GB1295465A - - Google Patents
Info
- Publication number
- GB1295465A GB1295465A GB1295465DA GB1295465A GB 1295465 A GB1295465 A GB 1295465A GB 1295465D A GB1295465D A GB 1295465DA GB 1295465 A GB1295465 A GB 1295465A
- Authority
- GB
- United Kingdom
- Prior art keywords
- electrode
- ion beam
- extractor
- beam apparatus
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910000838 Al alloy Inorganic materials 0.000 abstract 1
- 238000010894 electron beam technology Methods 0.000 abstract 1
- 238000000605 extraction Methods 0.000 abstract 1
- 238000001659 ion-beam spectroscopy Methods 0.000 abstract 1
- 238000010884 ion-beam technique Methods 0.000 abstract 1
- 238000002294 plasma sputter deposition Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/46—Sputtering by ion beam produced by an external ion source
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB5503969 | 1969-11-11 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1295465A true GB1295465A (nl) | 1972-11-08 |
Family
ID=10472776
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1295465D Expired GB1295465A (nl) | 1969-11-11 | 1969-11-11 |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB1295465A (nl) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5296122A (en) * | 1989-03-29 | 1994-03-22 | Teruaki Katsube | Apparatus for forming thin film |
US5741404A (en) * | 1996-05-24 | 1998-04-21 | Micron Technology, Inc. | Multi-planar angulated sputtering target and method of use for filling openings |
WO2002048424A1 (en) * | 2000-12-14 | 2002-06-20 | Nordiko Limited | Ion beam sputtering apparatus |
WO2008009898A1 (en) * | 2006-07-20 | 2008-01-24 | Aviza Technology Limited | Ion sources |
US8400063B2 (en) | 2006-07-20 | 2013-03-19 | Aviza Technology Limited | Plasma sources |
US8425741B2 (en) | 2006-07-20 | 2013-04-23 | Aviza Technology Limited | Ion deposition apparatus having rotatable carousel for supporting a plurality of targets |
-
1969
- 1969-11-11 GB GB1295465D patent/GB1295465A/en not_active Expired
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5296122A (en) * | 1989-03-29 | 1994-03-22 | Teruaki Katsube | Apparatus for forming thin film |
US5741404A (en) * | 1996-05-24 | 1998-04-21 | Micron Technology, Inc. | Multi-planar angulated sputtering target and method of use for filling openings |
WO2002048424A1 (en) * | 2000-12-14 | 2002-06-20 | Nordiko Limited | Ion beam sputtering apparatus |
WO2008009898A1 (en) * | 2006-07-20 | 2008-01-24 | Aviza Technology Limited | Ion sources |
CN101490789B (zh) * | 2006-07-20 | 2011-04-13 | 阿维扎技术有限公司 | 离子源 |
US8354652B2 (en) | 2006-07-20 | 2013-01-15 | Aviza Technology Limited | Ion source including separate support systems for accelerator grids |
US8400063B2 (en) | 2006-07-20 | 2013-03-19 | Aviza Technology Limited | Plasma sources |
US8425741B2 (en) | 2006-07-20 | 2013-04-23 | Aviza Technology Limited | Ion deposition apparatus having rotatable carousel for supporting a plurality of targets |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PLNP | Patent lapsed through nonpayment of renewal fees |