FR2139981A1 - - Google Patents

Info

Publication number
FR2139981A1
FR2139981A1 FR7218944A FR7218944A FR2139981A1 FR 2139981 A1 FR2139981 A1 FR 2139981A1 FR 7218944 A FR7218944 A FR 7218944A FR 7218944 A FR7218944 A FR 7218944A FR 2139981 A1 FR2139981 A1 FR 2139981A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7218944A
Other languages
French (fr)
Other versions
FR2139981B1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Polychrome Corp
Original Assignee
Polychrome Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US00148238A external-priority patent/US3823130A/en
Application filed by Polychrome Corp filed Critical Polychrome Corp
Publication of FR2139981A1 publication Critical patent/FR2139981A1/fr
Application granted granted Critical
Publication of FR2139981B1 publication Critical patent/FR2139981B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
FR7218944A 1971-05-28 1972-05-26 Expired FR2139981B1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US00148238A US3823130A (en) 1971-05-28 1971-05-28 Light sensitive esters of naphthoquinone-1,2-diazide-(2)-5-sulfonicacids with cyclohexylmethanol or secondary or tertiary alkanols of up to six carbon atoms
US16413171A 1971-07-19 1971-07-19
US16955171A 1971-08-05 1971-08-05

Publications (2)

Publication Number Publication Date
FR2139981A1 true FR2139981A1 (en) 1973-01-12
FR2139981B1 FR2139981B1 (en) 1973-07-13

Family

ID=27386662

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7218944A Expired FR2139981B1 (en) 1971-05-28 1972-05-26

Country Status (9)

Country Link
JP (2) JPS5724341B1 (en)
BE (1) BE783962A (en)
CA (1) CA977338A (en)
CH (1) CH566574A5 (en)
FR (1) FR2139981B1 (en)
GB (1) GB1398641A (en)
IT (1) IT958100B (en)
NL (1) NL171264C (en)
SE (1) SE394811B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0147596A2 (en) * 1983-12-30 1985-07-10 International Business Machines Corporation A positive lithographic resist composition

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5820393Y2 (en) * 1980-12-19 1983-04-27 徳三 長田 guide pen
GB2127175A (en) * 1982-09-07 1984-04-04 Letraset International Ltd Manufacture of signs
US5272026A (en) * 1987-12-18 1993-12-21 Ucb S.A. Negative image process utilizing photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester or phenolic resin with diazoquinone sulfonic acid or diazoquinone carboxylic acid, and associated imaged article
GB8729510D0 (en) * 1987-12-18 1988-02-03 Ucb Sa Photosensitive compositions containing phenolic resins & diazoquinone compounds
JPH0489469A (en) * 1990-07-27 1992-03-23 Fuji Photo Film Co Ltd 2-diazo-1,2-quinone derivative and image-forming material containing the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0147596A2 (en) * 1983-12-30 1985-07-10 International Business Machines Corporation A positive lithographic resist composition
EP0147596A3 (en) * 1983-12-30 1987-03-04 International Business Machines Corporation A positive lithographic resist composition

Also Published As

Publication number Publication date
CH566574A5 (en) 1975-09-15
IT958100B (en) 1973-10-20
CA977338A (en) 1975-11-04
FR2139981B1 (en) 1973-07-13
JPS5494024A (en) 1979-07-25
NL171264C (en) 1983-03-01
DE2224843B2 (en) 1976-07-29
GB1398641A (en) 1975-06-25
JPS5724341B1 (en) 1982-05-24
SE394811B (en) 1977-07-11
NL7207131A (en) 1972-11-30
JPS552615B2 (en) 1980-01-21
BE783962A (en) 1972-11-27
DE2224843A1 (en) 1972-12-14

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Legal Events

Date Code Title Description
ST Notification of lapse