GB1087044A - Improvements in or relating to methods of fabricating electrical devices - Google Patents

Improvements in or relating to methods of fabricating electrical devices

Info

Publication number
GB1087044A
GB1087044A GB19812/65A GB1981265A GB1087044A GB 1087044 A GB1087044 A GB 1087044A GB 19812/65 A GB19812/65 A GB 19812/65A GB 1981265 A GB1981265 A GB 1981265A GB 1087044 A GB1087044 A GB 1087044A
Authority
GB
United Kingdom
Prior art keywords
lead
layer
silicon monoxide
resist
layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB19812/65A
Inventor
David Malcolm Connah
Norman Dennis Richards
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Philips Components Ltd
Original Assignee
Mullard Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mullard Ltd filed Critical Mullard Ltd
Priority to GB19812/65A priority Critical patent/GB1087044A/en
Publication of GB1087044A publication Critical patent/GB1087044A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/44Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using super-conductive elements, e.g. cryotron
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/042Coating on selected surface areas, e.g. using masks using masks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • C23F1/02Local etching
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00Superconducting devices
    • H10N60/01Manufacture or treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)

Abstract

An electrical device, e.g. a cryotron, is formed by vapour depositing (1) a conducting layer of e.g. lead on a substrate of e.g. glass, (2) an insulating layer of e.g. silicon monoxide (3) a superconducting layer of e.g. tin, (4) an etch resistant layer of e.g. silicon monoxide or a polymer, (5) a layer of lead, and (6) a photo-resist. The photo-resist is exposed through a mask and the top lead layer or the lead and tin layers are selectively etched by e.g. HNO3. Residual etchant is washed away and the resist removed with acetone. Further layers of silicon monoxide and lead may be deposited. The top layers of lead may also be etched to form a control conductor using 10% acetic acid + H2O2 in a ratio of 4 : 1. The cryotron is given a final protective layer of silicon monoxide.
GB19812/65A 1965-05-11 1965-05-11 Improvements in or relating to methods of fabricating electrical devices Expired GB1087044A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB19812/65A GB1087044A (en) 1965-05-11 1965-05-11 Improvements in or relating to methods of fabricating electrical devices

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB19812/65A GB1087044A (en) 1965-05-11 1965-05-11 Improvements in or relating to methods of fabricating electrical devices

Publications (1)

Publication Number Publication Date
GB1087044A true GB1087044A (en) 1967-10-11

Family

ID=10135647

Family Applications (1)

Application Number Title Priority Date Filing Date
GB19812/65A Expired GB1087044A (en) 1965-05-11 1965-05-11 Improvements in or relating to methods of fabricating electrical devices

Country Status (1)

Country Link
GB (1) GB1087044A (en)

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