CA977338A - Light sensitive compounds - Google Patents

Light sensitive compounds

Info

Publication number
CA977338A
CA977338A CA143,217A CA143217A CA977338A CA 977338 A CA977338 A CA 977338A CA 143217 A CA143217 A CA 143217A CA 977338 A CA977338 A CA 977338A
Authority
CA
Canada
Prior art keywords
light sensitive
sensitive compounds
compounds
light
sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA143,217A
Other versions
CA143217S (en
Inventor
Joseph M. Poppo
Albert S. Deutsch
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Polychrome Corp
Original Assignee
Polychrome Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US00148238A external-priority patent/US3823130A/en
Application filed by Polychrome Corp filed Critical Polychrome Corp
Application granted granted Critical
Publication of CA977338A publication Critical patent/CA977338A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
CA143,217A 1971-05-28 1972-05-26 Light sensitive compounds Expired CA977338A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US00148238A US3823130A (en) 1971-05-28 1971-05-28 Light sensitive esters of naphthoquinone-1,2-diazide-(2)-5-sulfonicacids with cyclohexylmethanol or secondary or tertiary alkanols of up to six carbon atoms
US16413171A 1971-07-19 1971-07-19
US16955171A 1971-08-05 1971-08-05

Publications (1)

Publication Number Publication Date
CA977338A true CA977338A (en) 1975-11-04

Family

ID=27386662

Family Applications (1)

Application Number Title Priority Date Filing Date
CA143,217A Expired CA977338A (en) 1971-05-28 1972-05-26 Light sensitive compounds

Country Status (9)

Country Link
JP (2) JPS5724341B1 (en)
BE (1) BE783962A (en)
CA (1) CA977338A (en)
CH (1) CH566574A5 (en)
FR (1) FR2139981B1 (en)
GB (1) GB1398641A (en)
IT (1) IT958100B (en)
NL (1) NL171264C (en)
SE (1) SE394811B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5820393Y2 (en) * 1980-12-19 1983-04-27 徳三 長田 guide pen
GB2127175A (en) * 1982-09-07 1984-04-04 Letraset International Ltd Manufacture of signs
EP0147596A3 (en) * 1983-12-30 1987-03-04 International Business Machines Corporation A positive lithographic resist composition
US5272026A (en) * 1987-12-18 1993-12-21 Ucb S.A. Negative image process utilizing photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester or phenolic resin with diazoquinone sulfonic acid or diazoquinone carboxylic acid, and associated imaged article
GB8729510D0 (en) * 1987-12-18 1988-02-03 Ucb Sa Photosensitive compositions containing phenolic resins & diazoquinone compounds
JPH0489469A (en) * 1990-07-27 1992-03-23 Fuji Photo Film Co Ltd 2-diazo-1,2-quinone derivative and image-forming material containing the same

Also Published As

Publication number Publication date
JPS5494024A (en) 1979-07-25
IT958100B (en) 1973-10-20
GB1398641A (en) 1975-06-25
NL7207131A (en) 1972-11-30
JPS552615B2 (en) 1980-01-21
JPS5724341B1 (en) 1982-05-24
BE783962A (en) 1972-11-27
DE2224843B2 (en) 1976-07-29
DE2224843A1 (en) 1972-12-14
CH566574A5 (en) 1975-09-15
FR2139981A1 (en) 1973-01-12
NL171264C (en) 1983-03-01
SE394811B (en) 1977-07-11
FR2139981B1 (en) 1973-07-13

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