US3394217A - Method and apparatus for controlling plural electron beams - Google Patents

Method and apparatus for controlling plural electron beams Download PDF

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Publication number
US3394217A
US3394217A US463190A US46319065A US3394217A US 3394217 A US3394217 A US 3394217A US 463190 A US463190 A US 463190A US 46319065 A US46319065 A US 46319065A US 3394217 A US3394217 A US 3394217A
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United States
Prior art keywords
coils
beams
electron beams
magnetic field
electron
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Expired - Lifetime
Application number
US463190A
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English (en)
Inventor
Fisk Robert Walter
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Airco Inc
Original Assignee
Air Reduction Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Reduction Co Inc filed Critical Air Reduction Co Inc
Priority to US463190A priority Critical patent/US3394217A/en
Priority to GB22233/66A priority patent/GB1141594A/en
Priority to BE681839D priority patent/BE681839A/xx
Priority to AT527966A priority patent/AT278187B/de
Priority to LU51261A priority patent/LU51261A1/xx
Priority to NO163344A priority patent/NO117547B/no
Priority to CH830066A priority patent/CH452731A/de
Priority to NL6608065A priority patent/NL6608065A/xx
Priority to FR65013A priority patent/FR1482795A/fr
Priority to DE19661565881 priority patent/DE1565881B2/de
Priority to DK299966AA priority patent/DK117649B/da
Priority to SE7971/66A priority patent/SE346196B/xx
Application granted granted Critical
Publication of US3394217A publication Critical patent/US3394217A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching

