NL171264C - METHOD FOR PREPARING A PHOTOSENSITIVE NAFTOCHINONE-1,2-DIAZIDE (2) -5-SULFONIC ACID DERIVATIVE, PROCESS FOR PREPARING A PHOTOSENSITIVE PREPARATION CONTAINING A PREPARED DERIVATIVE THROUGH PROVENLY LIKE-LIGHT. - Google Patents

METHOD FOR PREPARING A PHOTOSENSITIVE NAFTOCHINONE-1,2-DIAZIDE (2) -5-SULFONIC ACID DERIVATIVE, PROCESS FOR PREPARING A PHOTOSENSITIVE PREPARATION CONTAINING A PREPARED DERIVATIVE THROUGH PROVENLY LIKE-LIGHT.

Info

Publication number
NL171264C
NL171264C NL7207131A NL7207131A NL171264C NL 171264 C NL171264 C NL 171264C NL 7207131 A NL7207131 A NL 7207131A NL 7207131 A NL7207131 A NL 7207131A NL 171264 C NL171264 C NL 171264C
Authority
NL
Netherlands
Prior art keywords
preparing
photosensitive
derivative
naftochinone
provenly
Prior art date
Application number
NL7207131A
Other languages
Dutch (nl)
Other versions
NL7207131A (en
Original Assignee
Polychrome Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US00148238A external-priority patent/US3823130A/en
Application filed by Polychrome Corp filed Critical Polychrome Corp
Publication of NL7207131A publication Critical patent/NL7207131A/xx
Application granted granted Critical
Publication of NL171264C publication Critical patent/NL171264C/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
NL7207131A 1971-05-28 1972-05-26 METHOD FOR PREPARING A PHOTOSENSITIVE NAFTOCHINONE-1,2-DIAZIDE (2) -5-SULFONIC ACID DERIVATIVE, PROCESS FOR PREPARING A PHOTOSENSITIVE PREPARATION CONTAINING A PREPARED DERIVATIVE THROUGH PROVENLY LIKE-LIGHT. NL171264C (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US00148238A US3823130A (en) 1971-05-28 1971-05-28 Light sensitive esters of naphthoquinone-1,2-diazide-(2)-5-sulfonicacids with cyclohexylmethanol or secondary or tertiary alkanols of up to six carbon atoms
US16413171A 1971-07-19 1971-07-19
US16955171A 1971-08-05 1971-08-05

Publications (2)

Publication Number Publication Date
NL7207131A NL7207131A (en) 1972-11-30
NL171264C true NL171264C (en) 1983-03-01

Family

ID=27386662

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7207131A NL171264C (en) 1971-05-28 1972-05-26 METHOD FOR PREPARING A PHOTOSENSITIVE NAFTOCHINONE-1,2-DIAZIDE (2) -5-SULFONIC ACID DERIVATIVE, PROCESS FOR PREPARING A PHOTOSENSITIVE PREPARATION CONTAINING A PREPARED DERIVATIVE THROUGH PROVENLY LIKE-LIGHT.

Country Status (9)

Country Link
JP (2) JPS5724341B1 (en)
BE (1) BE783962A (en)
CA (1) CA977338A (en)
CH (1) CH566574A5 (en)
FR (1) FR2139981B1 (en)
GB (1) GB1398641A (en)
IT (1) IT958100B (en)
NL (1) NL171264C (en)
SE (1) SE394811B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5820393Y2 (en) * 1980-12-19 1983-04-27 徳三 長田 guide pen
GB2127175A (en) * 1982-09-07 1984-04-04 Letraset International Ltd Manufacture of signs
EP0147596A3 (en) * 1983-12-30 1987-03-04 International Business Machines Corporation A positive lithographic resist composition
US5272026A (en) * 1987-12-18 1993-12-21 Ucb S.A. Negative image process utilizing photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester or phenolic resin with diazoquinone sulfonic acid or diazoquinone carboxylic acid, and associated imaged article
GB8729510D0 (en) * 1987-12-18 1988-02-03 Ucb Sa Photosensitive compositions containing phenolic resins & diazoquinone compounds
JPH0489469A (en) * 1990-07-27 1992-03-23 Fuji Photo Film Co Ltd 2-diazo-1,2-quinone derivative and image-forming material containing the same

Also Published As

Publication number Publication date
GB1398641A (en) 1975-06-25
DE2224843A1 (en) 1972-12-14
SE394811B (en) 1977-07-11
FR2139981A1 (en) 1973-01-12
JPS5724341B1 (en) 1982-05-24
JPS5494024A (en) 1979-07-25
JPS552615B2 (en) 1980-01-21
CA977338A (en) 1975-11-04
IT958100B (en) 1973-10-20
BE783962A (en) 1972-11-27
DE2224843B2 (en) 1976-07-29
CH566574A5 (en) 1975-09-15
FR2139981B1 (en) 1973-07-13
NL7207131A (en) 1972-11-30

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