GB1030427A - A method of producing a copper base alloy conductor - Google Patents
A method of producing a copper base alloy conductorInfo
- Publication number
- GB1030427A GB1030427A GB23581/63A GB2358163A GB1030427A GB 1030427 A GB1030427 A GB 1030427A GB 23581/63 A GB23581/63 A GB 23581/63A GB 2358163 A GB2358163 A GB 2358163A GB 1030427 A GB1030427 A GB 1030427A
- Authority
- GB
- United Kingdom
- Prior art keywords
- workpiece
- producing
- conductor
- base alloy
- reducing atmosphere
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000956 alloy Substances 0.000 title abstract 2
- 229910045601 alloy Inorganic materials 0.000 title abstract 2
- 239000004020 conductor Substances 0.000 title abstract 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title 1
- 229910052802 copper Inorganic materials 0.000 title 1
- 239000010949 copper Substances 0.000 title 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 abstract 2
- 238000003483 aging Methods 0.000 abstract 1
- 229910021529 ammonia Inorganic materials 0.000 abstract 1
- 238000001816 cooling Methods 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/02—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working in inert or controlled atmosphere or vacuum
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/08—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/10—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of nickel or cobalt or alloys based thereon
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/02—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
- H01B1/026—Alloys based on copper
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07
- H01L21/4814—Conductive parts
- H01L21/4871—Bases, plates or heatsinks
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/8319—Arrangement of the layer connectors prior to mounting
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
- H01L2224/83801—Soldering or alloying
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01005—Boron [B]
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- H01L2924/01006—Carbon [C]
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01013—Aluminum [Al]
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- H01L2924/01015—Phosphorus [P]
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- H01L2924/01019—Potassium [K]
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
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- H01L2924/01023—Vanadium [V]
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01029—Copper [Cu]
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
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- H01L2924/01033—Arsenic [As]
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- H01L2924/01039—Yttrium [Y]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
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- H01L2924/0104—Zirconium [Zr]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
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- H01L2924/01042—Molybdenum [Mo]
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- H01L2924/01—Chemical elements
- H01L2924/01047—Silver [Ag]
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01074—Tungsten [W]
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
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- H01L2924/01075—Rhenium [Re]
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- H01—ELECTRIC ELEMENTS
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01084—Polonium [Po]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/0132—Binary Alloys
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/014—Solder alloys
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Crystallography & Structural Chemistry (AREA)
- Thermal Sciences (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Conductive Materials (AREA)
- Lead Frames For Integrated Circuits (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US24699162A | 1962-12-26 | 1962-12-26 | |
| US311614A US3279039A (en) | 1962-12-26 | 1963-09-23 | Method of producing semiconductor mounts |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1030427A true GB1030427A (en) | 1966-05-25 |
Family
ID=26938378
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB23581/63A Expired GB1030427A (en) | 1962-12-26 | 1963-06-13 | A method of producing a copper base alloy conductor |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3279039A (forum.php) |
| CH (1) | CH413938A (forum.php) |
| DE (1) | DE1458546B1 (forum.php) |
| DK (1) | DK128629B (forum.php) |
| GB (1) | GB1030427A (forum.php) |
| NL (2) | NL295109A (forum.php) |
| SE (1) | SE321583B (forum.php) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0023362A1 (en) * | 1979-07-30 | 1981-02-04 | Kabushiki Kaisha Toshiba | A method for manufacturing an electrically conductive copper alloy material |
| EP0029888A1 (en) * | 1979-11-19 | 1981-06-10 | International Business Machines Corporation | Method of producing a conductive wire |
| US4424432A (en) | 1977-11-10 | 1984-01-03 | Hideo Kaneko | Electrode material for travelling-wire type electrical discharge machining |