Definitions

  • a method and apparatus for electron beam bombardment heating which includes means for generating at least two independent generally parallel electron beams, means for generating separate transverse magnetic fields in the path of each electron beam for deflecting the beams in a first direction, and means for generating a common transverse magnetic field in the path of at least two of the electron beams which has lines of fiux perpendicular to the lines of ux of the separate magnetic fields.
  • the present invention relates generally to high vacuum electron beam methods and apparatus and more particularly to a method of and apparatus for magnetically controlling the impact pattern of a plurality of beams of electrons in a high vacuum electron beam apparatus.
  • FIGURE 1 is a schematic view of an apparatus in ac cordance with the present invention
  • FIGURE 2 is a sectional view taken along line 2-2 of FIGURE l;
  • FIGURE 3 is a sectional view taken along line 3-3 of FIGURE 1.
  • a method in accordance with the present invention includes injecting two or more adjacent and generally parallel electron beams through a first magnetic field having lines of fiux extending generally perpendicular to the paths of the beams, to thereby deflect the beams in a predetermined direction.
  • the deflected electron beams are then passed through a second magnetic eld having lines of magnetic flux extending generally perpendicular to the path of the beams and the direction of the rst magnetic field.
  • the first and second magnetic fields are of selectively controllable flux density, whereby the electron beams are directed onto a predetermined area on the target material.
  • an apparatus in accordance with the present invention includes an evacuated electron gun chamber 10 which contains a pair of electron beam sources 14 adapted for supplying adjacent and generally parallel, high density, ribbon-shaped electron beams.
  • the electron beam sources may be of the conventional variety of self-accelerated source, including a cathode, focusing electrode, and accelerating anode.
  • the beams are directed through a pair of corresponding slits 18 and 20 into a focusing or concentrating magnetic field provided by a suitably energized axial coil 21 disposed adjacent the slits 18 and 20.
  • the axial coil 21 establishes a magnetic field which extends generally parallel to the initial direction of travel of the electron beams emanating from the slits 18 and 2t) thereby causing concentration or focusing of each of the electron beams.
  • the concentrated beams are then directed through a pair of corresponding slits 22 and 23, disposed at the opposite end of the axial coil 21.
  • the slits open into a conventional high vacuum electron beam furnace enclosure 24 which contains a Crucible 25 on which the material to be heated (the target material 26) is disposed.
  • High vacuum pump means 28 is coupled to the enclosure 24 for maintaining a predetermined pressure within the enclosure 24, usually about 0.1 to 5 microns of mercury.
  • the beams are directed into the enclosure 24 at a preselected angle, with respect to the target material.
  • the beams are shown entering the enclosure 24 generally parallel to the surface of the target material 26, which in the illustrated embodiment is in a horizontal direction.
  • the horizontally directed beams are directed onto a predetermined region of the target material by mutually perpendicular magnetic fields disposed successively in the path of the electron beam.
  • the first field is employed to guide the beams in one direction along the surface of the target material, hereinafter referred to as the lateral direction
  • the second field guides the beam along the surface in a direction perpendicular to the former direction, hereinafter referred to as the transverse direction.
  • the lateral magnetic field is generated adjacent the slits 22 and 23 by a lateral electromagnetic means 30.
  • the lateral electromagnetic means 30 includes a first pair of magnetic core multiturn coils 32 and 34, having cores preferably fabricated of'mild steel, adjacent the ends of the upper slit 22, and a second pair .of similar magnetic core coils 36 and 38 adjacent the ends of the lower slit 23.
  • the coils in each of the pairs are magnetically oriented in opposed relationship with respect to each other and are generally similar in physical structure. Thus, the coils in each pair have like magnetic poles facing in the same direction.
  • the coils 32 and 34 of the first pair are magnetically coupled at their upper ends by a bar 4i) of relatively high permeability material such as mild steel, and are similarly coupled at their lower ends by a bar 42 of relatively high permeability material, which is generally similar to the bar 40.
  • the tops of the coils 36 and 38 of the second pair are also magnetically coupled by the bar 42.
  • the lower ends of the coils 36 and 38 of the second pair are magnetically coupled by a bar 44 which is generally similar to the bars 4t) and 42.
  • the magnetic flux generated by the opposed coils 32 and 34 is supplied through the bars 40 and 42 in opposite directions.
  • the magnetic lines of flux generated by the opposed coils 32 and 34 must necessarily pass across the slit 22 as they emanate from one end of their respective coils and return to the other end.
  • a magnetic field is established across the slit 22 having generally vertical lines of magnetic fiux 50, as shown.
  • a magnetic field of a desired intensity dependent upon the amount of energization supplied by the sources 46 and 48, and having lines of force oriented generally perpendicularly with respect to the direction of travel of the electron 'beams may be established within the slit 22.
  • the coils 36 and 38 are coupled to suitable sources of current 52 and 53 generally similar to the sources 46 and 48, and upon energization provide a similar magnetic field of controllable flux density, extending vertically across the slit 23.
  • the lateral magnetic fields established across the slits 22 and 23 may be conveniently varied in intensity by merely changing the total amount of current supplied to the pair of coils, disposed at opposite ends of each of the slits. Since a change in the magnetic iiux density changes the lateral deflection of electrons passing thro-ugh the slits 22 and 23, a means is provided for effecting separate control of the deflection of the respective electron beams passing through the slits 22 and 23. Accordingly, the beams of electrons passing through the slits 22 and 23 may be deflected differing amounts with respect to each other or they may both ybe defiected similar amounts depending upon the amounts of current supplied to the associated pairs of coils. Alternatively, the current supplied to each of the respective opposed coils comprising each of the pairs of coils may be varied in amount, so as to delieet electron beams passing through different regions of the slits 22 and 23 by differing amounts.
