의 제조 방법 및 이를 이용한 포토레지스트 미세패턴 형성방법

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3579343A (en) * 1967-04-25 1971-05-18 Konishiroku Photo Ind Photoresist-forming compositions
JPS4914881B1 (ja) * 1969-10-31 1974-04-11

Also Published As

Publication number Publication date
DE2234511A1 (de) 1973-01-25
GB1400504A (en) 1975-07-16
US3859098A (en) 1975-01-07

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