GB1129984A - Electroless deposition of nickel-phosphorus alloys - Google Patents

Electroless deposition of nickel-phosphorus alloys

Info

Publication number
GB1129984A
GB1129984A GB46089/65A GB4608965A GB1129984A GB 1129984 A GB1129984 A GB 1129984A GB 46089/65 A GB46089/65 A GB 46089/65A GB 4608965 A GB4608965 A GB 4608965A GB 1129984 A GB1129984 A GB 1129984A
Authority
GB
United Kingdom
Prior art keywords
mol
bath
nickel
electroless deposition
niso
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB46089/65A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
USA
US Government
Original Assignee
USA
US Government
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by USA, US Government filed Critical USA
Publication of GB1129984A publication Critical patent/GB1129984A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/32Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • C23C18/34Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
    • C23C18/36Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents using hypophosphites
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/48Coating with alloys
    • C23C18/50Coating with alloys with alloys based on iron, cobalt or nickel
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12729Group IIA metal-base component
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771Transition metal-base component
    • Y10T428/12778Alternative base metals from diverse categories

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)

Abstract

1,129,984. Electroless deposition of Ni-P alloys. SECRETARY OF THE ARMY U. S. A. Nov. 1,1965 [Oct. 30, 1964], No.46089/65. Headings C7A and C7F. A coating consisting of an alloy of Ni-P e.g. 94% Ni and 6% P, with at least one of W, Sn, Zn, Mo, Re, Be, Rh, Pd, Pt and Au is electrolessly deposited on a metal structure, e. g. a steel panel to provide sacrificial protection against corrosion, by immersing the structure in an alkaline citrate nickel-hypophosphite bath solution containing a salt of the above alloying metals. For an unammoniated bath, the solution contains 3-21 g/l NiSO 4 6H 2 O, 10-40 g/l sodium citrate 2H 2 O, 5-20 g/l Na H 2 PO 2 . H 2 O, 0À2 ml/l mercaptobenzothiazole (10 g/l in 2N NaOH) as stabilizer (except for depositing Ni-P-W alloy), and one or more of the salts: 8-80 g/l Na 2 WO 4 . 2H 2 O [giving 13% W in the deposit], 1-2 g/l Na 2 SnO 3 . 3H 2 O [<1%Sn], 1-4 g/l ZnSO 4 . 7H 2 O[7%Zn], 0À2-10g/l KReO 4 [17%Re], 0À2-5g/l BeF 2 [<1%Be], and 0À05-0À5g/l RhCl 2 . 3H 2 O [12% Rh]. For an ammoniated bath, the solution contains 50-100g/l sodium citrate. 2H 2 O, 5-20g/l NaH 2 PO 2 . H 2 O, 5-60g/l NH 4 Cl, and 0.04-0.2 mols/1 NisO 4 . 6H 2 O + X where X is salt selected from 20-80 mol% Na 2 WO 4 . 2H 2 O [giving 12%W in the deposit], 5-20 Mol % Na 2 SnO 3 . 3H 2 O [2%Sn], 10-40 mol% ZnSO 4 . 7H 2 O [8%Zn], 0.1-0.4 mol % Na 2 MoO 4 . 2H 2 O [6%Mo], 1-20 mol % K ReO 4 [45% Re], 0À1-1À0 mol % each of PdCl, [5% Pd], HPtCl 4 . 3H 2 O [< 1% Pt] and HAu Cl 4 . 3H 2 O [<1%Au].
GB46089/65A 1964-10-30 1965-11-01 Electroless deposition of nickel-phosphorus alloys Expired GB1129984A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US40794164A 1964-10-30 1964-10-30
US73689268A 1968-05-01 1968-05-01

Publications (1)

Publication Number Publication Date
GB1129984A true GB1129984A (en) 1968-10-09

Family

ID=27020070

Family Applications (1)

Application Number Title Priority Date Filing Date
GB46089/65A Expired GB1129984A (en) 1964-10-30 1965-11-01 Electroless deposition of nickel-phosphorus alloys

Country Status (2)

Country Link
US (1) US3485597A (en)
GB (1) GB1129984A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2018017A (en) * 1978-03-31 1979-10-10 Hitachi Ltd Cathode base alloy materials
EP0289838A2 (en) * 1987-04-24 1988-11-09 Gerhard Collardin GmbH Process for the electroless plating of ternary alloys containing nickel and phosphor
DE3790128C2 (en) * 1986-03-04 1995-07-27 Ishihara Chemical Co Ltd Electroless plating soln. for palladium deposition
DE102006020988A1 (en) * 2006-05-04 2007-11-08 Nanogate Ag Precious metal-containing nickel layer