| DE3716106C1 (en) * | 1987-05-14 | 1989-01-19 | Battelle Institut E V | A process for the powder-metallurgical production of dispersion-hardened copper alloys |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3434018A (en) * | 1966-07-05 | 1969-03-18 | Motorola Inc | Heat conductive mounting base for a semiconductor device |
| US4192063A (en) * | 1975-12-10 | 1980-03-11 | Yoshio Sato | Method for manufacturing a base of a semi-conductor device |
| JPS5271176A (en) * | 1975-12-11 | 1977-06-14 | Sato Tokuo | Method of manufacturing base for pressure contact type semiconductor |
| GB1525431A (en) * | 1976-01-08 | 1978-09-20 | Gkn Floform Ltd | Method of making semi-conductor mounts |
| US4049185A (en) * | 1977-03-11 | 1977-09-20 | The Nippert Company | Method of forming double extruded mount |
| US4149310A (en) * | 1978-03-27 | 1979-04-17 | The Nippert Company | Method of making a heat sink mounting |
| US6001227A (en) | 1997-11-26 | 1999-12-14 | Applied Materials, Inc. | Target for use in magnetron sputtering of aluminum for forming metallization films having low defect densities and methods for manufacturing and using such target |
| US6139701A (en) * | 1997-11-26 | 2000-10-31 | Applied Materials, Inc. | Copper target for sputter deposition |
| US6172414B1 (en) * | 1998-04-28 | 2001-01-09 | Trw Inc. | Apparatus and method for snap-on thermo-compression bonding |
| EP2089901A4 (en) * | 2006-11-09 | 2011-05-18 | Interplex Qlp Inc | MICROCIRCUIT HOUSING HAVING A DUCTILE LAYER |
| DE102015001293B4 (de) * | 2015-02-02 | 2022-11-17 | Isabellenhütte Heusler Gmbh & Co. Kg | Stromschienenanordnung |
| CN115533000B (zh) * | 2022-10-19 | 2025-06-24 | 上海交通大学 | 一种反应堆核岛带法兰奥氏体不锈钢吊篮筒体整体锻造成形方法 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1074609B (de) * | 1960-02-04 | J F Mahler Industrieofenbau Eßlmgen/Neckar | Mit Schutzgas be tnebener Tunnelofen mit Kuhltunnel | |
| DE543667C (de) * | 1926-10-20 | 1932-02-08 | Ver Deutsche Metallwerke Akt G | Verguetung von Kupfer-Beryllium-Legierungen |
| US2117106A (en) * | 1936-02-21 | 1938-05-10 | American Brass Co | Brazed article |
| US2145792A (en) * | 1937-03-22 | 1939-01-31 | Mallory & Co Inc P R | Contacting element |
| DE738228C (de) * | 1941-09-17 | 1943-08-07 | Otto Junker Fa | Verfahren und Vorrichtung zum Weichgluehen von aushaertbaren Metallteilen, insbesondere Leichtmetallteilen, im Fliessbetrieb |
| CH256276A (de) * | 1945-01-17 | 1948-08-15 | Ici Ltd | Verfahren zur Herstellung von Gegenständen aus Kupfer-Chrom-Legierungen und nach diesem Verfahren erhaltener Gegenstand. |
| US2637672A (en) * | 1950-08-22 | 1953-05-05 | Westinghouse Electric Corp | Process of producing bolts |
| BE558969A (forum.php) * | 1956-07-04 | |||
| DE1090437B (de) * | 1956-08-14 | 1960-10-06 | Nippert Electric Products Comp | Verfahren zum Verbessern der elektrischen und mechanischen Eigenschaften von Kupfer-Zirkon-Legierungen |
| DE1086899B (de) * | 1957-03-28 | 1960-08-11 | Ver Deutsche Metallwerke Ag | Verfahren zur Behandlung von warmaushaertbaren Kupferlegierungen, die 0,1 bis 6% Zirkon, Rest Kupfer mit den ueblichen Verunreinigungen enthalten |
| US2984474A (en) * | 1958-05-02 | 1961-05-16 | Armco Steel Corp | Heat treating method and apparatus |
| US2879191A (en) * | 1958-06-23 | 1959-03-24 | Nippert Electric Products Comp | Method of producing heat treated copper zirconium alloys and articles formed thereof |
| NL120008C (forum.php) * | 1959-05-15 | |||
| US3130250A (en) * | 1960-07-18 | 1964-04-21 | Pacific Scientific Co | Heat treating furnace |
| US3197843A (en) * | 1961-05-19 | 1965-08-03 | Nippert Electric Products Comp | Method of forming a mount for semiconductors |
-
0
- NL NL129350D patent/NL129350C/xx active
- NL NL295109D patent/NL295109A/xx unknown
-
1963
- 1963-06-13 GB GB23581/63A patent/GB1030427A/en not_active Expired
- 1963-07-01 CH CH814963A patent/CH413938A/fr unknown
- 1963-07-08 SE SE7565/63A patent/SE321583B/xx unknown
- 1963-07-09 DK DK325963AA patent/DK128629B/da unknown
- 1963-08-22 DE DE1963N0023640 patent/DE1458546B1/de active Pending
- 1963-09-23 US US311614A patent/US3279039A/en not_active Expired - Lifetime
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4424432A (en) | 1977-11-10 | 1984-01-03 | Hideo Kaneko | Electrode material for travelling-wire type electrical discharge machining |
| EP0023362A1 (en) * | 1979-07-30 | 1981-02-04 | Kabushiki Kaisha Toshiba | A method for manufacturing an electrically conductive copper alloy material |
| EP0029888A1 (en) * | 1979-11-19 | 1981-06-10 | International Business Machines Corporation | Method of producing a conductive wire |
| DE3716106C1 (en) * | 1987-05-14 | 1989-01-19 | Battelle Institut E V | A process for the powder-metallurgical production of dispersion-hardened copper alloys |
Also Published As
| Publication number | Publication date |
|---|---|
| NL295109A (forum.php) | |
| DE1458546B1 (de) | 1970-04-09 |
| CH413938A (fr) | 1966-05-31 |
| SE321583B (forum.php) | 1970-03-09 |
| DK128629B (da) | 1974-06-04 |
| US3279039A (en) | 1966-10-18 |
| NL129350C (forum.php) |
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