GB1442934A - Light-sensitive naphtho-quinone diazide composition - Google Patents

Light-sensitive naphtho-quinone diazide composition

Info

Publication number
GB1442934A
GB1442934A GB3323774A GB3323774A GB1442934A GB 1442934 A GB1442934 A GB 1442934A GB 3323774 A GB3323774 A GB 3323774A GB 3323774 A GB3323774 A GB 3323774A GB 1442934 A GB1442934 A GB 1442934A
Authority
GB
United Kingdom
Prior art keywords
cyclohexyl
july
cycloalkyl
ethyl
alkyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3323774A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of GB1442934A publication Critical patent/GB1442934A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Abstract

1442934 Positive working photo-resists FUJI PHOTO FILM CO Ltd 26 July 1974 [27 July 1973] 33237/74 Heading G2C A positive-working photo-resist comprises (a) a naphthoquinone diazide or a resin thereof (b) a sensitizer of Formula wherein X<SP>1</SP> and X<SP>2</SP> are O or S, R<SP>1</SP>, R<SP>2</SP> and R<SP>3</SP> are H, alkyl, aralkyl, cycloalkyl or aryl and R<SP>4</SP> is H, alkyl or cycloalkyl and/or o-benzoic acid sulphinalamide and (c) a binder if (a) is not a resin coated in a layer on a support specified binders are phenol-formaldehyde resins, shellac, styrene/maleic anhydride copolymers and acrylic copolymers specified sensitizers are hydantoin and 2-thiohydantoin optionally substituted in the 5- position by methyl, ethyl, isopropyl, cyclohexyl and phenyl groups and thiazoline-2-thiosis substituted in the 5 and/or 4-position by methyl, ethyl, phenyl, cyclohexyl and benzyl groups.
GB3323774A 1973-07-27 1974-07-26 Light-sensitive naphtho-quinone diazide composition Expired GB1442934A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8533273A JPS5619619B2 (en) 1973-07-27 1973-07-27

Publications (1)

Publication Number Publication Date
GB1442934A true GB1442934A (en) 1976-07-14

Family

ID=13855667

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3323774A Expired GB1442934A (en) 1973-07-27 1974-07-26 Light-sensitive naphtho-quinone diazide composition

Country Status (2)

Country Link
JP (1) JPS5619619B2 (en)
GB (1) GB1442934A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2500645A1 (en) * 1981-02-20 1982-08-27 Polychrome Corp RADIATION SENSITIVE COMPOSITION, SENSITIVE ELEMENT COATING THE SAME, AND REPRODUCTIVE FILM PREPARED THEREFROM
US4431725A (en) * 1978-12-28 1984-02-14 Hiromichi Tachikawa Light-sensitive material and image forming processes using the same
US5145763A (en) * 1990-06-29 1992-09-08 Ocg Microelectronic Materials, Inc. Positive photoresist composition

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61219951A (en) * 1985-03-27 1986-09-30 Japan Synthetic Rubber Co Ltd Positive type radiation sensitive composition
DE69604114T2 (en) * 1995-04-10 2000-03-02 Shipley Co Mixtures of photoresist containing photoactive compositions
WO2008078622A1 (en) * 2006-12-27 2008-07-03 Konica Minolta Medical & Graphic, Inc. Positive-working lithographic printing plate material and method for manufacturing lithographic printing plate using the positive-working lithographic printing plate material

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4431725A (en) * 1978-12-28 1984-02-14 Hiromichi Tachikawa Light-sensitive material and image forming processes using the same
FR2500645A1 (en) * 1981-02-20 1982-08-27 Polychrome Corp RADIATION SENSITIVE COMPOSITION, SENSITIVE ELEMENT COATING THE SAME, AND REPRODUCTIVE FILM PREPARED THEREFROM
US5145763A (en) * 1990-06-29 1992-09-08 Ocg Microelectronic Materials, Inc. Positive photoresist composition

Also Published As

Publication number Publication date
JPS5619619B2 (en) 1981-05-08
JPS5036203A (en) 1975-04-05

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee