GB1278802A - Apparatus for forming oxide articles - Google Patents
Apparatus for forming oxide articlesInfo
- Publication number
- GB1278802A GB1278802A GB31034/69A GB3103469A GB1278802A GB 1278802 A GB1278802 A GB 1278802A GB 31034/69 A GB31034/69 A GB 31034/69A GB 3103469 A GB3103469 A GB 3103469A GB 1278802 A GB1278802 A GB 1278802A
- Authority
- GB
- United Kingdom
- Prior art keywords
- mandrel
- stream
- oxides
- metal compound
- volatile
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011248 coating agent Substances 0.000 abstract 2
- 238000000576 coating method Methods 0.000 abstract 2
- 150000002736 metal compounds Chemical class 0.000 abstract 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 1
- 150000001805 chlorine compounds Chemical class 0.000 abstract 1
- 238000002485 combustion reaction Methods 0.000 abstract 1
- 238000000354 decomposition reaction Methods 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 230000007062 hydrolysis Effects 0.000 abstract 1
- 238000006460 hydrolysis reaction Methods 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 150000002739 metals Chemical class 0.000 abstract 1
- 230000000737 periodic effect Effects 0.000 abstract 1
- 239000000376 reactant Substances 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 abstract 1
- 229910010271 silicon carbide Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
- C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G1/00—Methods of preparing compounds of metals not covered by subclasses C01B, C01C, C01D, or C01F, in general
- C01G1/06—Halides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
- C03B19/1423—Reactant deposition burners
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1484—Means for supporting, rotating or translating the article being formed
- C03B19/1492—Deposition substrates, e.g. targets
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/04—Multi-nested ports
- C03B2207/06—Concentric circular ports
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/04—Multi-nested ports
- C03B2207/12—Nozzle or orifice plates
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/20—Specific substances in specified ports, e.g. all gas flows specified
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/42—Assembly details; Material or dimensions of burner; Manifolds or supports
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Chemical Vapour Deposition (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US74456868A | 1968-07-12 | 1968-07-12 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1278802A true GB1278802A (en) | 1972-06-21 |
Family
ID=24993182
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB31034/69A Expired GB1278802A (en) | 1968-07-12 | 1969-06-19 | Apparatus for forming oxide articles |
Country Status (5)
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL6915771A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1968-10-30 | 1970-05-04 | ||
DE2009459A1 (de) * | 1970-02-28 | 1971-09-09 | Consortium Elektrochem Ind | Verfahren zur Herstellung von Sihciumformkorpern |
GB1384319A (en) * | 1971-04-19 | 1975-02-19 | Sherwood Refractories | Vitreous silica and process and apparatus for making same |
US3961003A (en) * | 1972-05-17 | 1976-06-01 | Dow Corning Corporation | Method and apparatus for making elongated Si and SiC structures |
US4058579A (en) * | 1975-02-27 | 1977-11-15 | Union Carbide Corporation | Process for producing an improved boron nitride crucible |
US3971336A (en) * | 1975-06-27 | 1976-07-27 | Owens-Corning Fiberglas Corporation | Control system for controlling translation speed of carriage with respect to rotational speed of mandrel |
US4204850A (en) * | 1977-08-26 | 1980-05-27 | Corning Glass Works | Carbon coating for a starting member used in producing optical waveguide |
US4264803A (en) * | 1978-01-10 | 1981-04-28 | Union Carbide Corporation | Resistance-heated pyrolytic boron nitride coated graphite boat for metal vaporization |
DE3001371C2 (de) * | 1980-01-16 | 1983-10-27 | Langlet, Weber KG Oberflächenveredlung Nachf., 5270 Gummersbach | Verfahren zur Herstellung eines keramischen, bindemittelfreien Hohlkörpers |
US4935046A (en) * | 1987-12-03 | 1990-06-19 | Shin-Etsu Handotai Company, Limited | Manufacture of a quartz glass vessel for the growth of single crystal semiconductor |
US5609922A (en) | 1994-12-05 | 1997-03-11 | Mcdonald; Robert R. | Method of manufacturing molds, dies or forming tools having a cavity formed by thermal spraying |
DE102004017572B3 (de) * | 2004-04-07 | 2005-11-24 | Heraeus Tenevo Ag | Verfahren zur Herstellung eines Hohlzylinders aus synthetischem Quarzglas unter Einsatz einer Haltevorrichtung |
CN105210173A (zh) * | 2013-05-23 | 2015-12-30 | 应用材料公司 | 用于半导体处理腔室的经涂布的衬里组件 |
-
1968
- 1968-07-12 US US744568A patent/US3609829A/en not_active Expired - Lifetime
-
1969
- 1969-06-19 GB GB31034/69A patent/GB1278802A/en not_active Expired
- 1969-07-10 DE DE19691934932 patent/DE1934932A1/de active Pending
- 1969-07-10 FR FR6923469A patent/FR2022101A1/fr not_active Withdrawn
- 1969-07-11 NL NL6910695A patent/NL6910695A/xx unknown
Also Published As
Publication number | Publication date |
---|---|
FR2022101A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1970-07-31 |
US3609829A (en) | 1971-10-05 |
NL6910695A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1970-01-14 |
DE1934932A1 (de) | 1970-01-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed [section 19, patents act 1949] | ||
PLNP | Patent lapsed through nonpayment of renewal fees |