IT957547B - Composizione resistiva metodo per produrla ed oggetti preparati da essa - Google Patents

Composizione resistiva metodo per produrla ed oggetti preparati da essa

Info

Publication number
IT957547B
IT957547B IT48863/72A IT4886372A IT957547B IT 957547 B IT957547 B IT 957547B IT 48863/72 A IT48863/72 A IT 48863/72A IT 4886372 A IT4886372 A IT 4886372A IT 957547 B IT957547 B IT 957547B
Authority
IT
Italy
Prior art keywords
producing
composition method
resistive composition
objects prepared
objects
Prior art date
Application number
IT48863/72A
Other languages
English (en)
Italian (it)
Original Assignee
Matsushita Electric Ind Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP46013829A external-priority patent/JPS5110677B1/ja
Priority claimed from JP46015273A external-priority patent/JPS5110678B1/ja
Priority claimed from JP46015274A external-priority patent/JPS5110679B1/ja
Application filed by Matsushita Electric Ind Co Ltd filed Critical Matsushita Electric Ind Co Ltd
Application granted granted Critical
Publication of IT957547B publication Critical patent/IT957547B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques
    • H01C17/12—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques by sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Non-Adjustable Resistors (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Physical Vapour Deposition (AREA)
IT48863/72A 1971-03-11 1972-03-09 Composizione resistiva metodo per produrla ed oggetti preparati da essa IT957547B (it)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP46013829A JPS5110677B1 (enrdf_load_stackoverflow) 1971-03-11 1971-03-11
JP46015273A JPS5110678B1 (enrdf_load_stackoverflow) 1971-03-17 1971-03-17
JP46015274A JPS5110679B1 (enrdf_load_stackoverflow) 1971-03-17 1971-03-17

Publications (1)

Publication Number Publication Date
IT957547B true IT957547B (it) 1973-10-20

Family

ID=27280415

Family Applications (1)

Application Number Title Priority Date Filing Date
IT48863/72A IT957547B (it) 1971-03-11 1972-03-09 Composizione resistiva metodo per produrla ed oggetti preparati da essa

Country Status (6)

Country Link
US (1) US3803057A (enrdf_load_stackoverflow)
CA (1) CA985036A (enrdf_load_stackoverflow)
FR (1) FR2128858B1 (enrdf_load_stackoverflow)
GB (1) GB1379478A (enrdf_load_stackoverflow)
IT (1) IT957547B (enrdf_load_stackoverflow)
NL (1) NL7203234A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH673071B5 (enrdf_load_stackoverflow) * 1988-06-24 1990-08-15 Asulab Sa
US5367285A (en) * 1993-02-26 1994-11-22 Lake Shore Cryotronics, Inc. Metal oxy-nitride resistance films and methods of making the same
DE19756588A1 (de) * 1997-12-18 1999-07-01 Hartec Ges Fuer Hartstoffe Und Schichtsystem, Verfahren zu seiner Herstellung sowie seine Verwendung

Also Published As

Publication number Publication date
DE2211993A1 (de) 1972-11-02
FR2128858A1 (enrdf_load_stackoverflow) 1972-10-20
DE2211993B2 (de) 1977-06-16
CA985036A (en) 1976-03-09
FR2128858B1 (enrdf_load_stackoverflow) 1974-06-28
US3803057A (en) 1974-04-09
GB1379478A (en) 1975-01-02
NL7203234A (enrdf_load_stackoverflow) 1972-09-13

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