JPS552615B2 - - Google Patents

Info

Publication number
JPS552615B2
JPS552615B2 JP15326478A JP15326478A JPS552615B2 JP S552615 B2 JPS552615 B2 JP S552615B2 JP 15326478 A JP15326478 A JP 15326478A JP 15326478 A JP15326478 A JP 15326478A JP S552615 B2 JPS552615 B2 JP S552615B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP15326478A
Other languages
Japanese (ja)
Other versions
JPS5494024A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US00148238A external-priority patent/US3823130A/en
Application filed filed Critical
Publication of JPS5494024A publication Critical patent/JPS5494024A/en
Publication of JPS552615B2 publication Critical patent/JPS552615B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP15326478A 1971-05-28 1978-12-13 Photosensitive composition Granted JPS5494024A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US00148238A US3823130A (en) 1971-05-28 1971-05-28 Light sensitive esters of naphthoquinone-1,2-diazide-(2)-5-sulfonicacids with cyclohexylmethanol or secondary or tertiary alkanols of up to six carbon atoms
US16413171A 1971-07-19 1971-07-19
US16955171A 1971-08-05 1971-08-05

Publications (2)

Publication Number Publication Date
JPS5494024A JPS5494024A (en) 1979-07-25
JPS552615B2 true JPS552615B2 (en) 1980-01-21

Family

ID=27386662

Family Applications (2)

Application Number Title Priority Date Filing Date
JP5220172A Pending JPS5724341B1 (en) 1971-05-28 1972-05-27
JP15326478A Granted JPS5494024A (en) 1971-05-28 1978-12-13 Photosensitive composition

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP5220172A Pending JPS5724341B1 (en) 1971-05-28 1972-05-27

Country Status (9)

Country Link
JP (2) JPS5724341B1 (en)
BE (1) BE783962A (en)
CA (1) CA977338A (en)
CH (1) CH566574A5 (en)
FR (1) FR2139981B1 (en)
GB (1) GB1398641A (en)
IT (1) IT958100B (en)
NL (1) NL171264C (en)
SE (1) SE394811B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5820393Y2 (en) * 1980-12-19 1983-04-27 徳三 長田 guide pen

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2127175A (en) * 1982-09-07 1984-04-04 Letraset International Ltd Manufacture of signs
EP0147596A3 (en) * 1983-12-30 1987-03-04 International Business Machines Corporation A positive lithographic resist composition
US5272026A (en) * 1987-12-18 1993-12-21 Ucb S.A. Negative image process utilizing photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester or phenolic resin with diazoquinone sulfonic acid or diazoquinone carboxylic acid, and associated imaged article
GB8729510D0 (en) * 1987-12-18 1988-02-03 Ucb Sa Photosensitive compositions containing phenolic resins & diazoquinone compounds
JPH0489469A (en) * 1990-07-27 1992-03-23 Fuji Photo Film Co Ltd 2-diazo-1,2-quinone derivative and image-forming material containing the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5820393Y2 (en) * 1980-12-19 1983-04-27 徳三 長田 guide pen

Also Published As

Publication number Publication date
GB1398641A (en) 1975-06-25
DE2224843A1 (en) 1972-12-14
SE394811B (en) 1977-07-11
FR2139981A1 (en) 1973-01-12
JPS5724341B1 (en) 1982-05-24
JPS5494024A (en) 1979-07-25
CA977338A (en) 1975-11-04
IT958100B (en) 1973-10-20
BE783962A (en) 1972-11-27
DE2224843B2 (en) 1976-07-29
CH566574A5 (en) 1975-09-15
NL171264C (en) 1983-03-01
FR2139981B1 (en) 1973-07-13
NL7207131A (en) 1972-11-30

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