GB1321861A - Vacuum deposition - Google Patents

Vacuum deposition

Info

Publication number
GB1321861A
GB1321861A GB1321861DA GB1321861A GB 1321861 A GB1321861 A GB 1321861A GB 1321861D A GB1321861D A GB 1321861DA GB 1321861 A GB1321861 A GB 1321861A
Authority
GB
United Kingdom
Prior art keywords
canister
chamber
disc
substrates
coated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ultra Electronics Ltd
Original Assignee
Ultra Electronics Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ultra Electronics Ltd filed Critical Ultra Electronics Ltd
Publication of GB1321861A publication Critical patent/GB1321861A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

1321861 Coating by vapour deposition or sputtering ULTRA ELECTRONICS Ltd 14 Dec 1970 [13 Jan 1970] 1495/70 Heading C7F A vapour deposition, e.g. sputtering apparatus has two vacuum chambers 1, 2 each connected (at 6, 7) to separate vacuum producing pumps. A gate valve 3 inter-connects the chambers 1, 2. A batch of substrates 15 to be coated in a transport canister 5 is placed in chamber 1 and the chamber pumped down. With the valve 3 open a ram 4 raises the canister 5 of substrates into the chamber 2 which is at a harder vacuum than chamber 1. In the chamber 1, a disc 20 rotates to position the canister 5 at 19 which is 120 degrees rotationally spaced from the incoming position (L) above the valve. 120 degrees rotationally spaced from the incoming position (L) and the position 19 is a further position (U) where a canister of coated substrates is situated. After the rotation has taken place the canister of coated substrates lies above the ram 4 and is removed from the chamber. From position 19 individual substrates 15 are removed from the canister 5 by a transfer mechanism (not shown) through an aperture (not shown) in a stationary disc 12 and lodged within an aperture 17 of a rotating disc 11. The disc 11 then rotates 120 degrees to bring the substrate beneath a sputtering cathode comprising an aluminium ring encircling a disc of tantalum. The disc 11 further rotates 120 degrees to bring the coated substrate above the position (U) where the coated substrate is deposited.
GB1321861D 1970-01-13 1970-01-13 Vacuum deposition Expired GB1321861A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB149570 1970-01-13

Publications (1)

Publication Number Publication Date
GB1321861A true GB1321861A (en) 1973-07-04

Family

ID=9722987

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1321861D Expired GB1321861A (en) 1970-01-13 1970-01-13 Vacuum deposition

Country Status (2)

Country Link
DE (1) DE2100725A1 (en)
GB (1) GB1321861A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2193731A (en) * 1986-07-23 1988-02-17 Boc Group Inc Wafer processing apparatus having wafer transporting and storage means
GB2239346A (en) * 1989-12-14 1991-06-26 Jersey Nuclear Avco Isotopes Modular processing system
US5185757A (en) * 1989-12-14 1993-02-09 Jersey Nuclear-Avco Isotopes, Inc. Modularized replaceable vaporizer and extractor apparatus

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3981791A (en) * 1975-03-10 1976-09-21 Signetics Corporation Vacuum sputtering apparatus
DE2653736A1 (en) * 1976-11-26 1978-06-01 Bosch Gmbh Robert METHOD AND DEVICE FOR CONTINUOUS COATING OF GLASS OR CERAMIC SUBSTRATES USING CATHODE SPRAYING
JPS61291032A (en) * 1985-06-17 1986-12-20 Fujitsu Ltd Vacuum apparatus
US4733631B1 (en) * 1986-09-30 1993-03-09 Apparatus for coating substrate devices
GB9101106D0 (en) * 1991-01-18 1991-02-27 Cray Microcoat Ltd Ion vapour deposition apparatus and method
US5660693A (en) * 1991-01-18 1997-08-26 Applied Vision Limited Ion vapour deposition apparatus and method
DE4407909C3 (en) * 1994-03-09 2003-05-15 Unaxis Deutschland Holding Method and device for the continuous or quasi-continuous coating of spectacle lenses

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2193731A (en) * 1986-07-23 1988-02-17 Boc Group Inc Wafer processing apparatus having wafer transporting and storage means
GB2239346A (en) * 1989-12-14 1991-06-26 Jersey Nuclear Avco Isotopes Modular processing system
US5085410A (en) * 1989-12-14 1992-02-04 Jersey Nuclear-Avco Isotopes, Inc. Modular processing system
US5185757A (en) * 1989-12-14 1993-02-09 Jersey Nuclear-Avco Isotopes, Inc. Modularized replaceable vaporizer and extractor apparatus
GB2239346B (en) * 1989-12-14 1994-08-31 Jersey Nuclear Avco Isotopes Modular processing system

Also Published As

Publication number Publication date
DE2100725A1 (en) 1971-07-22

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Legal Events

Date Code Title Description
PS Patent sealed
732 Registration of transactions, instruments or events in the register (sect. 32/1977)
732 Registration of transactions, instruments or events in the register (sect. 32/1977)
PCNP Patent ceased through non-payment of renewal fee