GB1398641A - Haphthoquinone diazide sulphonic acid esters - Google Patents

Haphthoquinone diazide sulphonic acid esters

Info

Publication number
GB1398641A
GB1398641A GB2505872A GB2505872A GB1398641A GB 1398641 A GB1398641 A GB 1398641A GB 2505872 A GB2505872 A GB 2505872A GB 2505872 A GB2505872 A GB 2505872A GB 1398641 A GB1398641 A GB 1398641A
Authority
GB
United Kingdom
Prior art keywords
light
group
sensitive
haphthoquinone
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2505872A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Polychrome Corp
Original Assignee
Polychrome Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US00148238A external-priority patent/US3823130A/en
Application filed by Polychrome Corp filed Critical Polychrome Corp
Publication of GB1398641A publication Critical patent/GB1398641A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

1398641 Photo-resist materials POLYCHROME CORP 26 May 1972 [28 May 1971 19 July 1971 5 Aug 1971] 25058/72 Heading G2C [Also in Division C2] A light-sensitive article for the production of a lithographic printing plate comprises a base sheet having a coating thereon of a light-sensitive naphthaquinone diazide of the Formula where Y is a group of the Formula R', RCH 2 or R"CH 2 CH 2 where R is an α-methyl or dimethyl substituted C 2 to C 4 alkyl group, or a cyclohexyl group, R' is a C 2 to C 4 alkyl group #-and optionally γ- or #- substituted by F, Cl or Br and R" is a C 1 to C4 alkoxy group. The base sheet may comprise aluminium. The coating may contain 0.1-10 parts by weight of an alkali-soluble hydroxyaryl-aldehyde resin, a styrene-maleic anhydride copolymer resin or a mixture thereof per part of the light-sensitive compound, or may contain a dye.
GB2505872A 1971-05-28 1972-05-26 Haphthoquinone diazide sulphonic acid esters Expired GB1398641A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US00148238A US3823130A (en) 1971-05-28 1971-05-28 Light sensitive esters of naphthoquinone-1,2-diazide-(2)-5-sulfonicacids with cyclohexylmethanol or secondary or tertiary alkanols of up to six carbon atoms
US16413171A 1971-07-19 1971-07-19
US16955171A 1971-08-05 1971-08-05

Publications (1)

Publication Number Publication Date
GB1398641A true GB1398641A (en) 1975-06-25

Family

ID=27386662

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2505872A Expired GB1398641A (en) 1971-05-28 1972-05-26 Haphthoquinone diazide sulphonic acid esters

Country Status (9)

Country Link
JP (2) JPS5724341B1 (en)
BE (1) BE783962A (en)
CA (1) CA977338A (en)
CH (1) CH566574A5 (en)
FR (1) FR2139981B1 (en)
GB (1) GB1398641A (en)
IT (1) IT958100B (en)
NL (1) NL171264C (en)
SE (1) SE394811B (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2127175A (en) * 1982-09-07 1984-04-04 Letraset International Ltd Manufacture of signs
US5116715A (en) * 1987-12-18 1992-05-26 U C B S.A. Photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester of phenolic resin with diazoquinonesulfonic acid or diazoquinonecarboxylic acid
US5272026A (en) * 1987-12-18 1993-12-21 Ucb S.A. Negative image process utilizing photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester or phenolic resin with diazoquinone sulfonic acid or diazoquinone carboxylic acid, and associated imaged article

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5820393Y2 (en) * 1980-12-19 1983-04-27 徳三 長田 guide pen
EP0147596A3 (en) * 1983-12-30 1987-03-04 International Business Machines Corporation A positive lithographic resist composition
JPH0489469A (en) * 1990-07-27 1992-03-23 Fuji Photo Film Co Ltd 2-diazo-1,2-quinone derivative and image-forming material containing the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2127175A (en) * 1982-09-07 1984-04-04 Letraset International Ltd Manufacture of signs
US5116715A (en) * 1987-12-18 1992-05-26 U C B S.A. Photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester of phenolic resin with diazoquinonesulfonic acid or diazoquinonecarboxylic acid
US5272026A (en) * 1987-12-18 1993-12-21 Ucb S.A. Negative image process utilizing photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester or phenolic resin with diazoquinone sulfonic acid or diazoquinone carboxylic acid, and associated imaged article

Also Published As

Publication number Publication date
CH566574A5 (en) 1975-09-15
DE2224843B2 (en) 1976-07-29
NL7207131A (en) 1972-11-30
SE394811B (en) 1977-07-11
IT958100B (en) 1973-10-20
CA977338A (en) 1975-11-04
NL171264C (en) 1983-03-01
DE2224843A1 (en) 1972-12-14
JPS552615B2 (en) 1980-01-21
BE783962A (en) 1972-11-27
JPS5494024A (en) 1979-07-25
FR2139981B1 (en) 1973-07-13
FR2139981A1 (en) 1973-01-12
JPS5724341B1 (en) 1982-05-24

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Legal Events

Date Code Title Description
PS Patent sealed
48S Specification amended (sect. 8/1949)
SPA Amended specification published
PCNP Patent ceased through non-payment of renewal fee