GB1141594A - Improved high vacuum electron beam apparatus and method of operating same - Google Patents

Improved high vacuum electron beam apparatus and method of operating same

Info

Publication number
GB1141594A
GB1141594A GB22233/66A GB2223366A GB1141594A GB 1141594 A GB1141594 A GB 1141594A GB 22233/66 A GB22233/66 A GB 22233/66A GB 2223366 A GB2223366 A GB 2223366A GB 1141594 A GB1141594 A GB 1141594A
Authority
GB
United Kingdom
Prior art keywords
electron beam
coils
plane
beams
magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB22233/66A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Airco Inc
Original Assignee
Air Reduction Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Reduction Co Inc filed Critical Air Reduction Co Inc
Publication of GB1141594A publication Critical patent/GB1141594A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Detergent Compositions (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)
  • Electron Sources, Ion Sources (AREA)
GB22233/66A 1965-06-11 1966-05-19 Improved high vacuum electron beam apparatus and method of operating same Expired GB1141594A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US463190A US3394217A (en) 1965-06-11 1965-06-11 Method and apparatus for controlling plural electron beams

Publications (1)

Publication Number Publication Date
GB1141594A true GB1141594A (en) 1969-01-29

Family

ID=23839207

Family Applications (1)

Application Number Title Priority Date Filing Date
GB22233/66A Expired GB1141594A (en) 1965-06-11 1966-05-19 Improved high vacuum electron beam apparatus and method of operating same

Country Status (11)

Country Link
US (1) US3394217A (de)
AT (1) AT278187B (de)
BE (1) BE681839A (de)
CH (1) CH452731A (de)
DE (1) DE1565881B2 (de)
DK (1) DK117649B (de)
GB (1) GB1141594A (de)
LU (1) LU51261A1 (de)
NL (1) NL6608065A (de)
NO (1) NO117547B (de)
SE (1) SE346196B (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3475542A (en) * 1967-09-13 1969-10-28 Air Reduction Apparatus for heating a target in an electron beam furnace
US3535428A (en) * 1968-07-17 1970-10-20 Air Reduction Apparatus for producing and directing an electron beam
FR2244014B1 (de) * 1973-09-17 1976-10-08 Bosch Gmbh Robert
IT1037702B (it) * 1975-04-29 1979-11-20 Varian Associates Apparecchiatura di rescaldamento e o di evaporazione a fascio elettronico
US3999097A (en) * 1975-06-30 1976-12-21 International Business Machines Corporation Ion implantation apparatus utilizing multiple aperture source plate and single aperture accel-decel system
SU782571A1 (ru) * 1976-05-12 1983-09-23 Институт ядерной физики СО АН СССР Способ радиационной обработки изделий круглого сечени
DD204947A1 (de) * 1982-04-20 1983-12-14 Manfred Neumann Einrichtung zum elektronenstrahlbedampfen breiter baender
JP3092717B2 (ja) * 1990-03-02 2000-09-25 バリアン・セミコンダクター・エクイップメント・アソシエイツ・インコーポレイテッド イオン注入システムのための電荷中性化装置
US5136171A (en) * 1990-03-02 1992-08-04 Varian Associates, Inc. Charge neutralization apparatus for ion implantation system
JP3275166B2 (ja) * 1997-02-28 2002-04-15 住友重機械工業株式会社 プラズマビームの偏り修正機構を備えた真空成膜装置
US6476340B1 (en) 1999-04-14 2002-11-05 The Boc Group, Inc. Electron beam gun with grounded shield to prevent arc-down and gas bleed to protect the filament

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3046936A (en) * 1958-06-04 1962-07-31 Nat Res Corp Improvement in vacuum coating apparatus comprising an ion trap for the electron gun thereof
US3105275A (en) * 1960-05-27 1963-10-01 Stauffer Chemical Co Electron-beam furnace with double-coil magnetic beam guidance
FR1374335A (fr) * 1962-12-13 1964-10-09 Electronique & Physique Dispositif pour fabriquer une lame en matériau à grande pureté

Also Published As

Publication number Publication date
AT278187B (de) 1970-01-26
SE346196B (de) 1972-06-26
BE681839A (de) 1966-10-31
DE1565881B2 (de) 1971-01-21
LU51261A1 (de) 1966-08-16
NO117547B (de) 1969-08-25
US3394217A (en) 1968-07-23
DE1565881A1 (de) 1970-03-19
NL6608065A (de) 1966-12-12
DK117649B (da) 1970-05-19
CH452731A (de) 1968-03-15

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