FR2094039B1 - - Google Patents

Info

Publication number
FR2094039B1
FR2094039B1 FR7120078A FR7120078A FR2094039B1 FR 2094039 B1 FR2094039 B1 FR 2094039B1 FR 7120078 A FR7120078 A FR 7120078A FR 7120078 A FR7120078 A FR 7120078A FR 2094039 B1 FR2094039 B1 FR 2094039B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7120078A
Other versions
FR2094039A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Publication of FR2094039A1 publication Critical patent/FR2094039A1/fr
Application granted granted Critical
Publication of FR2094039B1 publication Critical patent/FR2094039B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F28/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/107—Polyamide or polyurethane

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
FR7120078A 1970-06-04 1971-06-03 Expired FR2094039B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19702027466 DE2027466A1 (de) 1970-06-04 1970-06-04 Polymere N-Carbonylsulfonamide und Verfahren zu ihrer Herstellung

Publications (2)

Publication Number Publication Date
FR2094039A1 FR2094039A1 (fr) 1972-02-04
FR2094039B1 true FR2094039B1 (fr) 1975-09-26

Family

ID=5773023

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7120078A Expired FR2094039B1 (fr) 1970-06-04 1971-06-03

Country Status (11)

Country Link
US (1) US3725356A (fr)
JP (1) JPS542239B1 (fr)
AT (1) AT309073B (fr)
BE (1) BE767960A (fr)
CA (1) CA924048A (fr)
DE (1) DE2027466A1 (fr)
FR (1) FR2094039B1 (fr)
GB (1) GB1353542A (fr)
IT (1) IT944674B (fr)
NL (1) NL7107159A (fr)
SE (1) SE370405B (fr)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3884702A (en) * 1972-12-14 1975-05-20 Unitika Ltd Photosensitive polyamide composition
US4032344A (en) 1975-01-16 1977-06-28 Eastman Kodak Company Polysulfonamide vesicular binders and processes of forming vesicular images
US4268602A (en) * 1978-12-05 1981-05-19 Toray Industries, Ltd. Photosensitive O-quinone diazide containing composition
JPS6079020A (ja) * 1983-10-06 1985-05-04 Nippon Zeon Co Ltd 新規な水溶性共重合体
JPH0769605B2 (ja) * 1988-02-25 1995-07-31 富士写真フイルム株式会社 感光性組成物
DE4242050A1 (de) * 1992-12-14 1994-06-16 Hoechst Ag Polymere mit N,N-disubstituierten Sulfonamid-Seitengruppen und deren Verwendung
JP2001188386A (ja) * 1999-10-22 2001-07-10 Sekisui Chem Co Ltd 荷電制御樹脂、電子写真用トナー用樹脂組成物及び電子写真用トナー
JP4512281B2 (ja) * 2001-02-22 2010-07-28 富士フイルム株式会社 ネガ型平版印刷版原版
JP4266077B2 (ja) 2001-03-26 2009-05-20 富士フイルム株式会社 平版印刷版原版及び平版印刷方法
KR100994818B1 (ko) * 2002-03-04 2010-11-16 롬 앤드 하스 일렉트로닉 머트어리얼즈, 엘.엘.씨 단파장 이미지화용 네거티브 포토레지스트
JP4137577B2 (ja) * 2002-09-30 2008-08-20 富士フイルム株式会社 感光性組成物
JP2004126050A (ja) * 2002-09-30 2004-04-22 Fuji Photo Film Co Ltd 平版印刷版原版
EP1857276A3 (fr) * 2002-09-30 2007-12-05 FUJIFILM Corporation Plaque d'impression lithographique
US8110337B2 (en) * 2002-12-18 2012-02-07 Fujifilm Corporation Polymerizable composition and lithographic printing plate precursor
JP4150261B2 (ja) * 2003-01-14 2008-09-17 富士フイルム株式会社 平版印刷版原版の製版方法
JP2004252201A (ja) * 2003-02-20 2004-09-09 Fuji Photo Film Co Ltd 平版印刷版原版
JP4048134B2 (ja) * 2003-02-21 2008-02-13 富士フイルム株式会社 平版印刷版原版
JP4048133B2 (ja) * 2003-02-21 2008-02-13 富士フイルム株式会社 感光性組成物及びそれを用いた平版印刷版原版
JP2004252285A (ja) * 2003-02-21 2004-09-09 Fuji Photo Film Co Ltd 感光性組成物及びそれを用いた平版印刷版原版
JP4299639B2 (ja) * 2003-07-29 2009-07-22 富士フイルム株式会社 重合性組成物及びそれを用いた画像記録材料
JP2005099284A (ja) * 2003-09-24 2005-04-14 Fuji Photo Film Co Ltd 感光性組成物及び平版印刷版原版
WO2024018520A1 (fr) 2022-07-19 2024-01-25 日鉄ステンレス株式会社 Fil et ressort en acier inoxydable à haute résistance

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3424730A (en) * 1964-03-06 1969-01-28 Dow Chemical Co Vinylidenearylenealkylene carbamates and polymers thereof
US3422165A (en) * 1964-12-08 1969-01-14 Union Carbide Corp Isocyanate and isothiocyanate compositions and polyurethanes thereof
US3422075A (en) * 1966-07-01 1969-01-14 Polaroid Corp Polymers modified with a monosulfonyl isocyanate
DE1770592A1 (de) * 1968-06-07 1971-11-04 Bayer Ag Verfahren zur Herstellung von Homo- und Copolymerisaten

Also Published As

Publication number Publication date
SE370405B (fr) 1974-10-14
DE2027466A1 (de) 1971-12-09
CA924048A (en) 1973-04-03
BE767960A (fr) 1971-12-01
NL7107159A (fr) 1971-12-07
AT309073B (de) 1973-08-10
FR2094039A1 (fr) 1972-02-04
GB1353542A (en) 1974-05-22
IT944674B (it) 1973-04-20
US3725356A (en) 1973-04-03
JPS542239B1 (fr) 1979-02-03

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Legal Events

Date Code Title Description
ST Notification of lapse