GB1170495A - Radiation-Sensitive Recording Material - Google Patents
Radiation-Sensitive Recording MaterialInfo
- Publication number
- GB1170495A GB1170495A GB04945/67A GB1494567A GB1170495A GB 1170495 A GB1170495 A GB 1170495A GB 04945/67 A GB04945/67 A GB 04945/67A GB 1494567 A GB1494567 A GB 1494567A GB 1170495 A GB1170495 A GB 1170495A
- Authority
- GB
- United Kingdom
- Prior art keywords
- novolak
- diazo compound
- infrared radiation
- visible light
- heat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000463 material Substances 0.000 title abstract 5
- 150000008049 diazo compounds Chemical class 0.000 abstract 3
- 229920003986 novolac Polymers 0.000 abstract 3
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 abstract 2
- 239000011230 binding agent Substances 0.000 abstract 2
- 230000005855 radiation Effects 0.000 abstract 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 abstract 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 abstract 1
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 abstract 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 abstract 1
- 239000003513 alkali Substances 0.000 abstract 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- 239000004411 aluminium Substances 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 229920001577 copolymer Polymers 0.000 abstract 1
- 125000004093 cyano group Chemical group *C#N 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 150000002431 hydrogen Chemical class 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 abstract 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 abstract 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
- 239000011347 resin Substances 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- 229920001567 vinyl ester resin Polymers 0.000 abstract 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/0163—Non ionic diazonium compounds, e.g. diazosulphonates; Precursors thereof, e.g. triazenes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB04945/67A GB1170495A (en) | 1967-03-31 | 1967-03-31 | Radiation-Sensitive Recording Material |
| US700018A US3493371A (en) | 1967-03-31 | 1968-01-24 | Radiation-sensitive recording material |
| BE712447D BE712447A (cg-RX-API-DMAC7.html) | 1967-03-31 | 1968-03-20 | |
| NL6804290A NL6804290A (cg-RX-API-DMAC7.html) | 1967-03-31 | 1968-03-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB04945/67A GB1170495A (en) | 1967-03-31 | 1967-03-31 | Radiation-Sensitive Recording Material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1170495A true GB1170495A (en) | 1969-11-12 |
Family
ID=10050303
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB04945/67A Expired GB1170495A (en) | 1967-03-31 | 1967-03-31 | Radiation-Sensitive Recording Material |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US3493371A (cg-RX-API-DMAC7.html) |
| BE (1) | BE712447A (cg-RX-API-DMAC7.html) |
| GB (1) | GB1170495A (cg-RX-API-DMAC7.html) |
| NL (1) | NL6804290A (cg-RX-API-DMAC7.html) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2143961A (en) * | 1983-05-23 | 1985-02-20 | Fusion Semiconductor Systems | Hardening photoresist |
| US6060217A (en) | 1997-09-02 | 2000-05-09 | Kodak Polychrome Graphics Llc | Thermal lithographic printing plates |
| US6063544A (en) | 1997-03-21 | 2000-05-16 | Kodak Polychrome Graphics Llc | Positive-working printing plate and method of providing a positive image therefrom using laser imaging |
| US6090532A (en) | 1997-03-21 | 2000-07-18 | Kodak Polychrome Graphics Llc | Positive-working infrared radiation sensitive composition and printing plate and imaging method |
| US6117610A (en) | 1997-08-08 | 2000-09-12 | Kodak Polychrome Graphics Llc | Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use |
