DE2237252A1 - Ionenquelle mit hochfrequenz-hohlraumresonator - Google Patents
Ionenquelle mit hochfrequenz-hohlraumresonatorInfo
- Publication number
- DE2237252A1 DE2237252A1 DE2237252A DE2237252A DE2237252A1 DE 2237252 A1 DE2237252 A1 DE 2237252A1 DE 2237252 A DE2237252 A DE 2237252A DE 2237252 A DE2237252 A DE 2237252A DE 2237252 A1 DE2237252 A1 DE 2237252A1
- Authority
- DE
- Germany
- Prior art keywords
- cavity
- ion source
- magnetic field
- source according
- static magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 150000002500 ions Chemical class 0.000 claims description 34
- 230000005684 electric field Effects 0.000 claims description 23
- 230000003068 static effect Effects 0.000 claims description 23
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 10
- 238000000605 extraction Methods 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 229910052742 iron Inorganic materials 0.000 claims description 4
- 210000002381 plasma Anatomy 0.000 description 31
- 230000005284 excitation Effects 0.000 description 10
- 238000009826 distribution Methods 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 239000004020 conductor Substances 0.000 description 4
- 230000008878 coupling Effects 0.000 description 4
- 238000010168 coupling process Methods 0.000 description 4
- 238000005859 coupling reaction Methods 0.000 description 4
- 230000003993 interaction Effects 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 229920001875 Ebonite Polymers 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
- H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Electron Sources, Ion Sources (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7127812A FR2147497A5 (enExample) | 1971-07-29 | 1971-07-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2237252A1 true DE2237252A1 (de) | 1973-02-01 |
Family
ID=9081130
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19727228091U Expired DE7228091U (de) | 1971-07-29 | 1972-07-28 | Ionenquelle mit hochfrequenz-hohlraumresonator |
| DE2237252A Pending DE2237252A1 (de) | 1971-07-29 | 1972-07-28 | Ionenquelle mit hochfrequenz-hohlraumresonator |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19727228091U Expired DE7228091U (de) | 1971-07-29 | 1972-07-28 | Ionenquelle mit hochfrequenz-hohlraumresonator |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US3778656A (enExample) |
| DE (2) | DE7228091U (enExample) |
| FR (1) | FR2147497A5 (enExample) |
| GB (1) | GB1352654A (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0020899A1 (de) * | 1979-06-29 | 1981-01-07 | International Business Machines Corporation | Ionengenerator |
| DE3703207A1 (de) * | 1987-02-04 | 1988-08-18 | Loet Und Schweissgeraete Gmbh | Hochfrequenzionenquelle |
| DE19757852A1 (de) * | 1997-12-24 | 1999-07-08 | Karlsruhe Forschzent | Implantation von radioaktiven ·3··2·P-Atomen |
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2621824C2 (de) * | 1976-05-17 | 1982-04-29 | Hitachi, Ltd., Tokyo | Mikrowellen-Entladungs-Ionenquelle |
| US4185213A (en) * | 1977-08-31 | 1980-01-22 | Reynolds Metals Company | Gaseous electrode for MHD generator |
| JPS55131175A (en) * | 1979-03-30 | 1980-10-11 | Toshiba Corp | Surface treatment apparatus with microwave plasma |
| US4393333A (en) * | 1979-12-10 | 1983-07-12 | Hitachi, Ltd. | Microwave plasma ion source |
| FR2475798A1 (fr) * | 1980-02-13 | 1981-08-14 | Commissariat Energie Atomique | Procede et dispositif de production d'ions lourds fortement charges et une application mettant en oeuvre le procede |
| JPS5947421B2 (ja) * | 1980-03-24 | 1984-11-19 | 株式会社日立製作所 | マイクロ波イオン源 |
| CA1159012A (en) * | 1980-05-02 | 1983-12-20 | Seitaro Matsuo | Plasma deposition apparatus |
| JPS5779621A (en) * | 1980-11-05 | 1982-05-18 | Mitsubishi Electric Corp | Plasma processing device |
| JPS6043620B2 (ja) * | 1982-11-25 | 1985-09-28 | 日新ハイボルテージ株式会社 | マイクロ波イオン源 |
| US4507588A (en) * | 1983-02-28 | 1985-03-26 | Board Of Trustees Operating Michigan State University | Ion generating apparatus and method for the use thereof |