  • a plurality of cooling coils are disposed adjacent the outer edges of the bars 40, 42 and 44 in order to limit the amount of heat which may be generated therein as a result of heat emanating from the furnace and from the electron beams.
  • the transverse magnetic field serves to curve the horizontally directed electron beams through an angle of between approximately 45 to 120 such that the electron beams impinge onto the target material 26.
  • the transverse magnetic field is establlshed by a transverse electromagnetic means 54.
  • the means 54 generally includes an upper horizontally disposed iron core coil 5'8 and a lower horizontally disposed iron core coil 62. These coils are generally cylindrical in form, and contain a sufficient number of turns to establish a magnetic field, which curves the electron beams passing therethrough through an angle of approximately 90.
  • the coils are each respectively connected to suitable sources 63 and 64 of direct current so that the current ⁇ respectively supplied to each can be readily adjusted.
  • the side plates 66 and 70 are generally similar in structure.
  • the side plates 66 and 70 are fabricated of a ferro-magnetic material such as mild steel, and thus function to magnetically couple the coils 58 and 62.
  • the coils 58 and 62 are disposed in opposed relationship such that like magnetic poles face in the same direction.
  • the flux lines pass into the space 74, defined by the coils 58 and 62 and the side plates 66 and 70, and then return to the opposite ends of their respective coils through the opposite side Cil plate.
  • the coil-s 58 and 62 are supplied with current a relatively intense transverse magnetic field is established within the space 74 having lines of magnetic fiux 78 as shown in FIGURE 3.
  • each of the side plates -in a generally triangular form, as shown in FIGURE l, oriented such that its base generally faces in the direction of the slits 22 and 23. Since magnetic fiux follows the path of least resistance most of t-he flux passing through the side plates reaches the wider center portion before passing across the space 74. The beams of electrons are generally directed into the central region of the space 74, wher-e most of the flux is present, thereby receiving a maximum amount of deflection such that they impinge on the target material 26.
  • the ux density within the space 74 may be readily adjusted as desired by appropriately adjusting the amounts of current respectively supplied to the coils 58 and 62, thereby directing each of the beams onto predetermined regions of the target material 26 or alternatively focusing the beam to impinge onto a common region on the surface of the target material 26.
  • a cyclically repetitive impact pattern may be advantageously achieved by suitably programming the coils comprising the lateral magnetic means 30 or the transverse electromagnetic mean-s S4 so as to establish a cyclically varying magnetic field. Such a field will deflect the beams of electrons pass-ing therethrough so as to provide a cyclically repetitive impact pattern.
  • An electron beam bombardment heating apparatus comprising, an evacuated enclosure adapted to receive a target material to be heated, means in said enclosure for generating at least two independent electron beams, the initial paths of the electron beams being generally parallel to one another, means for generating a separate transverse magnetic field in the path of each electron beam, each of said separate magnetic fields being controllable for defiecting the respective electron beams in a rst di ⁇ reetion, and means for generating a common transverse magnetic field in the path of at least two of the electron beams, said common magnetic field having lines of fiux perpendicular to the lines of flux of said separate magnetic elds for deflecting the electron beams in a second direction generally perpendicular to the rst direction.
  • An electron beam lbombardment heating apparatus generating at least two independent electron beams, the comprising, an evacuated enclosure adapted to receive a target material to be heated, means in said enclosure for initial paths of the electron beams being generally parallel to one another, electromagnetic means for genenating yan independent transverse magnetic field in the path of each electron beam, each of said electromagnetic means including a pair of spaced apart magnetically opposed coils, means for magnetically coupling said coils, and means for controllably supplying current to said coil-s for deflecting the electron beam in a first direction, and means for generating ⁇ a common transverse magnetic field in the path of at least two of the electron beams, said common magnetic field having lines of flux perpendicular tto the lines of flux of said independent magnetic fields for defiecting the electron beams in a second direction generally perpendicular to the first direction.
  • An electron beam bombardment heating apparatus comprising, an evacuated enclosure adapted to receive a target material to be heated, means in said enclosure for generating at least two independent electron beams, the initial paths of the electron beams being generally parallel to one another, first electromagnetic means for generating an independent transverse magnetic field in the path of each electron beam, each of said first electromagnetic means including a pair of magnetically opposed coils, means for magnetically coupling said coils, and means for controllably supplying current to said coils for defiecting of the electron beam in a first direction, and second electromagnetic means for generating a common transverse magnetic field in the path of the electron beams, said second electromagnetic means including a pair of magnetically opposed coils, means for magnetically coupling said coils, and means for controllably supplying current to said coils, said common magnetic field having lines of fiux perpendicular to the lines of flux of said independent magnetic fields for defiecting the electron beams in a second direction generally perpendicular to the first direction.
