GB1379478A - Electrical resistors - Google Patents
Electrical resistorsInfo
- Publication number
- GB1379478A GB1379478A GB1164772A GB1164772A GB1379478A GB 1379478 A GB1379478 A GB 1379478A GB 1164772 A GB1164772 A GB 1164772A GB 1164772 A GB1164772 A GB 1164772A GB 1379478 A GB1379478 A GB 1379478A
- Authority
- GB
- United Kingdom
- Prior art keywords
- cathode
- tin
- produced
- per cent
- mole per
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 abstract 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 abstract 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 abstract 2
- 239000000203 mixture Substances 0.000 abstract 2
- 229910052757 nitrogen Inorganic materials 0.000 abstract 2
- 238000004544 sputter deposition Methods 0.000 abstract 2
- 229910052786 argon Inorganic materials 0.000 abstract 1
- 239000002131 composite material Substances 0.000 abstract 1
- 239000000470 constituent Substances 0.000 abstract 1
- 230000001419 dependent effect Effects 0.000 abstract 1
- 238000000151 deposition Methods 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 239000003792 electrolyte Substances 0.000 abstract 1
- 239000007789 gas Substances 0.000 abstract 1
- 238000007737 ion beam deposition Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 238000005121 nitriding Methods 0.000 abstract 1
- 239000006104 solid solution Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- WYXIGTJNYDDFFH-UHFFFAOYSA-Q triazanium;borate Chemical compound [NH4+].[NH4+].[NH4+].[O-]B([O-])[O-] WYXIGTJNYDDFFH-UHFFFAOYSA-Q 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
- H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques
- H01C17/12—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques by sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Non-Adjustable Resistors (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP46013829A JPS5110677B1 (enrdf_load_stackoverflow) | 1971-03-11 | 1971-03-11 | |
| JP46015273A JPS5110678B1 (enrdf_load_stackoverflow) | 1971-03-17 | 1971-03-17 | |
| JP46015274A JPS5110679B1 (enrdf_load_stackoverflow) | 1971-03-17 | 1971-03-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1379478A true GB1379478A (en) | 1975-01-02 |
Family
ID=27280415
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1164772A Expired GB1379478A (en) | 1971-03-11 | 1972-03-13 | Electrical resistors |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3803057A (enrdf_load_stackoverflow) |
| CA (1) | CA985036A (enrdf_load_stackoverflow) |
| FR (1) | FR2128858B1 (enrdf_load_stackoverflow) |
| GB (1) | GB1379478A (enrdf_load_stackoverflow) |
| IT (1) | IT957547B (enrdf_load_stackoverflow) |
| NL (1) | NL7203234A (enrdf_load_stackoverflow) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH673071B5 (enrdf_load_stackoverflow) * | 1988-06-24 | 1990-08-15 | Asulab Sa | |
| US5367285A (en) * | 1993-02-26 | 1994-11-22 | Lake Shore Cryotronics, Inc. | Metal oxy-nitride resistance films and methods of making the same |
| DE19756588A1 (de) * | 1997-12-18 | 1999-07-01 | Hartec Ges Fuer Hartstoffe Und | Schichtsystem, Verfahren zu seiner Herstellung sowie seine Verwendung |
-
1972
- 1972-02-17 US US00227070A patent/US3803057A/en not_active Expired - Lifetime
- 1972-02-21 CA CA135,136A patent/CA985036A/en not_active Expired
- 1972-03-09 IT IT48863/72A patent/IT957547B/it active
- 1972-03-10 NL NL7203234A patent/NL7203234A/xx not_active Application Discontinuation
- 1972-03-10 FR FR727208517A patent/FR2128858B1/fr not_active Expired
- 1972-03-13 GB GB1164772A patent/GB1379478A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2211993A1 (de) | 1972-11-02 |
| CA985036A (en) | 1976-03-09 |
| DE2211993B2 (de) | 1977-06-16 |
| IT957547B (it) | 1973-10-20 |
| FR2128858A1 (enrdf_load_stackoverflow) | 1972-10-20 |
| US3803057A (en) | 1974-04-09 |
| FR2128858B1 (enrdf_load_stackoverflow) | 1974-06-28 |
| NL7203234A (enrdf_load_stackoverflow) | 1972-09-13 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| 746 | Register noted 'licences of right' (sect. 46/1977) | ||
| PE20 | Patent expired after termination of 20 years |