GB2403954B - Polishing composition - Google Patents

Polishing composition

Info

Publication number
GB2403954B
GB2403954B GB0414656A GB0414656A GB2403954B GB 2403954 B GB2403954 B GB 2403954B GB 0414656 A GB0414656 A GB 0414656A GB 0414656 A GB0414656 A GB 0414656A GB 2403954 B GB2403954 B GB 2403954B
Authority
GB
United Kingdom
Prior art keywords
polishing composition
polishing
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB0414656A
Other versions
GB0414656D0 (en
GB2403954A (en
Inventor
Tomohide Kamiya
Noritaka Yokomichi
Toshiki Owaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujimi Inc
Original Assignee
Fujimi Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujimi Inc filed Critical Fujimi Inc
Publication of GB0414656D0 publication Critical patent/GB0414656D0/en
Publication of GB2403954A publication Critical patent/GB2403954A/en
Application granted granted Critical
Publication of GB2403954B publication Critical patent/GB2403954B/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
GB0414656A 2003-07-03 2004-06-30 Polishing composition Expired - Fee Related GB2403954B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003191307A JP4202201B2 (en) 2003-07-03 2003-07-03 Polishing composition

Publications (3)

Publication Number Publication Date
GB0414656D0 GB0414656D0 (en) 2004-08-04
GB2403954A GB2403954A (en) 2005-01-19
GB2403954B true GB2403954B (en) 2008-01-02

Family

ID=32844734

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0414656A Expired - Fee Related GB2403954B (en) 2003-07-03 2004-06-30 Polishing composition

Country Status (4)

Country Link
JP (1) JP4202201B2 (en)
CN (1) CN1576339B (en)
GB (1) GB2403954B (en)
MY (2) MY160322A (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8025808B2 (en) 2003-04-25 2011-09-27 Saint-Gobain Ceramics & Plastics, Inc. Methods for machine ceramics
US7776230B2 (en) * 2006-08-30 2010-08-17 Cabot Microelectronics Corporation CMP system utilizing halogen adduct
EP2121244B1 (en) 2006-12-20 2013-07-10 Saint-Gobain Ceramics & Plastics, Inc. Methods for machining inorganic, non-metallic workpieces
JP4614981B2 (en) * 2007-03-22 2011-01-19 Ｊｓｒ株式会社 Chemical mechanical polishing aqueous dispersion and semiconductor device chemical mechanical polishing method
WO2009150938A1 (en) * 2008-06-11 2009-12-17 信越化学工業株式会社 Polishing agent for synthetic quartz glass substrate
US8226841B2 (en) * 2009-02-03 2012-07-24 Cabot Microelectronics Corporation Polishing composition for nickel-phosphorous memory disks
CN101955732B (en) * 2009-07-13 2016-06-15 安集微电子（上海）有限公司 A kind of chemical mechanical polishing liquid
CN102516887B (en) * 2011-11-24 2014-01-08 珠海承鸥卫浴用品有限公司 Polishing solution and plasma polishing process
CN102746795B (en) * 2012-06-18 2013-12-18 工业和信息化部电子第五研究所华东分所 Polishing solution for printed circuit microsections and preparation method thereof
CN103102811B (en) * 2013-01-18 2014-07-09 上海森博新材料科技有限公司 Mechanical grinding solution and metal surface treatment method adopting grinding solution
JP2014101518A (en) * 2014-01-06 2014-06-05 Fujimi Inc Polishing composition, polishing method and elasticity deterioration preventing method of polishing pad
KR101943704B1 (en) * 2016-06-27 2019-01-29 삼성에스디아이 주식회사 Cmp slurry composition for metal film and polishing method
GB2562776A (en) * 2017-05-25 2018-11-28 Weatherford Uk Ltd Pressure integrity testing of one-trip completion assembly
CN110629227A (en) * 2019-08-14 2019-12-31 沈阳造币有限公司 Electrolyte plasma polishing solution and polishing process for coinage copper alloy blank cake
CN111574927A (en) * 2020-06-22 2020-08-25 宁波日晟新材料有限公司 Silicon carbide polishing solution containing reducing agent and preparation method and application thereof

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6123603A (en) * 1997-06-17 2000-09-26 Showa Aluminum Corporation Magnetic hard disc substrate and process for manufacturing the same
US6309434B1 (en) * 1999-09-28 2001-10-30 Fujimi Incorporated Polishing composition and method for producing a memory hard disks
US20010049913A1 (en) * 2000-04-17 2001-12-13 Norihiko Miyata Composition for polishing magnetic disk substrate
US6471884B1 (en) * 2000-04-04 2002-10-29 Cabot Microelectronics Corporation Method for polishing a memory or rigid disk with an amino acid-containing composition
WO2003020839A1 (en) * 2001-09-03 2003-03-13 Showa Denko K.K. Polishing composition
WO2003072671A1 (en) * 2002-02-22 2003-09-04 Saint-Gobain Ceramics & Plastics, Inc. Cmp formulations for the use on nickel-phosphorus alloys
GB2397068A (en) * 2002-12-26 2004-07-14 Kao Corp Polishing composition
GB2398075A (en) * 2003-02-05 2004-08-11 Kao Corp Polishing composition
GB2401109A (en) * 2003-03-31 2004-11-03 Fujimi Inc Polishing composition