  • An electron beam bombardment heating apparatus comprising, an evacuated enclosure adapted to receive a target material to be heated, means in said enclosure for generating at least two independent electron beams, the initial paths of the electron beams being generally parallel to one another, first electromagnetic means for generating an independent transverse magnetic field in the path of each electron beam, each of said first electromagnetic means including a pair of magnetically opposed coils, means constructed of high permeability material connecting like poles of said coils and defining an opening through which the electron beam passes, and means for controllably supplying current to said coils for defiecting of the electron beam in a first direction, means for generating a common transverse magnetic field in the path of all the electron beams, said common magnetic field having lines of flux perpendicular to the lines of flux of said independent magentic fields for defiecting the electron beams in a second direction generally perpendicular to the first direction.
  • An electron beam bombardment heating apparatus comprising, an evacuated enclosure adapted to receive a target material to be heated, means in said enclosure for generating at least two independent electron beams, the initial paths of the electron beams being generally parallel to one another, first electromagnetic means for generating an independent transverse magnetic field in the path of each electron beam, each of said first electromagnetic means including a pair of spaced apart magnetically opposed coils having like poles facing the same direction, means constructed of high permeability material connecting like poles of said coils and defining an opening through which the electron beam passes, and means for controllably supplying current to said coils for defiecting the electron beam in a first direction, and second electromagnetic means for generating a common transverse magnetic field in the path of all the electron beams, said second electromagnetic means including a pair of spaced apart magnetically opposed coils having like poles facing in the same direction, means constructed of high permeability material connecting like poles of said coils, and defining an opening through which the electron beams pass, and means for controllably supplying current to said coils,
  • An electron beam bombardment heating apparatus comprising, an evacuated enclosure adapted to receive a target material to be heated, means in said enclosure for generating two independent ribbon shaped electron beams, the initial paths of the electron beams being generally parallel to one anothr, first electromagnetic means for generating an independent transverse magnetic field in the path of each electron beam, each of said first electromagnetie means including a pair of spaced apart magnetically opposed coils having like poles facing in the same direction, a bar of high permeability material connecting like poles of said coils and defining an opening through which the electron beam passes, and means for controllably supplying current to said coils for deflecting the electron beam in a first direction, and second electromagnetic means for generating a common transverse magnetic field in the path of both electron beams, said second electromagnetic means including a pair of spaced apart magnetically opposed co-ils having like poles facing in the same direction, a triangular shaped plate member constructed of high permeability material connecting like poles of said coils and defining an opening through which the electron beams
  • An electron beam bombardment heating apparatus comprising, an evacuated enclosure adapted to receive a target material to be heated, means in said enclosure for generating two independent ribbon electron beams, the initial paths of the electron beams being generally parallel to one another, first electromagnetic means for generating a common axial magnetic field extending generally parallel to the initial path of both electron beams, second electromagnetic means for generating an independent transverse magnetic field in the path of each electron beam, each of said second electromagnetic means including a pair of spaced apart magentically opposed coils having like poles facing in the same direction, means for magnetically coupling said coils, and means for controllably supplying current to said coils for defiecting the electron beam in a first direction, and third electromagnetic means for generating a common transverse magnetic field in the path of both electron beams, said third electromagnetic means including a pair of spaced apart magnetically opposed coils having like poles facing in the same direction, means for magnetically coupling said coils, and means for controllably supplying current to said coils, said common magnetic field having lines of flux perpendic
  • a method for controllably heating a target material in a high vacuum electron beam apparatus comprising the steps of generating at least two adjacent and generally parallel electron beams, passing each of the electron beams through a separate lateral magnetic field having lines of flux extending generally perpendicular to the paths of the beams, controlling the strength of each of the lateral magnetic field for controllably deflecting each beam in a first direction, passing said defiected beams through a transverse magnetic field having lines of fiux extending generally perpendicular to both the path of the cams and the direction of the lateral magnetic field, and controlling the strength of the transverse magnetic eld for controllably detlecting the electron beams in a second direction perpendicular to the rst direction.
  • a method or controllably heating a target material in a high vacuum electron beam apparatus comprising the steps of generating at least two adjacent and generally parallel electron beams, passing each of said electron beams through independent lateral magnetic fields having lines of flux extending generally perpendicular to the path of the beams, controlling the strength of each of said lateral magnetic elds thereby separately deecting said beams in a first direction, thereafter passing said electron beams through a relatively int-ense transverse magnetic eld including a region of maximum flux concentration having lines of magnetic ux extending perpendicular to both the path of the beams and the direction of the lateral magnetic eld, and controlling the strength of said traverse magnetic eld, thereby directing said beams of electrons onto predetermined areas on the target material.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Detergent Compositions (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)
  • Electron Sources, Ion Sources (AREA)
US463190A 1965-06-11 1965-06-11 Method and apparatus for controlling plural electron beams Expired - Lifetime US3394217A (en)

