GB0415976D0 - Polishing composition for magnetic disk - Google Patents

Polishing composition for magnetic disk

Info

Publication number
GB0415976D0
GB0415976D0 GBGB0415976.0A GB0415976A GB0415976D0 GB 0415976 D0 GB0415976 D0 GB 0415976D0 GB 0415976 A GB0415976 A GB 0415976A GB 0415976 D0 GB0415976 D0 GB 0415976D0
Authority
GB
United Kingdom
Prior art keywords
magnetic disk
polishing composition
polishing
composition
disk
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GBGB0415976.0A
Other versions
GB2404921B (en
GB2404921A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kao Corp
Original Assignee
Kao Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kao Corp filed Critical Kao Corp
Publication of GB0415976D0 publication Critical patent/GB0415976D0/en
Publication of GB2404921A publication Critical patent/GB2404921A/en
Application granted granted Critical
Publication of GB2404921B publication Critical patent/GB2404921B/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
GB0415976A 2003-08-08 2004-07-16 Polishing composition for magnetic disk Expired - Fee Related GB2404921B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003290690A JP4206313B2 (en) 2003-08-08 2003-08-08 Polishing liquid composition for magnetic disk

Publications (3)

Publication Number Publication Date
GB0415976D0 true GB0415976D0 (en) 2004-08-18
GB2404921A GB2404921A (en) 2005-02-16
GB2404921B GB2404921B (en) 2007-09-12

Family

ID=32906131

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0415976A Expired - Fee Related GB2404921B (en) 2003-08-08 2004-07-16 Polishing composition for magnetic disk

Country Status (6)

Country Link
US (2) US20050032463A1 (en)
JP (1) JP4206313B2 (en)
CN (1) CN100460478C (en)
GB (1) GB2404921B (en)
MY (1) MY139590A (en)
TW (1) TWI343943B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI506621B (en) * 2005-12-22 2015-11-01 Kao Corp Polishing composition for hard disk substrate
US8247326B2 (en) 2008-07-10 2012-08-21 Cabot Microelectronics Corporation Method of polishing nickel-phosphorous
US9039914B2 (en) 2012-05-23 2015-05-26 Cabot Microelectronics Corporation Polishing composition for nickel-phosphorous-coated memory disks
JP6366308B2 (en) * 2014-03-12 2018-08-01 株式会社ディスコ Processing method
US10144850B2 (en) * 2015-09-25 2018-12-04 Versum Materials Us, Llc Stop-on silicon containing layer additive

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6039891A (en) * 1996-09-24 2000-03-21 Cabot Corporation Multi-oxidizer precursor for chemical mechanical polishing
US5958288A (en) * 1996-11-26 1999-09-28 Cabot Corporation Composition and slurry useful for metal CMP
US6149696A (en) * 1997-11-06 2000-11-21 Komag, Inc. Colloidal silica slurry for NiP plated disk polishing
US6569216B1 (en) * 1998-11-27 2003-05-27 Kao Corporation Abrasive fluid compositions
JP2000212776A (en) * 1999-01-18 2000-08-02 Jsr Corp Aqueous dispersion for mechanochemical polishing
KR20010087485A (en) * 2000-03-07 2001-09-21 김순택 Method for driving plasma display panel
US6569215B2 (en) * 2000-04-17 2003-05-27 Showa Denko Kabushiki Kaisha Composition for polishing magnetic disk substrate
US6976905B1 (en) * 2000-06-16 2005-12-20 Cabot Microelectronics Corporation Method for polishing a memory or rigid disk with a phosphate ion-containing polishing system
JP4009986B2 (en) * 2000-11-29 2007-11-21 株式会社フジミインコーポレーテッド Polishing composition and polishing method for polishing memory hard disk using the same
EP1211024A3 (en) * 2000-11-30 2004-01-02 JSR Corporation Polishing method
JP4231632B2 (en) * 2001-04-27 2009-03-04 花王株式会社 Polishing liquid composition
CN100378145C (en) * 2001-06-21 2008-04-02 花王株式会社 Grinding liquid composition
MY133305A (en) * 2001-08-21 2007-11-30 Kao Corp Polishing composition
JP2003151928A (en) * 2001-11-12 2003-05-23 Sumitomo Bakelite Co Ltd Polishing composition
KR100449614B1 (en) * 2001-12-28 2004-09-22 제일모직주식회사 Slurry composition of low erosion for chemical mechanical polishing of metal lines
JP2003218071A (en) * 2002-01-28 2003-07-31 Sumitomo Bakelite Co Ltd Composition for polishing
MY134679A (en) * 2002-12-26 2007-12-31 Kao Corp Polishing composition

Also Published As

Publication number Publication date
TW200517479A (en) 2005-06-01
CN100460478C (en) 2009-02-11
TWI343943B (en) 2011-06-21
MY139590A (en) 2009-10-30
US20050032463A1 (en) 2005-02-10
GB2404921B (en) 2007-09-12
CN1580173A (en) 2005-02-16
US20050136807A1 (en) 2005-06-23
GB2404921A (en) 2005-02-16
JP2005063531A (en) 2005-03-10
JP4206313B2 (en) 2009-01-07

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20120716