IT972853B - Procedimento per migliorare l ade sione della fotoriserva a superfi ci di metallo - Google Patents
Procedimento per migliorare l ade sione della fotoriserva a superfi ci di metalloInfo
- Publication number
- IT972853B IT972853B IT3350772A IT3350772A IT972853B IT 972853 B IT972853 B IT 972853B IT 3350772 A IT3350772 A IT 3350772A IT 3350772 A IT3350772 A IT 3350772A IT 972853 B IT972853 B IT 972853B
- Authority
- IT
- Italy
- Prior art keywords
- photor
- ade
- sion
- reserve
- improving
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- ing And Chemical Polishing (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US22308272A | 1972-02-03 | 1972-02-03 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IT972853B true IT972853B (it) | 1974-05-31 |
Family
ID=22834951
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IT3350772A IT972853B (it) | 1972-02-03 | 1972-12-22 | Procedimento per migliorare l ade sione della fotoriserva a superfi ci di metallo |
Country Status (8)
| Country | Link |
|---|---|
| JP (1) | JPS4887904A (enrdf_load_stackoverflow) |
| BE (1) | BE791212A (enrdf_load_stackoverflow) |
| CA (1) | CA981507A (enrdf_load_stackoverflow) |
| DE (1) | DE2259180A1 (enrdf_load_stackoverflow) |
| FR (1) | FR2171724A5 (enrdf_load_stackoverflow) |
| GB (1) | GB1387350A (enrdf_load_stackoverflow) |
| IT (1) | IT972853B (enrdf_load_stackoverflow) |
| NL (1) | NL7215272A (enrdf_load_stackoverflow) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5228370B2 (enrdf_load_stackoverflow) * | 1972-03-06 | 1977-07-26 | ||
| DE2529054C2 (de) * | 1975-06-30 | 1982-04-29 | Ibm Deutschland Gmbh, 7000 Stuttgart | Verfahren zur Herstellung eines zur Vorlage negativen Resistbildes |
| DE3038605A1 (de) * | 1980-10-13 | 1982-06-03 | Hoechst Ag, 6000 Frankfurt | Verfahren zur herstellung von reliefkopien |
| JPS5890636A (ja) * | 1981-11-24 | 1983-05-30 | Fuji Photo Film Co Ltd | 光重合性組成物を用いた感光材料による画像形成方法および現像ユニツト |
| US4389482A (en) * | 1981-12-14 | 1983-06-21 | International Business Machines Corporation | Process for forming photoresists with strong resistance to reactive ion etching and high sensitivity to mid- and deep UV-light |
| DE3731333A1 (de) * | 1987-09-15 | 1989-03-30 | Schering Ag | Verfahren zur herstellung von leiternetzwerken |
| JPH1026834A (ja) * | 1996-07-09 | 1998-01-27 | Tokyo Ohka Kogyo Co Ltd | 画像形成方法 |
| US11581187B2 (en) * | 2018-12-20 | 2023-02-14 | Xia Tai Xin Semiconductor (Qing Dao) Ltd. | Method of heating SOC film on wafer by electromagnetic wave generator and heating apparatus using the same |
-
0
- BE BE791212D patent/BE791212A/xx unknown
-
1972
- 1972-10-10 CA CA153,534A patent/CA981507A/en not_active Expired
- 1972-10-11 GB GB4680472A patent/GB1387350A/en not_active Expired
- 1972-11-10 NL NL7215272A patent/NL7215272A/xx not_active Application Discontinuation
- 1972-12-02 DE DE19722259180 patent/DE2259180A1/de active Pending
- 1972-12-18 FR FR7245032A patent/FR2171724A5/fr not_active Expired
- 1972-12-22 IT IT3350772A patent/IT972853B/it active
-
1973
- 1973-01-30 JP JP1166773A patent/JPS4887904A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| CA981507A (en) | 1976-01-13 |
| NL7215272A (enrdf_load_stackoverflow) | 1973-08-07 |
| FR2171724A5 (enrdf_load_stackoverflow) | 1973-09-21 |
| GB1387350A (en) | 1975-03-19 |
| DE2259180A1 (de) | 1973-08-09 |
| BE791212A (fr) | 1973-03-01 |
| JPS4887904A (enrdf_load_stackoverflow) | 1973-11-19 |
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