GB1031494A - Improvements in or relating to processes for the manufacture of substantially homogeneously doped crystals of semiconductor material - Google Patents

Improvements in or relating to processes for the manufacture of substantially homogeneously doped crystals of semiconductor material

Info

Publication number
GB1031494A
GB1031494A GB3871164A GB3871164A GB1031494A GB 1031494 A GB1031494 A GB 1031494A GB 3871164 A GB3871164 A GB 3871164A GB 3871164 A GB3871164 A GB 3871164A GB 1031494 A GB1031494 A GB 1031494A
Authority
GB
United Kingdom
Prior art keywords
semi
gaseous
conductor material
doping
doping substance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3871164A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens and Halske AG
Siemens Corp
Original Assignee
Siemens and Halske AG
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens and Halske AG, Siemens Corp filed Critical Siemens and Halske AG
Publication of GB1031494A publication Critical patent/GB1031494A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02Epitaxial-layer growth
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/02Silicon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
GB3871164A 1963-10-08 1964-09-23 Improvements in or relating to processes for the manufacture of substantially homogeneously doped crystals of semiconductor material Expired GB1031494A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1963S0087768 DE1286512B (de) 1963-10-08 1963-10-08 Verfahren zur Herstellung von insbesondere stabfoermigen Halbleiterkristallen mit ueber den ganzen Kristall homogener oder annaehernd homogener Dotierung

Publications (1)

Publication Number Publication Date
GB1031494A true GB1031494A (en) 1966-06-02

Family

ID=7514022

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3871164A Expired GB1031494A (en) 1963-10-08 1964-09-23 Improvements in or relating to processes for the manufacture of substantially homogeneously doped crystals of semiconductor material

Country Status (5)

Country Link
AT (1) AT253566B (enExample)
CH (1) CH432479A (enExample)
DE (1) DE1286512B (enExample)
GB (1) GB1031494A (enExample)
NL (1) NL6406894A (enExample)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2556711A (en) * 1947-10-29 1951-06-12 Bell Telephone Labor Inc Method of producing rectifiers and rectifier material
DE883784C (de) * 1949-04-06 1953-06-03 Sueddeutsche App Fabrik G M B Verfahren zur Herstellung von Flaechengleichrichtern und Kristallverstaerkerschichten aus Elementen
NL258754A (enExample) * 1954-05-18 1900-01-01
DE1140549B (de) * 1954-05-18 1962-12-06 Siemens Ag Verfahren zum Herstellen von reinstem kristallinem Germanium, Verbindungen von Elementen der ó¾. und ó§.oder ó�. und ó÷. Gruppe des Periodischen Systems und von oxydischem Halbleitermaterial
DE1139812B (de) * 1958-12-09 1962-11-22 Siemens Ag Vorrichtung zur Gewinnung stabfoermiger Halbleiterkoerper und Verfahren zum Betrieb dieser Vorrichtung
DE1029941B (de) * 1955-07-13 1958-05-14 Siemens Ag Verfahren zur Herstellung von einkristallinen Halbleiterschichten
DE1130078B (de) * 1956-08-10 1962-05-24 Siemens Ag Verfahren zur Dotierung von Halbleiterkristallen fuer Halbleiterbauelemente
AT226278B (de) * 1960-06-14 1963-03-11 Siemens Ag Verfahren zum Herstellen homogen dotierter einkristalliner Körper aus einem halbleitenden Element

Also Published As

Publication number Publication date
AT253566B (de) 1967-04-10
CH432479A (de) 1967-03-31
NL6406894A (enExample) 1965-04-09
DE1286512B (de) 1969-01-09

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