GB1353542A - Polymeric n-carbonyl sulphonamides and a process for their manu facture - Google Patents

Polymeric n-carbonyl sulphonamides and a process for their manu facture

Info

Publication number
GB1353542A
GB1353542A GB1862271*[A GB1862271A GB1353542A GB 1353542 A GB1353542 A GB 1353542A GB 1862271 A GB1862271 A GB 1862271A GB 1353542 A GB1353542 A GB 1353542A
Authority
GB
United Kingdom
Prior art keywords
compounds
formula
carbon atoms
carbonyl
sulphonamides
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1862271*[A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kalle GmbH and Co KG
Original Assignee
Kalle GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle GmbH and Co KG filed Critical Kalle GmbH and Co KG
Publication of GB1353542A publication Critical patent/GB1353542A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F28/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/107—Polyamide or polyurethane

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
GB1862271*[A 1970-06-04 1971-06-02 Polymeric n-carbonyl sulphonamides and a process for their manu facture Expired GB1353542A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19702027466 DE2027466A1 (de) 1970-06-04 1970-06-04 Polymere N-Carbonylsulfonamide und Verfahren zu ihrer Herstellung

Publications (1)

Publication Number Publication Date
GB1353542A true GB1353542A (en) 1974-05-22

Family

ID=5773023

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1862271*[A Expired GB1353542A (en) 1970-06-04 1971-06-02 Polymeric n-carbonyl sulphonamides and a process for their manu facture

Country Status (11)

Country Link
US (1) US3725356A (enExample)
JP (1) JPS542239B1 (enExample)
AT (1) AT309073B (enExample)
BE (1) BE767960A (enExample)
CA (1) CA924048A (enExample)
DE (1) DE2027466A1 (enExample)
FR (1) FR2094039B1 (enExample)
GB (1) GB1353542A (enExample)
IT (1) IT944674B (enExample)
NL (1) NL7107159A (enExample)
SE (1) SE370405B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4032344A (en) 1975-01-16 1977-06-28 Eastman Kodak Company Polysulfonamide vesicular binders and processes of forming vesicular images

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3884702A (en) * 1972-12-14 1975-05-20 Unitika Ltd Photosensitive polyamide composition
US4268602A (en) * 1978-12-05 1981-05-19 Toray Industries, Ltd. Photosensitive O-quinone diazide containing composition
JPS6079020A (ja) * 1983-10-06 1985-05-04 Nippon Zeon Co Ltd 新規な水溶性共重合体
JPH0769605B2 (ja) * 1988-02-25 1995-07-31 富士写真フイルム株式会社 感光性組成物
DE4242050A1 (de) * 1992-12-14 1994-06-16 Hoechst Ag Polymere mit N,N-disubstituierten Sulfonamid-Seitengruppen und deren Verwendung
JP2001188386A (ja) * 1999-10-22 2001-07-10 Sekisui Chem Co Ltd 荷電制御樹脂、電子写真用トナー用樹脂組成物及び電子写真用トナー
JP4512281B2 (ja) * 2001-02-22 2010-07-28 富士フイルム株式会社 ネガ型平版印刷版原版
JP4266077B2 (ja) 2001-03-26 2009-05-20 富士フイルム株式会社 平版印刷版原版及び平版印刷方法
JP2005519345A (ja) * 2002-03-04 2005-06-30 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． 短波長イメージング用ネガ型フォトレジスト
ATE428558T1 (de) * 2002-09-30 2009-05-15 Fujifilm Corp Polymerisierbare zusammensetzung und flachdruckplattenvorläufer
JP4137577B2 (ja) * 2002-09-30 2008-08-20 富士フイルム株式会社 感光性組成物
JP2004126050A (ja) * 2002-09-30 2004-04-22 Fuji Photo Film Co Ltd 平版印刷版原版
CN100590525C (zh) * 2002-12-18 2010-02-17 富士胶片株式会社 可聚合组合物和平版印刷版前体
JP4150261B2 (ja) * 2003-01-14 2008-09-17 富士フイルム株式会社 平版印刷版原版の製版方法
JP2004252201A (ja) * 2003-02-20 2004-09-09 Fuji Photo Film Co Ltd 平版印刷版原版
JP2004252285A (ja) * 2003-02-21 2004-09-09 Fuji Photo Film Co Ltd 感光性組成物及びそれを用いた平版印刷版原版
JP4048134B2 (ja) * 2003-02-21 2008-02-13 富士フイルム株式会社 平版印刷版原版
JP4048133B2 (ja) * 2003-02-21 2008-02-13 富士フイルム株式会社 感光性組成物及びそれを用いた平版印刷版原版
JP4299639B2 (ja) * 2003-07-29 2009-07-22 富士フイルム株式会社 重合性組成物及びそれを用いた画像記録材料
JP2005099284A (ja) * 2003-09-24 2005-04-14 Fuji Photo Film Co Ltd 感光性組成物及び平版印刷版原版
CN115843320B (zh) 2022-07-19 2024-01-02 日铁不锈钢株式会社 高强度不锈钢丝及弹簧

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3424730A (en) * 1964-03-06 1969-01-28 Dow Chemical Co Vinylidenearylenealkylene carbamates and polymers thereof
US3422165A (en) * 1964-12-08 1969-01-14 Union Carbide Corp Isocyanate and isothiocyanate compositions and polyurethanes thereof
US3422075A (en) * 1966-07-01 1969-01-14 Polaroid Corp Polymers modified with a monosulfonyl isocyanate
DE1770592A1 (de) * 1968-06-07 1971-11-04 Bayer Ag Verfahren zur Herstellung von Homo- und Copolymerisaten

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4032344A (en) 1975-01-16 1977-06-28 Eastman Kodak Company Polysulfonamide vesicular binders and processes of forming vesicular images

Also Published As

Publication number Publication date
US3725356A (en) 1973-04-03
FR2094039B1 (enExample) 1975-09-26
BE767960A (fr) 1971-12-01
IT944674B (it) 1973-04-20
DE2027466A1 (de) 1971-12-09
AT309073B (de) 1973-08-10
CA924048A (en) 1973-04-03
JPS542239B1 (enExample) 1979-02-03
NL7107159A (enExample) 1971-12-07
SE370405B (enExample) 1974-10-14
FR2094039A1 (enExample) 1972-02-04

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee