GB1379011A - Method of manufacturing semiconductor devices - Google Patents
Method of manufacturing semiconductor devicesInfo
- Publication number
- GB1379011A GB1379011A GB2009073A GB2009073A GB1379011A GB 1379011 A GB1379011 A GB 1379011A GB 2009073 A GB2009073 A GB 2009073A GB 2009073 A GB2009073 A GB 2009073A GB 1379011 A GB1379011 A GB 1379011A
- Authority
- GB
- United Kingdom
- Prior art keywords
- platinum
- wafer
- diffused
- nickel
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/40—Formation of materials, e.g. in the shape of layers or pillars of conductive or resistive materials
- H10P14/46—Formation of materials, e.g. in the shape of layers or pillars of conductive or resistive materials using a liquid
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
- H10P32/10—Diffusion of dopants within, into or out of semiconductor bodies or layers
- H10P32/17—Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material
- H10P32/171—Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material being group IV material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
- H10P32/10—Diffusion of dopants within, into or out of semiconductor bodies or layers
- H10P32/18—Diffusion lifetime killers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
Landscapes
- Electrodes Of Semiconductors (AREA)
- Chemically Coating (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP47044141A JPS5745061B2 (https=) | 1972-05-02 | 1972-05-02 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1379011A true GB1379011A (en) | 1975-01-02 |
Family
ID=12683347
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB2009073A Expired GB1379011A (en) | 1972-05-02 | 1973-04-27 | Method of manufacturing semiconductor devices |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS5745061B2 (https=) |
| CA (1) | CA980918A (https=) |
| DE (1) | DE2321390C3 (https=) |
| FR (1) | FR2183111B1 (https=) |
| GB (1) | GB1379011A (https=) |
| IT (1) | IT988158B (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS591667A (ja) * | 1982-05-20 | 1984-01-07 | ゼネラル・エレクトリツク・カンパニイ | シリコンに対する白金の無電解めつき法 |
| JPS60182010A (ja) * | 1984-02-29 | 1985-09-17 | Canon Electronics Inc | ヘツド装置 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL241982A (https=) * | 1958-08-13 | 1900-01-01 | ||
| NL134170C (https=) * | 1963-12-17 | 1900-01-01 | ||
| DE1213921B (de) * | 1964-08-25 | 1966-04-07 | Bosch Gmbh Robert | Verfahren zur Herstellung einer Halbleiteranordnung |
| DE1283970B (de) * | 1966-03-19 | 1968-11-28 | Siemens Ag | Metallischer Kontakt an einem Halbleiterbauelement |
| US3599054A (en) * | 1968-11-22 | 1971-08-10 | Bell Telephone Labor Inc | Barrier layer devices and methods for their manufacture |
| US3640783A (en) * | 1969-08-11 | 1972-02-08 | Trw Semiconductors Inc | Semiconductor devices with diffused platinum |
-
1972
- 1972-05-02 JP JP47044141A patent/JPS5745061B2/ja not_active Expired
-
1973
- 1973-04-27 FR FR7315568A patent/FR2183111B1/fr not_active Expired
- 1973-04-27 DE DE2321390A patent/DE2321390C3/de not_active Expired
- 1973-04-27 GB GB2009073A patent/GB1379011A/en not_active Expired
- 1973-05-01 CA CA170,129A patent/CA980918A/en not_active Expired
- 1973-05-02 IT IT49755/73A patent/IT988158B/it active
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5745061B2 (https=) | 1982-09-25 |
| DE2321390A1 (de) | 1973-11-15 |
| CA980918A (en) | 1975-12-30 |
| DE2321390B2 (de) | 1976-10-28 |
| JPS495575A (https=) | 1974-01-18 |
| DE2321390C3 (de) | 1982-07-08 |
| FR2183111A1 (https=) | 1973-12-14 |
| FR2183111B1 (https=) | 1976-11-12 |
| IT988158B (it) | 1975-04-10 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| 746 | Register noted 'licences of right' (sect. 46/1977) | ||
| PE20 | Patent expired after termination of 20 years |
Effective date: 19930426 |