JPS5072229A - - Google Patents

Info

Publication number
JPS5072229A
JPS5072229A JP49101281A JP10128174A JPS5072229A JP S5072229 A JPS5072229 A JP S5072229A JP 49101281 A JP49101281 A JP 49101281A JP 10128174 A JP10128174 A JP 10128174A JP S5072229 A JPS5072229 A JP S5072229A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP49101281A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5072229A publication Critical patent/JPS5072229A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Discharge Heating (AREA)
  • Electron Sources, Ion Sources (AREA)
JP49101281A 1973-09-04 1974-09-03 Pending JPS5072229A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US39390473A 1973-09-04 1973-09-04
US465087A US3896258A (en) 1973-09-04 1974-04-29 Electron beam gun system

Publications (1)

Publication Number Publication Date
JPS5072229A true JPS5072229A (ja) 1975-06-14

Family

ID=27014501

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49101281A Pending JPS5072229A (ja) 1973-09-04 1974-09-03

Country Status (4)

Country Link
US (1) US3896258A (ja)
JP (1) JPS5072229A (ja)
DE (1) DE2442032A1 (ja)
GB (1) GB1464039A (ja)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4064352A (en) * 1976-02-17 1977-12-20 Varian Associates, Inc. Electron beam evaporator having beam spot control
DE3339131A1 (de) * 1983-10-28 1985-05-09 Leybold-Heraeus GmbH, 5000 Köln Elektronenstrahlverdampfer mit mindestens zwei magnetischen ablenksystemen
DE3639683A1 (de) * 1986-11-20 1988-05-26 Leybold Ag Verdampferanordnung mit einem rechteckigen verdampfertiegel und mehreren elektronenkanonen
US4866239A (en) * 1988-05-31 1989-09-12 The Boc Group, Inc. Vapor source assembly with crucible
US8891583B2 (en) 2000-11-15 2014-11-18 Ati Properties, Inc. Refining and casting apparatus and method
US6496529B1 (en) * 2000-11-15 2002-12-17 Ati Properties, Inc. Refining and casting apparatus and method
US6858843B1 (en) * 2002-06-21 2005-02-22 Kla-Tencor Technologies Corporation Immersion objective lens for e-beam inspection
US20040245224A1 (en) * 2003-05-09 2004-12-09 Nano-Proprietary, Inc. Nanospot welder and method
US7446320B1 (en) 2005-08-17 2008-11-04 Kla-Tencor Technologies Corproation Electronically-variable immersion electrostatic lens
US7578960B2 (en) 2005-09-22 2009-08-25 Ati Properties, Inc. Apparatus and method for clean, rapidly solidified alloys
US7803211B2 (en) * 2005-09-22 2010-09-28 Ati Properties, Inc. Method and apparatus for producing large diameter superalloy ingots
US7803212B2 (en) * 2005-09-22 2010-09-28 Ati Properties, Inc. Apparatus and method for clean, rapidly solidified alloys
US8381047B2 (en) * 2005-11-30 2013-02-19 Microsoft Corporation Predicting degradation of a communication channel below a threshold based on data transmission errors
US8698093B1 (en) 2007-01-19 2014-04-15 Kla-Tencor Corporation Objective lens with deflector plates immersed in electrostatic lens field
US8748773B2 (en) 2007-03-30 2014-06-10 Ati Properties, Inc. Ion plasma electron emitters for a melting furnace
AU2008232823B2 (en) 2007-03-30 2013-08-15 Ati Properties, Inc. Melting furnace including wire-discharge ion plasma electron emitter
US7798199B2 (en) 2007-12-04 2010-09-21 Ati Properties, Inc. Casting apparatus and method
DE102009057486A1 (de) * 2009-12-10 2011-06-16 Ferrotec Gmbh Ablenkvorrichtung für Elektronenstrahlen, magnetische Ablenkeinheit für eine solche Ablenkvorrichtung und Vorrichtung zum Bedampfen eines flächigen Substrates mit einer solchen Ablenkvorrichtung
US8747956B2 (en) 2011-08-11 2014-06-10 Ati Properties, Inc. Processes, systems, and apparatus for forming products from atomized metals and alloys
DE102020213174A1 (de) 2020-10-19 2022-04-21 THEVA DüNNSCHICHTTECHNIK GMBH Aktiv gekühlte elektronenkanone zur materialverdampfung im vakuum

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1156522B (de) * 1962-09-25 1963-10-31 Heraeus Gmbh W C Elektronenlinsenanordnung fuer Elektronenstrahlschmelz- oder -verdampfungsanlagen
US3592955A (en) * 1969-09-24 1971-07-13 Air Reduction Electron beam furnace

Also Published As

Publication number Publication date
DE2442032A1 (de) 1975-03-13
US3896258A (en) 1975-07-22
GB1464039A (en) 1977-02-09

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