| FR2546358B1 (fr) * | 1983-05-20 | 1985-07-05 | Commissariat Energie Atomique | Source d'ions a resonance cyclotronique des electrons |
| FR2572847B1 (fr) * | 1984-11-06 | 1986-12-26 | Commissariat Energie Atomique | Procede et dispositif d'allumage d'une source d'ions hyperfrequence |
| US4649278A (en) * | 1985-05-02 | 1987-03-10 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Generation of intense negative ion beams |
| DE3712971A1 (de) * | 1987-04-16 | 1988-11-03 | Plasonic Oberflaechentechnik G | Verfahren und vorrichtung zum erzeugen eines plasmas |
| US4778561A (en) * | 1987-10-30 | 1988-10-18 | Veeco Instruments, Inc. | Electron cyclotron resonance plasma source |
| DE3738352A1 (de) * | 1987-11-11 | 1989-05-24 | Technics Plasma Gmbh | Filamentloses magnetron-ionenstrahlsystem |
| DE3803355A1 (de) * | 1988-02-05 | 1989-08-17 | Leybold Ag | Teilchenquelle fuer eine reaktive ionenstrahlaetz- oder plasmadepositionsanlage |
| DE68926923T2 (de) * | 1988-03-16 | 1996-12-19 | Hitachi Ltd | Mikrowellenionenquelle |
| DE3834984A1 (de) * | 1988-10-14 | 1990-04-19 | Leybold Ag | Einrichtung zur erzeugung von elektrisch geladenen und/oder ungeladenen teilchen |
| GB9224745D0 (en) * | 1992-11-26 | 1993-01-13 | Atomic Energy Authority Uk | Microwave plasma generator |
| DE19513345C2 (de) * | 1995-04-08 | 2000-08-03 | Ehret Hans P | ECR-Ionenquelle |
| DE19600223A1 (de) * | 1996-01-05 | 1997-07-17 | Ralf Dr Dipl Phys Spitzl | Vorrichtung zur Erzeugung von Plasmen mittels Mikrowellen |
| DE19608949A1 (de) * | 1996-03-08 | 1997-09-11 | Ralf Dr Spitzl | Vorrichtung zur Erzeugung von leistungsfähigen Mikrowellenplasmen |
| DE19900437B4 (de) * | 1999-01-11 | 2009-04-23 | Ehret, Hans-P. | Verfahren und Vorrichtung zur Ionenimplantation in Festkörpern und/oder zur Beschichtung von Festkörperoberflächen sowie die Verwendung von Verfahren und Vorrichtung |
| DE60307418T2 (de) | 2003-03-20 | 2007-03-29 | Elwing LLC, Wilmington | Antriebssystem für Raumfahrzeuge |
| US7461502B2 (en) * | 2003-03-20 | 2008-12-09 | Elwing Llc | Spacecraft thruster |
| EP1640608B1 (en) * | 2004-09-22 | 2010-01-06 | Elwing LLC | Spacecraft thruster |
| WO2009048739A2 (en) | 2007-10-10 | 2009-04-16 | Mks Instruments, Inc. | Chemical ionization reaction or proton transfer reaction mass spectrometry with a quadrupole or time-of-flight mass spectrometer |
| NL2014415B1 (en) * | 2015-03-06 | 2016-10-13 | Jiaco Instr Holding B V | System and method for decapsulation of plastic integrated circuit packages. |
| CN106102301B (zh) * | 2016-07-29 | 2019-01-29 | 中国原子能科学研究院 | 紧凑型超导质子回旋加速器中可耐高压的静电偏转板 |
| ES2696227B2 (es) * | 2018-07-10 | 2019-06-12 | Centro De Investig Energeticas Medioambientales Y Tecnologicas Ciemat | Fuente de iones interna para ciclotrones de baja erosion |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3418206A (en) * | 1963-04-29 | 1968-12-24 | Boeing Co | Particle accelerator |
-
1971
- 1971-07-29 FR FR7127812A patent/FR2147497A5/fr not_active Expired
-
1972
- 1972-07-26 US US00275304A patent/US3778656A/en not_active Expired - Lifetime
- 1972-07-27 GB GB3521172A patent/GB1352654A/en not_active Expired
- 1972-07-28 DE DE19727228091U patent/DE7228091U/de not_active Expired
- 1972-07-28 DE DE2237252A patent/DE2237252A1/de active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0020899A1 (de) * | 1979-06-29 | 1981-01-07 | International Business Machines Corporation | Ionengenerator |
| DE3703207A1 (de) * | 1987-02-04 | 1988-08-18 | Loet Und Schweissgeraete Gmbh | Hochfrequenzionenquelle |
| DE19757852A1 (de) * | 1997-12-24 | 1999-07-08 | Karlsruhe Forschzent | Implantation von radioaktiven ·3··2·P-Atomen |
| DE19757852C2 (de) * | 1997-12-24 | 2001-06-28 | Karlsruhe Forschzent | Vorrichtung und Verfahren zur Dotierung von Gefäßstützen mit radiaktiven und nicht radioaktiven Atomen |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2147497A5 (enExample) | 1973-03-09 |
| DE7228091U (de) | 1973-09-20 |
| GB1352654A (en) | 1974-05-08 |
| US3778656A (en) | 1973-12-11 |
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