GB1387350A - Method of preparing a photoresist pattern upon a metal surface - Google Patents

Method of preparing a photoresist pattern upon a metal surface

Info

Publication number
GB1387350A
GB1387350A GB4680472A GB4680472A GB1387350A GB 1387350 A GB1387350 A GB 1387350A GB 4680472 A GB4680472 A GB 4680472A GB 4680472 A GB4680472 A GB 4680472A GB 1387350 A GB1387350 A GB 1387350A
Authority
GB
United Kingdom
Prior art keywords
resist
heating
preparing
metal surface
photoresist pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4680472A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Buckbee Mears Co
Original Assignee
Buckbee Mears Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Buckbee Mears Co filed Critical Buckbee Mears Co
Publication of GB1387350A publication Critical patent/GB1387350A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • ing And Chemical Polishing (AREA)
GB4680472A 1972-02-03 1972-10-11 Method of preparing a photoresist pattern upon a metal surface Expired GB1387350A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US22308272A 1972-02-03 1972-02-03

Publications (1)

Publication Number Publication Date
GB1387350A true GB1387350A (en) 1975-03-19

Family

ID=22834951

Family Applications (1)

Application Number Title Priority Date Filing Date
GB4680472A Expired GB1387350A (en) 1972-02-03 1972-10-11 Method of preparing a photoresist pattern upon a metal surface

Country Status (8)

Country Link
JP (1) JPS4887904A (enrdf_load_stackoverflow)
BE (1) BE791212A (enrdf_load_stackoverflow)
CA (1) CA981507A (enrdf_load_stackoverflow)
DE (1) DE2259180A1 (enrdf_load_stackoverflow)
FR (1) FR2171724A5 (enrdf_load_stackoverflow)
GB (1) GB1387350A (enrdf_load_stackoverflow)
IT (1) IT972853B (enrdf_load_stackoverflow)
NL (1) NL7215272A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2315128A (en) * 1996-07-09 1998-01-21 Tokyo Ohka Kogyo Co Ltd Image formation method
CN111352313A (zh) * 2018-12-20 2020-06-30 夏泰鑫半导体(青岛)有限公司 加热晶圆上的旋涂膜的方法及加热装置

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5228370B2 (enrdf_load_stackoverflow) * 1972-03-06 1977-07-26
DE2529054C2 (de) * 1975-06-30 1982-04-29 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren zur Herstellung eines zur Vorlage negativen Resistbildes
DE3038605A1 (de) * 1980-10-13 1982-06-03 Hoechst Ag, 6000 Frankfurt Verfahren zur herstellung von reliefkopien
JPS5890636A (ja) * 1981-11-24 1983-05-30 Fuji Photo Film Co Ltd 光重合性組成物を用いた感光材料による画像形成方法および現像ユニツト
US4389482A (en) * 1981-12-14 1983-06-21 International Business Machines Corporation Process for forming photoresists with strong resistance to reactive ion etching and high sensitivity to mid- and deep UV-light
DE3731333A1 (de) * 1987-09-15 1989-03-30 Schering Ag Verfahren zur herstellung von leiternetzwerken

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2315128A (en) * 1996-07-09 1998-01-21 Tokyo Ohka Kogyo Co Ltd Image formation method
US5908734A (en) * 1996-07-09 1999-06-01 Tokyo Ohka Kogyo Co., Ltd. Image formation method with a post exposure heating step
GB2315128B (en) * 1996-07-09 2000-06-14 Tokyo Ohka Kogyo Co Ltd Image formation method
CN111352313A (zh) * 2018-12-20 2020-06-30 夏泰鑫半导体(青岛)有限公司 加热晶圆上的旋涂膜的方法及加热装置

Also Published As

Publication number Publication date
JPS4887904A (enrdf_load_stackoverflow) 1973-11-19
DE2259180A1 (de) 1973-08-09
NL7215272A (enrdf_load_stackoverflow) 1973-08-07
BE791212A (fr) 1973-03-01
FR2171724A5 (enrdf_load_stackoverflow) 1973-09-21
IT972853B (it) 1974-05-31
CA981507A (en) 1976-01-13

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee