GB1197182A - Formation of Metal Patterns - Google Patents

Formation of Metal Patterns

Info

Publication number
GB1197182A
GB1197182A GB1493266A GB1493266A GB1197182A GB 1197182 A GB1197182 A GB 1197182A GB 1493266 A GB1493266 A GB 1493266A GB 1493266 A GB1493266 A GB 1493266A GB 1197182 A GB1197182 A GB 1197182A
Authority
GB
United Kingdom
Prior art keywords
pentamethylene
softening point
exposure
resin
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1493266A
Other languages
English (en)
Inventor
Wojciech Maria Przezdziecki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kodak Ltd
Original Assignee
Kodak Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Ltd filed Critical Kodak Ltd
Priority to GB1493266A priority Critical patent/GB1197182A/en
Priority to GB5477766A priority patent/GB1214461A/en
Priority to GB1120068A priority patent/GB1214462A/en
Priority to BR18741367A priority patent/BR6787413D0/pt
Priority to DE19671547794 priority patent/DE1547794A1/de
Priority to BE696533D priority patent/BE696533A/xx
Priority to FR101160A priority patent/FR1523523A/fr
Priority to NL6706524A priority patent/NL6706524A/xx
Priority to ES340406A priority patent/ES340406A1/es
Priority to AT449167A priority patent/AT293867B/de
Priority to AT623169A priority patent/AT297483B/de
Priority to CH680967A priority patent/CH478421A/fr
Publication of GB1197182A publication Critical patent/GB1197182A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061—Etching masks
    • H05K3/064—Photoresists
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/01—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to unsaturated polyesters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/56—Processes using photosensitive compositions covered by the groups G03C1/64 - G03C1/72 or agents therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0384—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the main chain of the photopolymer
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0079—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the method of application or removal of the mask
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0502—Patterning and lithography
    • H05K2203/0525—Patterning by phototackifying or by photopatterning adhesive
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0502—Patterning and lithography
    • H05K2203/0537—Transfer of pre-fabricated insulating pattern

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)
GB1493266A 1966-04-04 1966-04-04 Formation of Metal Patterns Expired GB1197182A (en)

Priority Applications (12)

Application Number Priority Date Filing Date Title
GB1493266A GB1197182A (en) 1966-04-04 1966-04-04 Formation of Metal Patterns
GB5477766A GB1214461A (en) 1966-04-04 1966-05-12 Photographic colour printing
GB1120068A GB1214462A (en) 1966-04-04 1966-12-07 Improvements in light sensitive materials
BR18741367A BR6787413D0 (pt) 1966-04-04 1967-02-28 Processo fototermografico
DE19671547794 DE1547794A1 (de) 1966-04-04 1967-03-15 Thermophotographisches Material
BE696533D BE696533A (cs) 1966-04-04 1967-04-03
FR101160A FR1523523A (fr) 1966-04-04 1967-04-03 Nouveaux produits photosensibles à traitement thermique et procédés photoghermographiques utilisant ces produits
NL6706524A NL6706524A (cs) 1966-04-04 1967-05-10
ES340406A ES340406A1 (es) 1966-04-04 1967-05-11 Un metodo de hacer una reproduccion fotografica.
AT449167A AT293867B (de) 1966-04-04 1967-05-12 Lichtempfindliches Material zur Herstellung photographischer Reproduktionen
AT623169A AT297483B (de) 1966-04-04 1967-05-12 Verfahren zur Herstellung einer mehrfarbigen Reproduktion
CH680967A CH478421A (fr) 1966-04-04 1967-05-12 Matériel photosensible et utilisation de ce matériel

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB1493266A GB1197182A (en) 1966-04-04 1966-04-04 Formation of Metal Patterns
GB2122066 1966-05-12
US59599866A 1966-11-21 1966-11-21

Publications (1)

Publication Number Publication Date
GB1197182A true GB1197182A (en) 1970-07-01

Family

ID=27257192

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1493266A Expired GB1197182A (en) 1966-04-04 1966-04-04 Formation of Metal Patterns

Country Status (7)

Country Link
AT (2) AT297483B (cs)
BE (1) BE696533A (cs)
BR (1) BR6787413D0 (cs)
CH (1) CH478421A (cs)
ES (1) ES340406A1 (cs)
GB (1) GB1197182A (cs)
NL (1) NL6706524A (cs)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU628864B2 (en) * 1988-10-04 1992-09-24 Canon Kabushiki Kaisha Image forming method and image forming medium

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU628864B2 (en) * 1988-10-04 1992-09-24 Canon Kabushiki Kaisha Image forming method and image forming medium

Also Published As

Publication number Publication date
BE696533A (cs) 1967-10-03
AT297483B (de) 1972-03-27
ES340406A1 (es) 1968-10-01
CH478421A (fr) 1969-09-15
BR6787413D0 (pt) 1973-12-27
AT293867B (de) 1971-10-25
NL6706524A (cs) 1967-11-13

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Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees