BE767960A - N-carbonylsulfonamides polymeres et procede pour leur preparation - Google Patents
N-carbonylsulfonamides polymeres et procede pour leur preparationInfo
- Publication number
- BE767960A BE767960A BE767960A BE767960A BE767960A BE 767960 A BE767960 A BE 767960A BE 767960 A BE767960 A BE 767960A BE 767960 A BE767960 A BE 767960A BE 767960 A BE767960 A BE 767960A
- Authority
- BE
- Belgium
- Prior art keywords
- carbonylsulfonamides
- polymeric
- preparation
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F28/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/107—Polyamide or polyurethane
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19702027466 DE2027466A1 (de) | 1970-06-04 | 1970-06-04 | Polymere N-Carbonylsulfonamide und Verfahren zu ihrer Herstellung |
Publications (1)
Publication Number | Publication Date |
---|---|
BE767960A true BE767960A (fr) | 1971-12-01 |
Family
ID=5773023
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE767960A BE767960A (fr) | 1970-06-04 | 1971-06-01 | N-carbonylsulfonamides polymeres et procede pour leur preparation |
Country Status (11)
Country | Link |
---|---|
US (1) | US3725356A (fr) |
JP (1) | JPS542239B1 (fr) |
AT (1) | AT309073B (fr) |
BE (1) | BE767960A (fr) |
CA (1) | CA924048A (fr) |
DE (1) | DE2027466A1 (fr) |
FR (1) | FR2094039B1 (fr) |
GB (1) | GB1353542A (fr) |
IT (1) | IT944674B (fr) |
NL (1) | NL7107159A (fr) |
SE (1) | SE370405B (fr) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3884702A (en) * | 1972-12-14 | 1975-05-20 | Unitika Ltd | Photosensitive polyamide composition |
US4032344A (en) | 1975-01-16 | 1977-06-28 | Eastman Kodak Company | Polysulfonamide vesicular binders and processes of forming vesicular images |
US4268602A (en) * | 1978-12-05 | 1981-05-19 | Toray Industries, Ltd. | Photosensitive O-quinone diazide containing composition |
JPS6079020A (ja) * | 1983-10-06 | 1985-05-04 | Nippon Zeon Co Ltd | 新規な水溶性共重合体 |
JPH0769605B2 (ja) * | 1988-02-25 | 1995-07-31 | 富士写真フイルム株式会社 | 感光性組成物 |
DE4242050A1 (de) * | 1992-12-14 | 1994-06-16 | Hoechst Ag | Polymere mit N,N-disubstituierten Sulfonamid-Seitengruppen und deren Verwendung |
JP2001188386A (ja) * | 1999-10-22 | 2001-07-10 | Sekisui Chem Co Ltd | 荷電制御樹脂、電子写真用トナー用樹脂組成物及び電子写真用トナー |
JP4512281B2 (ja) * | 2001-02-22 | 2010-07-28 | 富士フイルム株式会社 | ネガ型平版印刷版原版 |
JP4266077B2 (ja) | 2001-03-26 | 2009-05-20 | 富士フイルム株式会社 | 平版印刷版原版及び平版印刷方法 |
TWI314247B (en) * | 2002-03-04 | 2009-09-01 | Shipley Co Llc | Megative photordsists for short wavelength imaging |
DE60327141D1 (de) * | 2002-09-30 | 2009-05-28 | Fujifilm Corp | Polymerisierbare Zusammensetzung und Flachdruckplattenvorläufer |
JP2004126050A (ja) * | 2002-09-30 | 2004-04-22 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
JP4137577B2 (ja) * | 2002-09-30 | 2008-08-20 | 富士フイルム株式会社 | 感光性組成物 |
EP1431032B1 (fr) * | 2002-12-18 | 2015-12-09 | FUJIFILM Corporation | Composition polymérisable et précurseur de plaque d'impression lithographique |
JP4150261B2 (ja) * | 2003-01-14 | 2008-09-17 | 富士フイルム株式会社 | 平版印刷版原版の製版方法 |
JP2004252201A (ja) * | 2003-02-20 | 2004-09-09 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
JP4048133B2 (ja) * | 2003-02-21 | 2008-02-13 | 富士フイルム株式会社 | 感光性組成物及びそれを用いた平版印刷版原版 |
JP4048134B2 (ja) * | 2003-02-21 | 2008-02-13 | 富士フイルム株式会社 | 平版印刷版原版 |
JP2004252285A (ja) * | 2003-02-21 | 2004-09-09 | Fuji Photo Film Co Ltd | 感光性組成物及びそれを用いた平版印刷版原版 |
JP4299639B2 (ja) * | 2003-07-29 | 2009-07-22 | 富士フイルム株式会社 | 重合性組成物及びそれを用いた画像記録材料 |
JP2005099284A (ja) * | 2003-09-24 | 2005-04-14 | Fuji Photo Film Co Ltd | 感光性組成物及び平版印刷版原版 |
JP7274062B1 (ja) | 2022-07-19 | 2023-05-15 | 日鉄ステンレス株式会社 | 高強度ステンレス鋼線およびばね |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3424730A (en) * | 1964-03-06 | 1969-01-28 | Dow Chemical Co | Vinylidenearylenealkylene carbamates and polymers thereof |
US3422165A (en) * | 1964-12-08 | 1969-01-14 | Union Carbide Corp | Isocyanate and isothiocyanate compositions and polyurethanes thereof |
US3422075A (en) * | 1966-07-01 | 1969-01-14 | Polaroid Corp | Polymers modified with a monosulfonyl isocyanate |
DE1770592A1 (de) * | 1968-06-07 | 1971-11-04 | Bayer Ag | Verfahren zur Herstellung von Homo- und Copolymerisaten |
-
1970
- 1970-06-04 DE DE19702027466 patent/DE2027466A1/de active Pending
-
1971
- 1971-05-25 NL NL7107159A patent/NL7107159A/xx unknown
- 1971-06-01 CA CA114465A patent/CA924048A/en not_active Expired
- 1971-06-01 BE BE767960A patent/BE767960A/fr not_active IP Right Cessation
- 1971-06-01 AT AT471471A patent/AT309073B/de active
- 1971-06-01 SE SE7107024A patent/SE370405B/xx unknown
- 1971-06-01 IT IT50733/71A patent/IT944674B/it active
- 1971-06-02 US US00149391A patent/US3725356A/en not_active Expired - Lifetime
- 1971-06-02 GB GB1862271*[A patent/GB1353542A/en not_active Expired
- 1971-06-03 FR FR7120078A patent/FR2094039B1/fr not_active Expired
- 1971-06-04 JP JP3926271A patent/JPS542239B1/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
FR2094039B1 (fr) | 1975-09-26 |
GB1353542A (en) | 1974-05-22 |
US3725356A (en) | 1973-04-03 |
IT944674B (it) | 1973-04-20 |
SE370405B (fr) | 1974-10-14 |
CA924048A (en) | 1973-04-03 |
FR2094039A1 (fr) | 1972-02-04 |
AT309073B (de) | 1973-08-10 |
NL7107159A (fr) | 1971-12-07 |
JPS542239B1 (fr) | 1979-02-03 |
DE2027466A1 (de) | 1971-12-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RE | Patent lapsed |
Owner name: HOECHST A.G. Effective date: 19870630 |