FR2128858A1 - - Google Patents

Info

Publication number
FR2128858A1
FR2128858A1 FR7208517A FR7208517A FR2128858A1 FR 2128858 A1 FR2128858 A1 FR 2128858A1 FR 7208517 A FR7208517 A FR 7208517A FR 7208517 A FR7208517 A FR 7208517A FR 2128858 A1 FR2128858 A1 FR 2128858A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7208517A
Other languages
French (fr)
Other versions
FR2128858B1 (enrdf_load_stackoverflow
Inventor
Kiyotaka Wasa
Fumio Hosomi
Shigeru Hayakawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP46013829A external-priority patent/JPS5110677B1/ja
Priority claimed from JP46015273A external-priority patent/JPS5110678B1/ja
Priority claimed from JP46015274A external-priority patent/JPS5110679B1/ja
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Publication of FR2128858A1 publication Critical patent/FR2128858A1/fr
Application granted granted Critical
Publication of FR2128858B1 publication Critical patent/FR2128858B1/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques
    • H01C17/12—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques by sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Non-Adjustable Resistors (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Physical Vapour Deposition (AREA)
FR727208517A 1971-03-11 1972-03-10 Expired FR2128858B1 (enrdf_load_stackoverflow)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP46013829A JPS5110677B1 (enrdf_load_stackoverflow) 1971-03-11 1971-03-11
JP46015273A JPS5110678B1 (enrdf_load_stackoverflow) 1971-03-17 1971-03-17
JP46015274A JPS5110679B1 (enrdf_load_stackoverflow) 1971-03-17 1971-03-17

Publications (2)

Publication Number Publication Date
FR2128858A1 true FR2128858A1 (enrdf_load_stackoverflow) 1972-10-20
FR2128858B1 FR2128858B1 (enrdf_load_stackoverflow) 1974-06-28

Family

ID=27280415

Family Applications (1)

Application Number Title Priority Date Filing Date
FR727208517A Expired FR2128858B1 (enrdf_load_stackoverflow) 1971-03-11 1972-03-10

Country Status (6)

Country Link
US (1) US3803057A (enrdf_load_stackoverflow)
CA (1) CA985036A (enrdf_load_stackoverflow)
FR (1) FR2128858B1 (enrdf_load_stackoverflow)
GB (1) GB1379478A (enrdf_load_stackoverflow)
IT (1) IT957547B (enrdf_load_stackoverflow)
NL (1) NL7203234A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0347727A1 (fr) * 1988-06-24 1989-12-27 Asulab S.A. Procédé de dépôt d'un revêtement de couleur noire sur un substrat et revêtement de couleur noire obtenu par ce procédé

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5367285A (en) * 1993-02-26 1994-11-22 Lake Shore Cryotronics, Inc. Metal oxy-nitride resistance films and methods of making the same
DE19756588A1 (de) * 1997-12-18 1999-07-01 Hartec Ges Fuer Hartstoffe Und Schichtsystem, Verfahren zu seiner Herstellung sowie seine Verwendung

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
NEANT *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0347727A1 (fr) * 1988-06-24 1989-12-27 Asulab S.A. Procédé de dépôt d'un revêtement de couleur noire sur un substrat et revêtement de couleur noire obtenu par ce procédé
CH673071GA3 (enrdf_load_stackoverflow) * 1988-06-24 1990-02-15
US4997538A (en) * 1988-06-24 1991-03-05 Asulab S.A. Process for depositing a black-colored coating on a substrate and a black-colored coating obtained using this process
US5030522A (en) * 1988-06-24 1991-07-09 Asulab S.A. Black-colored coating deposited on a substrate

Also Published As

Publication number Publication date
DE2211993A1 (de) 1972-11-02
DE2211993B2 (de) 1977-06-16
IT957547B (it) 1973-10-20
CA985036A (en) 1976-03-09
FR2128858B1 (enrdf_load_stackoverflow) 1974-06-28
US3803057A (en) 1974-04-09
GB1379478A (en) 1975-01-02
NL7203234A (enrdf_load_stackoverflow) 1972-09-13

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