GB1314923A - Method of manufacturing an insulated gate type field effect device - Google Patents
Method of manufacturing an insulated gate type field effect deviceInfo
- Publication number
- GB1314923A GB1314923A GB2779271A GB2779271A GB1314923A GB 1314923 A GB1314923 A GB 1314923A GB 2779271 A GB2779271 A GB 2779271A GB 2779271 A GB2779271 A GB 2779271A GB 1314923 A GB1314923 A GB 1314923A
- Authority
- GB
- United Kingdom
- Prior art keywords
- oxide layer
- regions
- manufacturing
- field effect
- type field
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
- H10W10/01—Manufacture or treatment
- H10W10/011—Manufacture or treatment of isolation regions comprising dielectric materials
- H10W10/012—Manufacture or treatment of isolation regions comprising dielectric materials using local oxidation of silicon [LOCOS]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
- H10W10/10—Isolation regions comprising dielectric materials
- H10W10/13—Isolation regions comprising dielectric materials formed using local oxidation of silicon [LOCOS], e.g. sealed interface localised oxidation [SILO] or side-wall mask isolation [SWAMI]
Landscapes
- Formation Of Insulating Films (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
- Element Separation (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5100170 | 1970-06-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1314923A true GB1314923A (en) | 1973-04-26 |
Family
ID=12874527
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB2779271A Expired GB1314923A (en) | 1970-06-15 | 1971-06-14 | Method of manufacturing an insulated gate type field effect device |
Country Status (3)
| Country | Link |
|---|---|
| DE (1) | DE2128470A1 (https=) |
| FR (1) | FR2095259B1 (https=) |
| GB (1) | GB1314923A (https=) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL152707B (nl) * | 1967-06-08 | 1977-03-15 | Philips Nv | Halfgeleiderinrichting bevattende een veldeffecttransistor van het type met geisoleerde poortelektrode en werkwijze ter vervaardiging daarvan. |
-
1971
- 1971-06-08 DE DE19712128470 patent/DE2128470A1/de active Pending
- 1971-06-14 GB GB2779271A patent/GB1314923A/en not_active Expired
- 1971-06-14 FR FR7121454A patent/FR2095259B1/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2128470A1 (de) | 1972-01-20 |
| FR2095259A1 (https=) | 1972-02-11 |
| FR2095259B1 (https=) | 1975-07-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| PLNP | Patent lapsed through nonpayment of renewal fees |