| US6218083B1 (en) | 1997-07-05 | 2001-04-17 | Kodak Plychrome Graphics, Llc | Pattern-forming methods |
| US6280899B1 (en) | 1996-04-23 | 2001-08-28 | Kodak Polychrome Graphics, Llc | Relation to lithographic printing forms |
| US6482577B1 (en) | 1996-09-30 | 2002-11-19 | Kodak Polychrome Graphics, Llc | Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1245924A (en) * | 1967-09-27 | 1971-09-15 | Agfa Gevaert | Improvements relating to thermo-recording |
| US4193797A (en) * | 1971-03-22 | 1980-03-18 | E. I. Dupont De Nemours And Company | Method for making photoresists |
| US4020762A (en) * | 1974-01-17 | 1977-05-03 | Scott Paper Company | Laser imaging a lanographic printing plate |
| CA1049312A (en) * | 1974-01-17 | 1979-02-27 | John O.H. Peterson | Presensitized printing plate with in-situ, laser imageable mask |
| US4508808A (en) * | 1982-11-12 | 1985-04-02 | Xidex Corporation | Method of using diazotype photographic materials with preexposure treatment to form uniform sites of refractive index change |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE449118A (cg-RX-API-DMAC7.html) * | ||||
| FR671984A (fr) * | 1928-03-24 | 1929-12-20 | Kalle & Co Ag | Procédé pour le développement de diazo-types |
| NL27647C (cg-RX-API-DMAC7.html) * | 1930-01-06 | |||
| DE596731C (de) * | 1932-05-23 | 1934-05-09 | Kalle & Co Akt Ges | Verfahren zur Darstellung von hoehermolekularen Diazoverbindungen |
| US2971842A (en) * | 1956-03-21 | 1961-02-14 | Gen Aniline & Film Corp | Light sensitive layers for photomechanical reproduction |
| BE565433A (cg-RX-API-DMAC7.html) * | 1956-12-28 | |||
| US2997467A (en) * | 1958-04-21 | 1961-08-22 | Gen Aniline & Film Corp | Diazo nitrogen heterocycles as lithographic sensitizers |
| US3401038A (en) * | 1964-03-06 | 1968-09-10 | Gaf Corp | Diazotype materials containing polycyclic light-sensitive fluorene diazonium salts |
-
1967
- 1967-03-31 GB GB04945/67A patent/GB1170495A/en not_active Expired
-
1968
- 1968-01-24 US US700018A patent/US3493371A/en not_active Expired - Lifetime
- 1968-03-20 BE BE712447D patent/BE712447A/xx unknown
- 1968-03-27 NL NL6804290A patent/NL6804290A/xx unknown
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2143961A (en) * | 1983-05-23 | 1985-02-20 | Fusion Semiconductor Systems | Hardening photoresist |
| US4548688A (en) * | 1983-05-23 | 1985-10-22 | Fusion Semiconductor Systems | Hardening of photoresist |
| US6280899B1 (en) | 1996-04-23 | 2001-08-28 | Kodak Polychrome Graphics, Llc | Relation to lithographic printing forms |
| US6485890B2 (en) | 1996-04-23 | 2002-11-26 | Kodak Polychrome Graphics, Llc | Lithographic printing forms |
| US6482577B1 (en) | 1996-09-30 | 2002-11-19 | Kodak Polychrome Graphics, Llc | Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition |
| US6063544A (en) | 1997-03-21 | 2000-05-16 | Kodak Polychrome Graphics Llc | Positive-working printing plate and method of providing a positive image therefrom using laser imaging |
| US6090532A (en) | 1997-03-21 | 2000-07-18 | Kodak Polychrome Graphics Llc | Positive-working infrared radiation sensitive composition and printing plate and imaging method |
| US6218083B1 (en) | 1997-07-05 | 2001-04-17 | Kodak Plychrome Graphics, Llc | Pattern-forming methods |
| US6117610A (en) | 1997-08-08 | 2000-09-12 | Kodak Polychrome Graphics Llc | Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use |
| US6060217A (en) | 1997-09-02 | 2000-05-09 | Kodak Polychrome Graphics Llc | Thermal lithographic printing plates |
Also Published As
| Publication number | Publication date |
|---|---|
| NL6804290A (cg-RX-API-DMAC7.html) | 1968-05-27 |
| US3493371A (en) | 1970-02-03 |
| BE712447A (cg-RX-API-DMAC7.html) | 1968-07-31 |
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