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW486514B (en) * 1999-06-16 2002-05-11 Eternal Chemical Co Ltd Chemical mechanical abrasive composition for use in semiconductor processing
CN1288927A (en) * 1999-09-21 2001-03-28 长兴化学工业股份有限公司 Composition ground in chemical machine
US6258140B1 (en) * 1999-09-27 2001-07-10 Fujimi America Inc. Polishing composition
TW528645B (en) * 2000-04-17 2003-04-21 Showa Denko Kk Composition for polishing magnetic disk substrate
US6976905B1 (en) * 2000-06-16 2005-12-20 Cabot Microelectronics Corporation Method for polishing a memory or rigid disk with a phosphate ion-containing polishing system
JP2002198331A (en) * 2000-12-26 2002-07-12 Jsr Corp Polishing method
JP4231632B2 (en) * 2001-04-27 2009-03-04 花王株式会社 Polishing liquid composition
JP4462599B2 (en) * 2001-08-21 2010-05-12 花王株式会社 Polishing liquid composition
JP4074126B2 (en) * 2001-09-03 2008-04-09 昭和電工株式会社 Polishing composition
JP3680022B2 (en) * 2001-12-07 2005-08-10 東洋鋼鈑株式会社 Magnetic disk substrate polishing liquid
JP2003286477A (en) * 2002-03-28 2003-10-10 Sumitomo Bakelite Co Ltd Polishing composition and polishing method
JP2004175904A (en) * 2002-11-27 2004-06-24 Sumitomo Bakelite Co Ltd Polishing composition

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6123603A (en) * 1997-06-17 2000-09-26 Showa Aluminum Corporation Magnetic hard disc substrate and process for manufacturing the same
US6309434B1 (en) * 1999-09-28 2001-10-30 Fujimi Incorporated Polishing composition and method for producing a memory hard disks
US6471884B1 (en) * 2000-04-04 2002-10-29 Cabot Microelectronics Corporation Method for polishing a memory or rigid disk with an amino acid-containing composition
US20010049913A1 (en) * 2000-04-17 2001-12-13 Norihiko Miyata Composition for polishing magnetic disk substrate
WO2003020839A1 (en) * 2001-09-03 2003-03-13 Showa Denko K.K. Polishing composition
WO2003072671A1 (en) * 2002-02-22 2003-09-04 Saint-Gobain Ceramics & Plastics, Inc. Cmp formulations for the use on nickel-phosphorus alloys
GB2397068A (en) * 2002-12-26 2004-07-14 Kao Corp Polishing composition
GB2398075A (en) * 2003-02-05 2004-08-11 Kao Corp Polishing composition
GB2401109A (en) * 2003-03-31 2004-11-03 Fujimi Inc Polishing composition

Also Published As

Publication number Publication date
GB0414656D0 (en) 2004-08-04
MY160322A (en) 2017-02-28
JP4202201B2 (en) 2008-12-24
CN1576339A (en) 2005-02-09
JP2005023228A (en) 2005-01-27
CN1576339B (en) 2012-03-28
GB2403954A (en) 2005-01-19
MY144568A (en) 2011-10-14

Similar Documents

Publication Publication Date Title
AU2003215261A8 (en) Polishing composition
GB2412917B (en) Polishing composition
GB2417034B (en) Polishing composition
TWI370844B (en) Polishing composition
GB2415199B (en) Polishing composition
GB0521905D0 (en) Polishing composition
GB0400248D0 (en) Polishing composition
GB2403725B (en) Polishing composition
TWI317757B (en) Polishing composition
GB2397580B (en) Polishing composition
GB2401370B (en) Polishing composition
GB2393447B (en) Polishing composition
GB2403954B (en) Polishing composition
GB2401610B (en) Polishing composition
GB2397579B (en) Polishing composition
GB2401109B (en) Polishing composition
TWI370172B (en) Polishing composition
GB2390370B (en) Polishing composition
GB2393186B (en) Polishing composition
EP1735394A4 (en) Polishing composition
GB2395486B (en) Polishing composition
GB2418205B (en) Polishing composition
GB0205776D0 (en) Polish composition
GB0301560D0 (en) Composition

Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20080630