GB1269156A - Electron beam apparatus for recording image elements - Google Patents

Electron beam apparatus for recording image elements

Info

Publication number
GB1269156A
GB1269156A GB26485/69A GB2648569A GB1269156A GB 1269156 A GB1269156 A GB 1269156A GB 26485/69 A GB26485/69 A GB 26485/69A GB 2648569 A GB2648569 A GB 2648569A GB 1269156 A GB1269156 A GB 1269156A
Authority
GB
United Kingdom
Prior art keywords
biprism
cylinder
diaphragm
quadrupole lenses
axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB26485/69A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NL CENTRALE ORGANISTATIE VOOR
Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek TNO
Original Assignee
NL CENTRALE ORGANISTATIE VOOR
Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek TNO
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NL CENTRALE ORGANISTATIE VOOR, Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek TNO filed Critical NL CENTRALE ORGANISTATIE VOOR
Publication of GB1269156A publication Critical patent/GB1269156A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/04—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using optical elements ; using other beam accessed elements, e.g. electron or ion beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/151—Electrostatic means
    • H01J2237/1514—Prisms
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S101/00—Printing
    • Y10S101/37—Printing employing electrostatic force

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
GB26485/69A 1968-05-27 1969-05-23 Electron beam apparatus for recording image elements Expired GB1269156A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL6807439A NL6807439A (pt) 1968-05-27 1968-05-27

Publications (1)

Publication Number Publication Date
GB1269156A true GB1269156A (en) 1972-04-06

Family

ID=19803740

Family Applications (1)

Application Number Title Priority Date Filing Date
GB26485/69A Expired GB1269156A (en) 1968-05-27 1969-05-23 Electron beam apparatus for recording image elements

Country Status (5)

Country Link
US (1) US3638231A (pt)
CA (1) CA921548A (pt)
DE (1) DE1926849A1 (pt)
GB (1) GB1269156A (pt)
NL (1) NL6807439A (pt)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4445041A (en) * 1981-06-02 1984-04-24 Hewlett-Packard Company Electron beam blanker

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1301030B (de) * 1967-10-19 1969-08-14 Hakle Werke Hans Klenk Halter fuer Papierrollen
US4041532A (en) * 1971-04-28 1977-08-09 Decca Limited Of Decca House Method of recording wide-band signals on a thermoplastic film by use of a beam of electrons
US3750189A (en) * 1971-10-18 1973-07-31 Ibm Light scanning and printing system
DE2241850C3 (de) * 1972-08-25 1978-06-29 European Rotogravure Association, 8000 Muenchen Verfahren zur Herstellung von Druckformen mittels eines Energiestrahles
US4000440A (en) * 1974-07-26 1976-12-28 International Business Machines Corporation Method and apparatus for controlling brightness and alignment of a beam of charged particles
JPS5129091A (ja) * 1974-09-06 1976-03-11 Kogyo Gijutsuin Pataankeiseisochi
US4010318A (en) * 1975-05-20 1977-03-01 Rca Corporation Probe forming electron optical column having means for examining magnified image of the probe source
US3956635A (en) * 1975-06-13 1976-05-11 International Business Machines Corporation Combined multiple beam size and spiral scan method for electron beam writing of microcircuit patterns
JPS5251871A (en) * 1975-10-23 1977-04-26 Rikagaku Kenkyusho Projecting method for charge particle beams
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device
US4393312A (en) * 1976-02-05 1983-07-12 Bell Telephone Laboratories, Incorporated Variable-spot scanning in an electron beam exposure system
GB1523033A (en) * 1976-03-03 1978-08-31 Crosfield Electronics Ltd Image reproducing systems
JPS52126760U (pt) * 1976-03-24 1977-09-27
JPS52122083A (en) * 1976-04-02 1977-10-13 Jeol Ltd Electron beam exposing device
NL177578C (nl) * 1976-05-14 1985-10-16 Thomson Csf Inrichting voor het beschrijven van een voorwerp met een deeltjesbundel.
JPS6051261B2 (ja) * 1976-05-26 1985-11-13 株式会社東芝 荷電粒子ビ−ム描画装置
JPS52151568A (en) * 1976-06-11 1977-12-16 Jeol Ltd Electron beam exposure apparatus
DE2627632A1 (de) * 1976-06-19 1977-12-22 Jenoptik Jena Gmbh Verfahren und einrichtung zur nichtthermischen elektronenstrahlbearbeitung
FR2361190A1 (fr) * 1976-08-09 1978-03-10 Zeiss Carl Fa Procede et dispositif d'usinage a froid par faisceau electronique
JPS5625233Y2 (pt) * 1976-09-01 1981-06-15
JPS6040186B2 (ja) * 1976-11-04 1985-09-10 富士通株式会社 磁場形成装置
CA1166766A (en) * 1977-02-23 1984-05-01 Hans C. Pfeiffer Method and apparatus for forming a variable size electron beam
FR2412939A1 (fr) * 1977-12-23 1979-07-20 Anvar Implanteur d'ions a fort courant
US4277685A (en) * 1978-06-12 1981-07-07 Ohio-Nuclear, Inc. Adjustable collimator
JPS54101982U (pt) * 1978-10-12 1979-07-18
US4243866A (en) * 1979-01-11 1981-01-06 International Business Machines Corporation Method and apparatus for forming a variable size electron beam
DE2947444C2 (de) * 1979-11-24 1983-12-08 Dr.-Ing. Rudolf Hell Gmbh, 2300 Kiel Elektronenstrahl-Gravierverfahren
WO1982001787A1 (en) * 1980-11-22 1982-05-27 Grieger Dieter Method for engraving by means of an electron beam
DE3138896A1 (de) * 1981-09-30 1983-04-14 Siemens AG, 1000 Berlin und 8000 München Elektronenoptisches system mit vario-formstrahl zur erzeugung und messung von mikrostrukturen
NL8602196A (nl) * 1986-08-29 1988-03-16 Philips Nv Geladen deeltjes bestralingsapparaat met optisch vervormbaar bundel begrenzend diafragma.
GB8911392D0 (en) * 1989-05-18 1989-07-05 Humphreys Colin J Fabrication of electronic devices
WO2011071015A1 (ja) * 2009-12-11 2011-06-16 株式会社日立製作所 電子線バイプリズム装置および電子線装置
EP2365514B1 (en) * 2010-03-10 2015-08-26 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Twin beam charged particle column and method of operating thereof

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3118050A (en) * 1960-04-06 1964-01-14 Alloyd Electronics Corp Electron beam devices and processes
US3113896A (en) * 1961-01-31 1963-12-10 Space Technology Lab Inc Electron beam masking for etching electrical circuits
DE1301209B (de) * 1964-07-24 1969-08-14 Steigerwald Strahltech Verfahren zum Abtragen, insbesondere zum Perforieren von flexiblen Kunststoffen
US3491236A (en) * 1967-09-28 1970-01-20 Gen Electric Electron beam fabrication of microelectronic circuit patterns

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4445041A (en) * 1981-06-02 1984-04-24 Hewlett-Packard Company Electron beam blanker

Also Published As

Publication number Publication date
CA921548A (en) 1973-02-20
DE1926849A1 (de) 1969-12-11
US3638231A (en) 1972-01-25
NL6807439A (pt) 1969-12-01

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