GB2403725B - Polishing composition - Google Patents

Polishing composition

Info

Publication number
GB2403725B
GB2403725B GB0413699A GB0413699A GB2403725B GB 2403725 B GB2403725 B GB 2403725B GB 0413699 A GB0413699 A GB 0413699A GB 0413699 A GB0413699 A GB 0413699A GB 2403725 B GB2403725 B GB 2403725B
Authority
GB
United Kingdom
Prior art keywords
polishing composition
polishing
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB0413699A
Other versions
GB0413699D0 (en
GB2403725A (en
Inventor
Shigeo Fujii
Hiroaki Kitayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kao Corp
Original Assignee
Kao Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kao Corp filed Critical Kao Corp
Publication of GB0413699D0 publication Critical patent/GB0413699D0/en
Publication of GB2403725A publication Critical patent/GB2403725A/en
Application granted granted Critical
Publication of GB2403725B publication Critical patent/GB2403725B/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
GB0413699A 2003-07-01 2004-06-18 Polishing composition Expired - Fee Related GB2403725B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003270150A JP4339034B2 (en) 2003-07-01 2003-07-01 Polishing liquid composition

Publications (3)

Publication Number Publication Date
GB0413699D0 GB0413699D0 (en) 2004-07-21
GB2403725A GB2403725A (en) 2005-01-12
GB2403725B true GB2403725B (en) 2007-10-24

Family

ID=32768031

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0413699A Expired - Fee Related GB2403725B (en) 2003-07-01 2004-06-18 Polishing composition

Country Status (6)

Country Link
US (2) US20050003746A1 (en)
JP (1) JP4339034B2 (en)
CN (1) CN1320078C (en)
GB (1) GB2403725B (en)
MY (1) MY139074A (en)
TW (1) TWI323279B (en)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4753710B2 (en) * 2005-12-22 2011-08-24 花王株式会社 Polishing liquid composition for hard disk substrate
TWI506621B (en) 2005-12-22 2015-11-01 Kao Corp Polishing composition for hard disk substrate
JP2007257811A (en) 2006-03-24 2007-10-04 Hoya Corp Method of manufacturing glass substrate for magnetic disk, and method of manufacturing magnetic disk
JP5283249B2 (en) * 2006-12-27 2013-09-04 花王株式会社 Method for producing polishing composition
JP5461772B2 (en) * 2007-12-14 2014-04-02 花王株式会社 Polishing liquid composition
US7922926B2 (en) 2008-01-08 2011-04-12 Cabot Microelectronics Corporation Composition and method for polishing nickel-phosphorous-coated aluminum hard disks
JP5049249B2 (en) * 2008-10-31 2012-10-17 花王株式会社 Polishing liquid composition
US8226841B2 (en) * 2009-02-03 2012-07-24 Cabot Microelectronics Corporation Polishing composition for nickel-phosphorous memory disks
JP5536433B2 (en) * 2009-12-11 2014-07-02 花王株式会社 Polishing liquid composition for hard disk substrate
KR101396232B1 (en) * 2010-02-05 2014-05-19 한양대학교 산학협력단 Slurry for polishing phase change material and method for patterning polishing phase change material using the same
CN103282160A (en) * 2010-12-29 2013-09-04 Hoya株式会社 Manufacturing method for glass substrate for magnetic disk, and manufacturing method for magnetic disk
US9039914B2 (en) 2012-05-23 2015-05-26 Cabot Microelectronics Corporation Polishing composition for nickel-phosphorous-coated memory disks
JP6734018B2 (en) * 2014-09-17 2020-08-05 株式会社フジミインコーポレーテッド Abrasive material, polishing composition, and polishing method
WO2016042744A1 (en) * 2014-09-17 2016-03-24 株式会社フジミインコーポレーテッド Polishing material, composition for polishing, and polishing method
JP6622991B2 (en) * 2015-06-30 2019-12-18 株式会社フジミインコーポレーテッド Polishing composition
WO2017163942A1 (en) * 2016-03-25 2017-09-28 株式会社フジミインコーポレーテッド Polishing composition for objects to be polished having metal-containing layer
EP3775076A4 (en) * 2018-03-28 2021-12-22 FUJIFILM Electronic Materials U.S.A, Inc. Barrier ruthenium chemical mechanical polishing slurry
CN109233644B (en) * 2018-09-19 2021-03-12 广州亦盛环保科技有限公司 Fine polishing solution and preparation method thereof

