CA985036A - Resistive materials and method of making such materials - Google Patents

Resistive materials and method of making such materials

Info

Publication number
CA985036A
CA985036A CA135,136A CA135136A CA985036A CA 985036 A CA985036 A CA 985036A CA 135136 A CA135136 A CA 135136A CA 985036 A CA985036 A CA 985036A
Authority
CA
Canada
Prior art keywords
materials
making
resistive
resistive materials
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA135,136A
Other languages
English (en)
Other versions
CA135136S (en
Inventor
Kiyotaka Wasa
Fumio Hosomi
Shigeru Hayakawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP46013829A external-priority patent/JPS5110677B1/ja
Priority claimed from JP46015273A external-priority patent/JPS5110678B1/ja
Priority claimed from JP46015274A external-priority patent/JPS5110679B1/ja
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Application granted granted Critical
Publication of CA985036A publication Critical patent/CA985036A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques
    • H01C17/12—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques by sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Non-Adjustable Resistors (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Physical Vapour Deposition (AREA)
CA135,136A 1971-03-11 1972-02-21 Resistive materials and method of making such materials Expired CA985036A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP46013829A JPS5110677B1 (enrdf_load_stackoverflow) 1971-03-11 1971-03-11
JP46015273A JPS5110678B1 (enrdf_load_stackoverflow) 1971-03-17 1971-03-17
JP46015274A JPS5110679B1 (enrdf_load_stackoverflow) 1971-03-17 1971-03-17

Publications (1)

Publication Number Publication Date
CA985036A true CA985036A (en) 1976-03-09

Family

ID=27280415

Family Applications (1)

Application Number Title Priority Date Filing Date
CA135,136A Expired CA985036A (en) 1971-03-11 1972-02-21 Resistive materials and method of making such materials

Country Status (6)

Country Link
US (1) US3803057A (enrdf_load_stackoverflow)
CA (1) CA985036A (enrdf_load_stackoverflow)
FR (1) FR2128858B1 (enrdf_load_stackoverflow)
GB (1) GB1379478A (enrdf_load_stackoverflow)
IT (1) IT957547B (enrdf_load_stackoverflow)
NL (1) NL7203234A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH673071B5 (enrdf_load_stackoverflow) * 1988-06-24 1990-08-15 Asulab Sa
US5367285A (en) * 1993-02-26 1994-11-22 Lake Shore Cryotronics, Inc. Metal oxy-nitride resistance films and methods of making the same
DE19756588A1 (de) * 1997-12-18 1999-07-01 Hartec Ges Fuer Hartstoffe Und Schichtsystem, Verfahren zu seiner Herstellung sowie seine Verwendung

Also Published As

Publication number Publication date
DE2211993A1 (de) 1972-11-02
FR2128858A1 (enrdf_load_stackoverflow) 1972-10-20
DE2211993B2 (de) 1977-06-16
IT957547B (it) 1973-10-20
FR2128858B1 (enrdf_load_stackoverflow) 1974-06-28
US3803057A (en) 1974-04-09
GB1379478A (en) 1975-01-02
NL7203234A (enrdf_load_stackoverflow) 1972-09-13

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