CA924048A - Polymeric n-carbonyl sulfonamides and process for the preparation thereof - Google Patents

Polymeric n-carbonyl sulfonamides and process for the preparation thereof

Info

Publication number
CA924048A
CA924048A CA114465A CA114465A CA924048A CA 924048 A CA924048 A CA 924048A CA 114465 A CA114465 A CA 114465A CA 114465 A CA114465 A CA 114465A CA 924048 A CA924048 A CA 924048A
Authority
CA
Canada
Prior art keywords
sulfonamides
carbonyl
polymeric
preparation
carbonyl sulfonamides
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA114465A
Other languages
English (en)
Other versions
CA114465S (en
Inventor
Klupfel Kurt-Walter
Luders Walter
Steppan Hartmut
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kalle GmbH and Co KG
Original Assignee
Kalle GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle GmbH and Co KG filed Critical Kalle GmbH and Co KG
Application granted granted Critical
Publication of CA924048A publication Critical patent/CA924048A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F28/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/76Photosensitive materials characterised by the base or auxiliary layers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds
    • G03F7/021Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/107Polyamide or polyurethane

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
CA114465A 1970-06-04 1971-06-01 Polymeric n-carbonyl sulfonamides and process for the preparation thereof Expired CA924048A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19702027466 DE2027466A1 (de) 1970-06-04 1970-06-04 Polymere N-Carbonylsulfonamide und Verfahren zu ihrer Herstellung

Publications (1)

Publication Number Publication Date
CA924048A true CA924048A (en) 1973-04-03

Family

ID=5773023

Family Applications (1)

Application Number Title Priority Date Filing Date
CA114465A Expired CA924048A (en) 1970-06-04 1971-06-01 Polymeric n-carbonyl sulfonamides and process for the preparation thereof

Country Status (11)

Country Link
US (1) US3725356A (enExample)
JP (1) JPS542239B1 (enExample)
AT (1) AT309073B (enExample)
BE (1) BE767960A (enExample)
CA (1) CA924048A (enExample)
DE (1) DE2027466A1 (enExample)
FR (1) FR2094039B1 (enExample)
GB (1) GB1353542A (enExample)
IT (1) IT944674B (enExample)
NL (1) NL7107159A (enExample)
SE (1) SE370405B (enExample)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3884702A (en) * 1972-12-14 1975-05-20 Unitika Ltd Photosensitive polyamide composition
US4032344A (en) 1975-01-16 1977-06-28 Eastman Kodak Company Polysulfonamide vesicular binders and processes of forming vesicular images
US4268602A (en) * 1978-12-05 1981-05-19 Toray Industries, Ltd. Photosensitive O-quinone diazide containing composition
JPS6079020A (ja) * 1983-10-06 1985-05-04 Nippon Zeon Co Ltd 新規な水溶性共重合体
JPH0769605B2 (ja) * 1988-02-25 1995-07-31 富士写真フイルム株式会社 感光性組成物
DE4242050A1 (de) * 1992-12-14 1994-06-16 Hoechst Ag Polymere mit N,N-disubstituierten Sulfonamid-Seitengruppen und deren Verwendung
JP2001188386A (ja) * 1999-10-22 2001-07-10 Sekisui Chem Co Ltd 荷電制御樹脂、電子写真用トナー用樹脂組成物及び電子写真用トナー
JP4512281B2 (ja) * 2001-02-22 2010-07-28 富士フイルム株式会社 ネガ型平版印刷版原版
JP4266077B2 (ja) 2001-03-26 2009-05-20 富士フイルム株式会社 平版印刷版原版及び平版印刷方法
JP2005519345A (ja) * 2002-03-04 2005-06-30 ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. 短波長イメージング用ネガ型フォトレジスト
ATE428558T1 (de) * 2002-09-30 2009-05-15 Fujifilm Corp Polymerisierbare zusammensetzung und flachdruckplattenvorläufer
JP4137577B2 (ja) * 2002-09-30 2008-08-20 富士フイルム株式会社 感光性組成物
JP2004126050A (ja) * 2002-09-30 2004-04-22 Fuji Photo Film Co Ltd 平版印刷版原版
CN100590525C (zh) * 2002-12-18 2010-02-17 富士胶片株式会社 可聚合组合物和平版印刷版前体
JP4150261B2 (ja) * 2003-01-14 2008-09-17 富士フイルム株式会社 平版印刷版原版の製版方法
JP2004252201A (ja) * 2003-02-20 2004-09-09 Fuji Photo Film Co Ltd 平版印刷版原版
JP2004252285A (ja) * 2003-02-21 2004-09-09 Fuji Photo Film Co Ltd 感光性組成物及びそれを用いた平版印刷版原版
JP4048134B2 (ja) * 2003-02-21 2008-02-13 富士フイルム株式会社 平版印刷版原版
JP4048133B2 (ja) * 2003-02-21 2008-02-13 富士フイルム株式会社 感光性組成物及びそれを用いた平版印刷版原版
JP4299639B2 (ja) * 2003-07-29 2009-07-22 富士フイルム株式会社 重合性組成物及びそれを用いた画像記録材料
JP2005099284A (ja) * 2003-09-24 2005-04-14 Fuji Photo Film Co Ltd 感光性組成物及び平版印刷版原版
CN115843320B (zh) 2022-07-19 2024-01-02 日铁不锈钢株式会社 高强度不锈钢丝及弹簧

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3424730A (en) * 1964-03-06 1969-01-28 Dow Chemical Co Vinylidenearylenealkylene carbamates and polymers thereof
US3422165A (en) * 1964-12-08 1969-01-14 Union Carbide Corp Isocyanate and isothiocyanate compositions and polyurethanes thereof
US3422075A (en) * 1966-07-01 1969-01-14 Polaroid Corp Polymers modified with a monosulfonyl isocyanate
DE1770592A1 (de) * 1968-06-07 1971-11-04 Bayer Ag Verfahren zur Herstellung von Homo- und Copolymerisaten

Also Published As

Publication number Publication date
US3725356A (en) 1973-04-03
FR2094039B1 (enExample) 1975-09-26
BE767960A (fr) 1971-12-01
IT944674B (it) 1973-04-20
DE2027466A1 (de) 1971-12-09
GB1353542A (en) 1974-05-22
AT309073B (de) 1973-08-10
JPS542239B1 (enExample) 1979-02-03
NL7107159A (enExample) 1971-12-07
SE370405B (enExample) 1974-10-14
FR2094039A1 (enExample) 1972-02-04

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