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010051746A1 (en) * 2000-04-28 2001-12-13 Toshiya Hagihara Roll-off reducing agent
WO2002006418A1 (en) * 2000-07-19 2002-01-24 Kao Corporation Polishing fluid composition
US20030041526A1 (en) * 2001-06-21 2003-03-06 Shigeo Fujii Polishing composition
GB2393186A (en) * 2002-07-31 2004-03-24 Kao Corp Polishing composition
GB2393447A (en) * 2002-08-07 2004-03-31 Kao Corp Polishing composition

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5693239A (en) * 1995-10-10 1997-12-02 Rodel, Inc. Polishing slurries comprising two abrasive components and methods for their use
JP3507628B2 (en) * 1996-08-06 2004-03-15 昭和電工株式会社 Polishing composition for chemical mechanical polishing
KR19980019046A (en) * 1996-08-29 1998-06-05 고사이 아키오 Abrasive composition and use of the same
WO2000032712A1 (en) * 1998-11-27 2000-06-08 Kao Corporation Abrasive fluid compositions
JP4053165B2 (en) * 1998-12-01 2008-02-27 株式会社フジミインコーポレーテッド Polishing composition and polishing method using the same
AU2225301A (en) * 1999-12-27 2001-07-09 Showa Denko Kabushiki Kaisha Alumina particles, method for producing the same, composition comprising the same, and alumina slurry for polishing
TW572979B (en) * 2000-02-02 2004-01-21 Rodel Inc Polishing composition
US6261476B1 (en) * 2000-03-21 2001-07-17 Praxair S. T. Technology, Inc. Hybrid polishing slurry
US6569215B2 (en) * 2000-04-17 2003-05-27 Showa Denko Kabushiki Kaisha Composition for polishing magnetic disk substrate
US6468913B1 (en) * 2000-07-08 2002-10-22 Arch Specialty Chemicals, Inc. Ready-to-use stable chemical-mechanical polishing slurries
JP4009986B2 (en) * 2000-11-29 2007-11-21 株式会社フジミインコーポレーテッド Polishing composition and polishing method for polishing memory hard disk using the same
CN1191530C (en) * 2001-01-18 2005-03-02 深圳市中兴集成电路设计有限责任公司 PCI bridge with improved structure
JP4231632B2 (en) * 2001-04-27 2009-03-04 花王株式会社 Polishing liquid composition

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010051746A1 (en) * 2000-04-28 2001-12-13 Toshiya Hagihara Roll-off reducing agent
WO2002006418A1 (en) * 2000-07-19 2002-01-24 Kao Corporation Polishing fluid composition
US20030041526A1 (en) * 2001-06-21 2003-03-06 Shigeo Fujii Polishing composition
GB2393186A (en) * 2002-07-31 2004-03-24 Kao Corp Polishing composition
GB2393447A (en) * 2002-08-07 2004-03-31 Kao Corp Polishing composition

Also Published As

Publication number Publication date
JP4339034B2 (en) 2009-10-07
CN1320078C (en) 2007-06-06
GB0413699D0 (en) 2004-07-21
JP2005023266A (en) 2005-01-27
GB2403725A (en) 2005-01-12
CN1576346A (en) 2005-02-09
MY139074A (en) 2009-08-28
TW200513522A (en) 2005-04-16
TWI323279B (en) 2010-04-11
US20050003746A1 (en) 2005-01-06
US20050132660A1 (en) 2005-06-23

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20120618