GB1352654A - Ion source which makes use of a microwave resonant cavity - Google Patents

Ion source which makes use of a microwave resonant cavity

Info

Publication number
GB1352654A
GB1352654A GB3521172A GB3521172A GB1352654A GB 1352654 A GB1352654 A GB 1352654A GB 3521172 A GB3521172 A GB 3521172A GB 3521172 A GB3521172 A GB 3521172A GB 1352654 A GB1352654 A GB 1352654A
Authority
GB
United Kingdom
Prior art keywords
cylinder
ion source
july
magnetic field
soft iron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3521172A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Publication of GB1352654A publication Critical patent/GB1352654A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Plasma Technology (AREA)
GB3521172A 1971-07-29 1972-07-27 Ion source which makes use of a microwave resonant cavity Expired GB1352654A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7127812A FR2147497A5 (enExample) 1971-07-29 1971-07-29

Publications (1)

Publication Number Publication Date
GB1352654A true GB1352654A (en) 1974-05-08

Family

ID=9081130

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3521172A Expired GB1352654A (en) 1971-07-29 1972-07-27 Ion source which makes use of a microwave resonant cavity

Country Status (4)

Country Link
US (1) US3778656A (enExample)
DE (2) DE7228091U (enExample)
FR (1) FR2147497A5 (enExample)
GB (1) GB1352654A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3144016A1 (de) * 1980-11-05 1982-07-08 Mitsubishi Denki K.K., Tokyo Plasmabehandlungsapparat
WO2009048739A2 (en) 2007-10-10 2009-04-16 Mks Instruments, Inc. Chemical ionization reaction or proton transfer reaction mass spectrometry with a quadrupole or time-of-flight mass spectrometer

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2621824C2 (de) * 1976-05-17 1982-04-29 Hitachi, Ltd., Tokyo Mikrowellen-Entladungs-Ionenquelle
US4185213A (en) * 1977-08-31 1980-01-22 Reynolds Metals Company Gaseous electrode for MHD generator
JPS55131175A (en) * 1979-03-30 1980-10-11 Toshiba Corp Surface treatment apparatus with microwave plasma
US4240007A (en) * 1979-06-29 1980-12-16 International Business Machines Corporation Microchannel ion gun
US4393333A (en) * 1979-12-10 1983-07-12 Hitachi, Ltd. Microwave plasma ion source
FR2475798A1 (fr) * 1980-02-13 1981-08-14 Commissariat Energie Atomique Procede et dispositif de production d'ions lourds fortement charges et une application mettant en oeuvre le procede
JPS5947421B2 (ja) * 1980-03-24 1984-11-19 株式会社日立製作所 マイクロ波イオン源
CA1159012A (en) * 1980-05-02 1983-12-20 Seitaro Matsuo Plasma deposition apparatus
JPS6043620B2 (ja) * 1982-11-25 1985-09-28 日新ハイボルテージ株式会社 マイクロ波イオン源
US4507588A (en) * 1983-02-28 1985-03-26 Board Of Trustees Operating Michigan State University Ion generating apparatus and method for the use thereof
FR2546358B1 (fr) * 1983-05-20 1985-07-05 Commissariat Energie Atomique Source d'ions a resonance cyclotronique des electrons
FR2572847B1 (fr) * 1984-11-06 1986-12-26 Commissariat Energie Atomique Procede et dispositif d'allumage d'une source d'ions hyperfrequence
US4649278A (en) * 1985-05-02 1987-03-10 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Generation of intense negative ion beams
DE3703207A1 (de) * 1987-02-04 1988-08-18 Loet Und Schweissgeraete Gmbh Hochfrequenzionenquelle
DE3712971A1 (de) * 1987-04-16 1988-11-03 Plasonic Oberflaechentechnik G Verfahren und vorrichtung zum erzeugen eines plasmas
US4778561A (en) * 1987-10-30 1988-10-18 Veeco Instruments, Inc. Electron cyclotron resonance plasma source
DE3738352A1 (de) * 1987-11-11 1989-05-24 Technics Plasma Gmbh Filamentloses magnetron-ionenstrahlsystem
DE3803355A1 (de) * 1988-02-05 1989-08-17 Leybold Ag Teilchenquelle fuer eine reaktive ionenstrahlaetz- oder plasmadepositionsanlage
DE68926923T2 (de) * 1988-03-16 1996-12-19 Hitachi Ltd Mikrowellenionenquelle
DE3834984A1 (de) * 1988-10-14 1990-04-19 Leybold Ag Einrichtung zur erzeugung von elektrisch geladenen und/oder ungeladenen teilchen
GB9224745D0 (en) * 1992-11-26 1993-01-13 Atomic Energy Authority Uk Microwave plasma generator
DE19513345C2 (de) * 1995-04-08 2000-08-03 Ehret Hans P ECR-Ionenquelle
DE19600223A1 (de) * 1996-01-05 1997-07-17 Ralf Dr Dipl Phys Spitzl Vorrichtung zur Erzeugung von Plasmen mittels Mikrowellen
DE19608949A1 (de) * 1996-03-08 1997-09-11 Ralf Dr Spitzl Vorrichtung zur Erzeugung von leistungsfähigen Mikrowellenplasmen
DE19757852C2 (de) 1997-12-24 2001-06-28 Karlsruhe Forschzent Vorrichtung und Verfahren zur Dotierung von Gefäßstützen mit radiaktiven und nicht radioaktiven Atomen
DE19900437B4 (de) * 1999-01-11 2009-04-23 Ehret, Hans-P. Verfahren und Vorrichtung zur Ionenimplantation in Festkörpern und/oder zur Beschichtung von Festkörperoberflächen sowie die Verwendung von Verfahren und Vorrichtung
US7461502B2 (en) * 2003-03-20 2008-12-09 Elwing Llc Spacecraft thruster
EP1460267B1 (en) * 2003-03-20 2006-08-09 Elwing LLC Spacecraft thruster
EP1640608B1 (en) * 2004-09-22 2010-01-06 Elwing LLC Spacecraft thruster
NL2014415B1 (en) * 2015-03-06 2016-10-13 Jiaco Instr Holding B V System and method for decapsulation of plastic integrated circuit packages.
CN106102301B (zh) * 2016-07-29 2019-01-29 中国原子能科学研究院 紧凑型超导质子回旋加速器中可耐高压的静电偏转板
ES2696227B2 (es) * 2018-07-10 2019-06-12 Centro De Investig Energeticas Medioambientales Y Tecnologicas Ciemat Fuente de iones interna para ciclotrones de baja erosion

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3418206A (en) * 1963-04-29 1968-12-24 Boeing Co Particle accelerator

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3144016A1 (de) * 1980-11-05 1982-07-08 Mitsubishi Denki K.K., Tokyo Plasmabehandlungsapparat
WO2009048739A2 (en) 2007-10-10 2009-04-16 Mks Instruments, Inc. Chemical ionization reaction or proton transfer reaction mass spectrometry with a quadrupole or time-of-flight mass spectrometer
EP2212903B1 (en) * 2007-10-10 2014-08-27 MKS Instruments, Inc. Chemical ionization reaction or proton transfer reaction mass spectrometry with a quadrupole or time-of-flight mass spectrometer

Also Published As

Publication number Publication date
US3778656A (en) 1973-12-11
DE7228091U (de) 1973-09-20
FR2147497A5 (enExample) 1973-03-09
DE2237252A1 (de) 1973-02-01

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
435 Patent endorsed 'licences of right' on the date specified (sect. 35/1949)
PCNP Patent ceased through non-payment of renewal fee