Priority Applications (12)

Application Number Priority Date Filing Date Title
US463190A US3394217A (en) 1965-06-11 1965-06-11 Method and apparatus for controlling plural electron beams
GB22233/66A GB1141594A (en) 1965-06-11 1966-05-19 Improved high vacuum electron beam apparatus and method of operating same
BE681839D BE681839A (de) 1965-06-11 1966-05-31
AT527966A AT278187B (de) 1965-06-11 1966-06-03 Hochvakuum-Elektronenstrahlofen
LU51261A LU51261A1 (de) 1965-06-11 1966-06-06
NO163344A NO117547B (de) 1965-06-11 1966-06-08
CH830066A CH452731A (de) 1965-06-11 1966-06-09 Verfahren und Vorrichtung zum Erhitzen eines Stoffes in einem Hochvakuum-Elektronenstrahlgerät
NL6608065A NL6608065A (de) 1965-06-11 1966-06-10
FR65013A FR1482795A (fr) 1965-06-11 1966-06-10 Appareil à un ou plusieurs faisceaux électroniques, à vide poussé, et procédé de commande d'un tel appareil
DE19661565881 DE1565881B2 (de) 1965-06-11 1966-06-10 Verfahren und Anordnung zum gesteuer ten Erwarmen eines Targetmatenals in einem Hochvakuum Elektronenstrahlofen
DK299966AA DK117649B (da) 1965-06-11 1966-06-10 Fremgangsmåde og apparat til regulerbar opvarmning af et målmateriale i et højvakuumelektronstråleapparat.
SE7971/66A SE346196B (de) 1965-06-11 1966-06-10

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US463190A US3394217A (en) 1965-06-11 1965-06-11 Method and apparatus for controlling plural electron beams

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US3394217A true US3394217A (en) 1968-07-23

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US463190A Expired - Lifetime US3394217A (en) 1965-06-11 1965-06-11 Method and apparatus for controlling plural electron beams

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US (1) US3394217A (de)
AT (1) AT278187B (de)
BE (1) BE681839A (de)
CH (1) CH452731A (de)
DE (1) DE1565881B2 (de)
DK (1) DK117649B (de)
GB (1) GB1141594A (de)
LU (1) LU51261A1 (de)
NL (1) NL6608065A (de)
NO (1) NO117547B (de)
SE (1) SE346196B (de)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3475542A (en) * 1967-09-13 1969-10-28 Air Reduction Apparatus for heating a target in an electron beam furnace
US3535428A (en) * 1968-07-17 1970-10-20 Air Reduction Apparatus for producing and directing an electron beam
US3931490A (en) * 1973-09-17 1976-01-06 Robert Bosch G.M.B.H. Electron beam vaporization apparatus
US3999097A (en) * 1975-06-30 1976-12-21 International Business Machines Corporation Ion implantation apparatus utilizing multiple aperture source plate and single aperture accel-decel system
US4035573A (en) * 1975-04-29 1977-07-12 Varian Associates, Inc. Electron beam heating apparatus having means for sweeping the beam spot
US4121086A (en) * 1976-05-12 1978-10-17 Vadim Leonidovich Auslender Method for irradiation of round-section cylindrical objects with accelerated electrons
US4524717A (en) * 1982-04-20 1985-06-25 Bakish Materials Corp. Electron beam strip-coating apparatus
WO1991013458A1 (en) * 1990-03-02 1991-09-05 Varian Associates, Inc. Charge neutralization apparatus for ion implantation system
US5136171A (en) * 1990-03-02 1992-08-04 Varian Associates, Inc. Charge neutralization apparatus for ion implantation system
US6394025B1 (en) * 1997-02-28 2002-05-28 Sumitomo Heavy Industries, Ltd. Vacuum film growth apparatus
US6476340B1 (en) 1999-04-14 2002-11-05 The Boc Group, Inc. Electron beam gun with grounded shield to prevent arc-down and gas bleed to protect the filament

