GB1464039A - Electron bearm gun system - Google Patents
Electron bearm gun systemInfo
- Publication number
- GB1464039A GB1464039A GB3852174A GB3852174A GB1464039A GB 1464039 A GB1464039 A GB 1464039A GB 3852174 A GB3852174 A GB 3852174A GB 3852174 A GB3852174 A GB 3852174A GB 1464039 A GB1464039 A GB 1464039A
- Authority
- GB
- United Kingdom
- Prior art keywords
- magnets
- crucible
- furnace
- sept
- coils
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010894 electron beam technology Methods 0.000 abstract 2
- 150000002500 ions Chemical class 0.000 abstract 1
- 230000007935 neutral effect Effects 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Discharge Heating (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
1464039 Electron beam furnace C W HANKS 3 Sept 1974 [4 Sept 1973 29 April 1974] 38521/74 Heading H1D In an electron beam system, e.g. a furnace in which it is desirable to avoid impact on emitter 21 by positive ions and neutral species from the crucible 11, the beam is bent through an angle while being simultaneously focused by two magnetic lenses 61, 62 with their fields transverse to the beam, each formed by variable electromagnets. Such magnets formed from coils 31, 32, 33, 34, their cores and coils being embedded in water cooled Cu block 16, are in the furnace placeable over any suitable single or multipocket crucible in a suitable evacuated chamber. Magnets 31, 32 and the pair 33, 34 have separate polepieces 36a, 36b, 36c and 37a, 37b, 37c, which may be made contiguous; they may also be contoured for field correction. In operation the impact cross-section of the beam may be modified and the beam scanned across the crucible by co-ordinated variation of current in all four magnets; if scanning is not required magnet 34 may be permanent, supplying magnetic bias. Scanning perpendicularly may be provided by splitting coil 44 into separately variable parts 44a and 44b. In simple systems one or two of the four magnets may be eliminated (Figs. 4, 6, 7, not shown).
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US39390473A | 1973-09-04 | 1973-09-04 | |
| US465087A US3896258A (en) | 1973-09-04 | 1974-04-29 | Electron beam gun system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1464039A true GB1464039A (en) | 1977-02-09 |
Family
ID=27014501
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB3852174A Expired GB1464039A (en) | 1973-09-04 | 1974-09-03 | Electron bearm gun system |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US3896258A (en) |
| JP (1) | JPS5072229A (en) |
| DE (1) | DE2442032A1 (en) |
| GB (1) | GB1464039A (en) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4064352A (en) * | 1976-02-17 | 1977-12-20 | Varian Associates, Inc. | Electron beam evaporator having beam spot control |
| DE3339131A1 (en) * | 1983-10-28 | 1985-05-09 | Leybold-Heraeus GmbH, 5000 Köln | ELECTRONIC BEAM EVAPORATOR WITH AT LEAST TWO MAGNETIC DEFLECTION SYSTEMS |
| DE3639683A1 (en) * | 1986-11-20 | 1988-05-26 | Leybold Ag | EVAPORATOR ARRANGEMENT WITH A RECTANGULAR EVAPORATOR AND MULTIPLE ELECTRON CANNON |
| US4866239A (en) * | 1988-05-31 | 1989-09-12 | The Boc Group, Inc. | Vapor source assembly with crucible |
| US8891583B2 (en) * | 2000-11-15 | 2014-11-18 | Ati Properties, Inc. | Refining and casting apparatus and method |
| US6496529B1 (en) * | 2000-11-15 | 2002-12-17 | Ati Properties, Inc. | Refining and casting apparatus and method |
| US6858843B1 (en) * | 2002-06-21 | 2005-02-22 | Kla-Tencor Technologies Corporation | Immersion objective lens for e-beam inspection |
| US20040245224A1 (en) * | 2003-05-09 | 2004-12-09 | Nano-Proprietary, Inc. | Nanospot welder and method |
| US7446320B1 (en) | 2005-08-17 | 2008-11-04 | Kla-Tencor Technologies Corproation | Electronically-variable immersion electrostatic lens |
| US7578960B2 (en) | 2005-09-22 | 2009-08-25 | Ati Properties, Inc. | Apparatus and method for clean, rapidly solidified alloys |
| US7803211B2 (en) * | 2005-09-22 | 2010-09-28 | Ati Properties, Inc. | Method and apparatus for producing large diameter superalloy ingots |
| US7803212B2 (en) * | 2005-09-22 | 2010-09-28 | Ati Properties, Inc. | Apparatus and method for clean, rapidly solidified alloys |
| US8381047B2 (en) * | 2005-11-30 | 2013-02-19 | Microsoft Corporation | Predicting degradation of a communication channel below a threshold based on data transmission errors |
| US8698093B1 (en) | 2007-01-19 | 2014-04-15 | Kla-Tencor Corporation | Objective lens with deflector plates immersed in electrostatic lens field |
| US8642916B2 (en) * | 2007-03-30 | 2014-02-04 | Ati Properties, Inc. | Melting furnace including wire-discharge ion plasma electron emitter |
| US8748773B2 (en) | 2007-03-30 | 2014-06-10 | Ati Properties, Inc. | Ion plasma electron emitters for a melting furnace |
| US7798199B2 (en) * | 2007-12-04 | 2010-09-21 | Ati Properties, Inc. | Casting apparatus and method |
| DE102009057486A1 (en) * | 2009-12-10 | 2011-06-16 | Ferrotec Gmbh | Electron beam deflection device, magnetic deflection unit for such a deflection device and device for vapor deposition of a planar substrate with such a deflection device |
| US8747956B2 (en) | 2011-08-11 | 2014-06-10 | Ati Properties, Inc. | Processes, systems, and apparatus for forming products from atomized metals and alloys |
| DE102020213174A1 (en) | 2020-10-19 | 2022-04-21 | THEVA DüNNSCHICHTTECHNIK GMBH | ACTIVELY COOLED ELECTRON GUN FOR MATERIAL EVAPORATION IN VACUUM |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1156522B (en) * | 1962-09-25 | 1963-10-31 | Heraeus Gmbh W C | Electron lens assembly for electron beam melting or evaporation systems |
| US3592955A (en) * | 1969-09-24 | 1971-07-13 | Air Reduction | Electron beam furnace |
-
1974
- 1974-04-29 US US465087A patent/US3896258A/en not_active Expired - Lifetime
- 1974-09-03 JP JP49101281A patent/JPS5072229A/ja active Pending
- 1974-09-03 GB GB3852174A patent/GB1464039A/en not_active Expired
- 1974-09-03 DE DE2442032A patent/DE2442032A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| US3896258A (en) | 1975-07-22 |
| JPS5072229A (en) | 1975-06-14 |
| DE2442032A1 (en) | 1975-03-13 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| PCNP | Patent ceased through non-payment of renewal fee |