GB1170458A - Photoreprographic Composition, Reproduction Material Coated Therewith and Printing Plates Produced from said Material - Google Patents
Photoreprographic Composition, Reproduction Material Coated Therewith and Printing Plates Produced from said MaterialInfo
- Publication number
- GB1170458A GB1170458A GB653467A GB653467A GB1170458A GB 1170458 A GB1170458 A GB 1170458A GB 653467 A GB653467 A GB 653467A GB 653467 A GB653467 A GB 653467A GB 1170458 A GB1170458 A GB 1170458A
- Authority
- GB
- United Kingdom
- Prior art keywords
- composition
- support
- photoreprographic
- diazide
- naphthylamine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000463 material Substances 0.000 title abstract 3
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 abstract 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 abstract 2
- KJFMBFZCATUALV-UHFFFAOYSA-N phenolphthalein Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)C2=CC=CC=C2C(=O)O1 KJFMBFZCATUALV-UHFFFAOYSA-N 0.000 abstract 2
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 abstract 1
- MDKVDJZIHRFUBO-UHFFFAOYSA-N 2-amino-3-benzoyl-4-(2-benzoylphenyl)iminocyclohexa-2,5-dien-1-one Chemical compound C1=CC=C(C=C1)C(=O)C2=CC=CC=C2N=C3C=CC(=O)C(=C3C(=O)C4=CC=CC=C4)N MDKVDJZIHRFUBO-UHFFFAOYSA-N 0.000 abstract 1
- MGUKYHHAGPFJMC-UHFFFAOYSA-N 4-[3-(4-hydroxy-2,5-dimethylphenyl)-1,1-dioxo-2,1$l^{6}-benzoxathiol-3-yl]-2,5-dimethylphenol Chemical compound C1=C(O)C(C)=CC(C2(C3=CC=CC=C3S(=O)(=O)O2)C=2C(=CC(O)=C(C)C=2)C)=C1C MGUKYHHAGPFJMC-UHFFFAOYSA-N 0.000 abstract 1
- QPQKUYVSJWQSDY-UHFFFAOYSA-N 4-phenyldiazenylaniline Chemical compound C1=CC(N)=CC=C1N=NC1=CC=CC=C1 QPQKUYVSJWQSDY-UHFFFAOYSA-N 0.000 abstract 1
- -1 Metaril yellow Chemical compound 0.000 abstract 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 abstract 1
- LDKDGDIWEUUXSH-UHFFFAOYSA-N Thymophthalein Chemical compound C1=C(O)C(C(C)C)=CC(C2(C3=CC=CC=C3C(=O)O2)C=2C(=CC(O)=C(C(C)C)C=2)C)=C1C LDKDGDIWEUUXSH-UHFFFAOYSA-N 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- UHOVQNZJYSORNB-UHFFFAOYSA-N benzene Substances C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 abstract 1
- UDSAIICHUKSCKT-UHFFFAOYSA-N bromophenol blue Chemical compound C1=C(Br)C(O)=C(Br)C=C1C1(C=2C=C(Br)C(O)=C(Br)C=2)C2=CC=CC=C2S(=O)(=O)O1 UDSAIICHUKSCKT-UHFFFAOYSA-N 0.000 abstract 1
- 229920001577 copolymer Polymers 0.000 abstract 1
- 239000013078 crystal Substances 0.000 abstract 1
- FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 abstract 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 abstract 1
- 239000011976 maleic acid Substances 0.000 abstract 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 abstract 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 abstract 1
- YMIKUHVSRFHPOP-YRNVUSSQSA-N n,n-dimethyl-4-[(e)-2-quinolin-2-ylethenyl]aniline Chemical compound C1=CC(N(C)C)=CC=C1\C=C\C1=CC=C(C=CC=C2)C2=N1 YMIKUHVSRFHPOP-YRNVUSSQSA-N 0.000 abstract 1
- 229920003986 novolac Polymers 0.000 abstract 1
- 229920002689 polyvinyl acetate Polymers 0.000 abstract 1
- 239000011118 polyvinyl acetate Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
- 239000011347 resin Substances 0.000 abstract 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0223—Iminoquinonediazides; Para-quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEK0058406 | 1966-02-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1170458A true GB1170458A (en) | 1969-11-12 |
Family
ID=7228676
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB653467A Expired GB1170458A (en) | 1966-02-12 | 1967-02-10 | Photoreprographic Composition, Reproduction Material Coated Therewith and Printing Plates Produced from said Material |
Country Status (9)
| Country | Link |
|---|---|
| AT (1) | AT272380B (enrdf_load_stackoverflow) |