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4019910A (en) * 1974-05-24 1977-04-26 The Richardson Chemical Company Electroless nickel polyalloy plating baths
US4632857A (en) * 1974-05-24 1986-12-30 Richardson Chemical Company Electrolessly plated product having a polymetallic catalytic film underlayer
US3971861A (en) * 1974-10-25 1976-07-27 Handy Chemicals Limited Alloy plating system
IT1070268B (en) * 1976-10-19 1985-03-29 Alfachimici Spa COMPOSITION FOR THE ANELECTRIC DEPOSITION OF NICKEL-BASED ALLOYS
JPS5751276A (en) * 1980-09-13 1982-03-26 Agency Of Ind Science & Technol Manufacture of anode for electrolyzing water
US20040126548A1 (en) * 2001-05-28 2004-07-01 Waseda University ULSI wiring and method of manufacturing the same
KR101170560B1 (en) * 2003-05-09 2012-08-01 바스프 에스이 Compositions for the currentless depoisition of ternary materials for use in the semiconductor industry
EP1978128A2 (en) * 2007-03-29 2008-10-08 Ebara Corporation Electroless plating bath and method for producing high-temperature apparatus member using the bath
DE102007053457A1 (en) 2007-11-07 2009-05-14 Nanogate Ag Gold-containing nickel layer
DE102008036211A1 (en) 2008-08-02 2010-02-04 Nanogate Ag Process for the deposition of nickel and precious metal from the same bath
MY166049A (en) 2010-09-03 2018-05-22 Omg Electronic Chemicals Llc Electroless nickel alloy plating bath and process for depositing thereof
EP3255176B1 (en) * 2011-01-11 2019-05-01 MacDermid Enthone America LLC Method of plating particulate matter
JP6199086B2 (en) * 2013-06-13 2017-09-20 東洋鋼鈑株式会社 Palladium-plated coating material and method for producing palladium-plated coating material
FR3011309B1 (en) * 2013-10-02 2015-10-30 Vallourec Oil & Gas France STOPPING FOR A TUBULAR COMPONENT COVERED WITH A COMPOSITE METAL DEPOSITION
CN106637151B (en) * 2016-09-21 2018-09-21 芜湖扬展新材料科技服务有限公司 A kind of preparation method for the aero titanium alloy that friction coefficient is high
CN106637150B (en) * 2016-09-21 2018-09-25 芜湖扬展新材料科技服务有限公司 A kind of preparation method of aero titanium alloy
CN106498375B (en) * 2016-09-21 2018-09-21 芜湖扬展新材料科技服务有限公司 The preparation method of the high aero titanium alloy of friction coefficient
CN106637152A (en) * 2016-09-21 2017-05-10 芜湖扬展新材料科技服务有限公司 Preparation method of titanium alloy
CN106319486B (en) * 2016-09-21 2018-10-30 芜湖扬展新材料科技服务有限公司 The preparation method of the high titanium alloy of friction coefficient
CN106637153A (en) * 2016-09-21 2017-05-10 芜湖扬展新材料科技服务有限公司 Preparation method of titanium alloy
US11054199B2 (en) 2019-04-12 2021-07-06 Rheem Manufacturing Company Applying coatings to the interior surfaces of heat exchangers
CN110965052A (en) * 2019-12-25 2020-04-07 廊坊师范学院 Preparation process of medium-temperature chemical nickel-phosphorus plating alloy on metal surface

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2828227A (en) * 1956-03-30 1958-03-25 Sylvania Electric Prod Electroless deposition of vanadium alloys
NL253834A (en) * 1959-07-21 1900-01-01
DE1243493B (en) * 1961-02-04 1967-06-29 Bayer Ag Aqueous bath for chemical deposition of boron-containing metal coatings
US3077285A (en) * 1961-09-15 1963-02-12 Gen Am Transport Tin-nickel-phosphorus alloy coatings
US3178311A (en) * 1961-09-25 1965-04-13 Bunker Ramo Electroless plating process
US3202538A (en) * 1963-06-04 1965-08-24 Bunker Ramo Magnetic recording device and method for producing same by electroless plating
GB1052649A (en) * 1964-06-05

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2018017A (en) * 1978-03-31 1979-10-10 Hitachi Ltd Cathode base alloy materials
DE3790128C2 (en) * 1986-03-04 1995-07-27 Ishihara Chemical Co Ltd Electroless plating soln. for palladium deposition
EP0289838A2 (en) * 1987-04-24 1988-11-09 Gerhard Collardin GmbH Process for the electroless plating of ternary alloys containing nickel and phosphor
EP0289838A3 (en) * 1987-04-24 1989-11-08 Gerhard Collardin GmbH Process for the electroless plating of ternary alloys containing nickel and phosphor
DE102006020988A1 (en) * 2006-05-04 2007-11-08 Nanogate Ag Precious metal-containing nickel layer
DE102006020988B4 (en) * 2006-05-04 2012-08-30 Nanogate Ag Noble metal-containing nickel bath, its use for the production of a noble metal-containing nickel layer, noble metal-containing nickel layer and their use

Also Published As

Publication number Publication date
US3485597A (en) 1969-12-23

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