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3046936A (en) * 1958-06-04 1962-07-31 Nat Res Corp Improvement in vacuum coating apparatus comprising an ion trap for the electron gun thereof
GB950672A (en) * 1960-05-27 1964-02-26 Stauffer Chemical Co Electron-beam furnace
FR1374335A (fr) * 1962-12-13 1964-10-09 Electronique & Physique Dispositif pour fabriquer une lame en matériau à grande pureté

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3046936A (en) * 1958-06-04 1962-07-31 Nat Res Corp Improvement in vacuum coating apparatus comprising an ion trap for the electron gun thereof
GB950672A (en) * 1960-05-27 1964-02-26 Stauffer Chemical Co Electron-beam furnace
FR1374335A (fr) * 1962-12-13 1964-10-09 Electronique & Physique Dispositif pour fabriquer une lame en matériau à grande pureté

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3475542A (en) * 1967-09-13 1969-10-28 Air Reduction Apparatus for heating a target in an electron beam furnace
US3535428A (en) * 1968-07-17 1970-10-20 Air Reduction Apparatus for producing and directing an electron beam
US3931490A (en) * 1973-09-17 1976-01-06 Robert Bosch G.M.B.H. Electron beam vaporization apparatus
US4035573A (en) * 1975-04-29 1977-07-12 Varian Associates, Inc. Electron beam heating apparatus having means for sweeping the beam spot
US3999097A (en) * 1975-06-30 1976-12-21 International Business Machines Corporation Ion implantation apparatus utilizing multiple aperture source plate and single aperture accel-decel system
DE2627987A1 (de) * 1975-06-30 1977-01-20 Ibm Ionenimplantationsvorrichtung
US4121086A (en) * 1976-05-12 1978-10-17 Vadim Leonidovich Auslender Method for irradiation of round-section cylindrical objects with accelerated electrons
US4524717A (en) * 1982-04-20 1985-06-25 Bakish Materials Corp. Electron beam strip-coating apparatus
WO1991013458A1 (en) * 1990-03-02 1991-09-05 Varian Associates, Inc. Charge neutralization apparatus for ion implantation system
US5136171A (en) * 1990-03-02 1992-08-04 Varian Associates, Inc. Charge neutralization apparatus for ion implantation system
US6394025B1 (en) * 1997-02-28 2002-05-28 Sumitomo Heavy Industries, Ltd. Vacuum film growth apparatus
US6476340B1 (en) 1999-04-14 2002-11-05 The Boc Group, Inc. Electron beam gun with grounded shield to prevent arc-down and gas bleed to protect the filament

Also Published As

Publication number Publication date
AT278187B (de) 1970-01-26
SE346196B (de) 1972-06-26
BE681839A (de) 1966-10-31
DE1565881B2 (de) 1971-01-21
LU51261A1 (de) 1966-08-16
NO117547B (de) 1969-08-25
DE1565881A1 (de) 1970-03-19
NL6608065A (de) 1966-12-12
GB1141594A (en) 1969-01-29
DK117649B (da) 1970-05-19
CH452731A (de) 1968-03-15

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