| BE (1) | BE693873A (enrdf_load_stackoverflow) |
| CH (1) | CH485256A (enrdf_load_stackoverflow) |
| DE (1) | DE1522496A1 (enrdf_load_stackoverflow) |
| ES (1) | ES336736A1 (enrdf_load_stackoverflow) |
| FR (1) | FR1510796A (enrdf_load_stackoverflow) |
| GB (1) | GB1170458A (enrdf_load_stackoverflow) |
| NL (1) | NL6701622A (enrdf_load_stackoverflow) |
| SE (1) | SE333098B (enrdf_load_stackoverflow) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1981001756A1 (en) * | 1979-12-07 | 1981-06-25 | Minnesota Mining & Mfg | Diazonium imaging system |
| US4394433A (en) | 1979-12-07 | 1983-07-19 | Minnesota Mining And Manufacturing Company | Diazonium imaging system |
| US4564581A (en) * | 1981-06-19 | 1986-01-14 | Sericol Group Limited | Process of preparing screen stencil using diazo photosensitive compositions with acidic p-H indicator |
| US4578341A (en) * | 1981-03-24 | 1986-03-25 | Sensitisers (Research) Ltd. | Acidic photosensitive relief image-forming materials with indicator pigment or dye |
| WO1986007473A1 (en) * | 1985-06-03 | 1986-12-18 | Fairmount Chemical Co., Inc. | Contrast enhancement layer |
| US4828960A (en) * | 1985-01-07 | 1989-05-09 | Honeywell Inc. | Reflection limiting photoresist composition with two azo dyes |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1347759A (en) * | 1971-06-17 | 1974-02-27 | Howson Algraphy Ltd | Light sensitive materials |
| JPS5562444A (en) * | 1978-11-02 | 1980-05-10 | Konishiroku Photo Ind Co Ltd | Photosensitive composition |
| JPS58211141A (ja) * | 1982-06-02 | 1983-12-08 | Fuji Photo Film Co Ltd | ネガ型感光性平版印刷版 |
| GB2196143B (en) * | 1986-10-08 | 1990-03-28 | Canon Kk | Recording medium and process for forming color image with use of the same |
-
1966
- 1966-02-12 DE DE19661522496 patent/DE1522496A1/de active Pending
-
1967
- 1967-02-02 NL NL6701622A patent/NL6701622A/xx unknown
- 1967-02-09 AT AT126167A patent/AT272380B/de active
- 1967-02-09 CH CH192367A patent/CH485256A/de not_active IP Right Cessation
- 1967-02-09 BE BE693873D patent/BE693873A/xx not_active IP Right Cessation
- 1967-02-10 SE SE190767A patent/SE333098B/xx unknown
- 1967-02-10 GB GB653467A patent/GB1170458A/en not_active Expired
- 1967-02-10 FR FR94573A patent/FR1510796A/fr not_active Expired
- 1967-02-11 ES ES336736A patent/ES336736A1/es not_active Expired
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1981001756A1 (en) * | 1979-12-07 | 1981-06-25 | Minnesota Mining & Mfg | Diazonium imaging system |
| US4394433A (en) | 1979-12-07 | 1983-07-19 | Minnesota Mining And Manufacturing Company | Diazonium imaging system |
| US4578341A (en) * | 1981-03-24 | 1986-03-25 | Sensitisers (Research) Ltd. | Acidic photosensitive relief image-forming materials with indicator pigment or dye |
| US4564581A (en) * | 1981-06-19 | 1986-01-14 | Sericol Group Limited | Process of preparing screen stencil using diazo photosensitive compositions with acidic p-H indicator |
| US4828960A (en) * | 1985-01-07 | 1989-05-09 | Honeywell Inc. | Reflection limiting photoresist composition with two azo dyes |
| WO1986007473A1 (en) * | 1985-06-03 | 1986-12-18 | Fairmount Chemical Co., Inc. | Contrast enhancement layer |
| US4672021A (en) * | 1985-06-03 | 1987-06-09 | Fairmount Chemical Company | Contrast enhancement layer composition with naphthoquinone diazide, indicator dye and polymeric binder |
Also Published As
| Publication number | Publication date |
|---|---|
| FR1510796A (fr) | 1968-01-19 |
| NL6701622A (enrdf_load_stackoverflow) | 1967-08-14 |
| AT272380B (de) | 1969-07-10 |
| ES336736A1 (es) | 1968-01-01 |
| SE333098B (enrdf_load_stackoverflow) | 1971-03-01 |
| BE693873A (enrdf_load_stackoverflow) | 1967-08-09 |
| DE1522496A1 (de) | 1969-09-11 |
| CH485256A (de) | 1970-01-31 |
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