TW200517479A - Polishing composition for magnetic disk - Google Patents

Polishing composition for magnetic disk

Info

Publication number
TW200517479A
TW200517479A TW093121651A TW93121651A TW200517479A TW 200517479 A TW200517479 A TW 200517479A TW 093121651 A TW093121651 A TW 093121651A TW 93121651 A TW93121651 A TW 93121651A TW 200517479 A TW200517479 A TW 200517479A
Authority
TW
Taiwan
Prior art keywords
polishing composition
magnetic disk
substrate
polishing
polished
Prior art date
Application number
TW093121651A
Other languages
Chinese (zh)
Other versions
TWI343943B (en
Inventor
Hiroaki Kitayama
Shigeo Fujii
Original Assignee
Kao Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kao Corp filed Critical Kao Corp
Publication of TW200517479A publication Critical patent/TW200517479A/en
Application granted granted Critical
Publication of TWI343943B publication Critical patent/TWI343943B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

A polishing composition for a magnetic disk, comprising alumina, water, a peroxide and an organic acid; a polishing process for a substrate to be polished, comprising the step of polishing the substrate to be polished with the polishing composition; and a process for manufacturing a substrate, comprising the step of polishing a substrate to be polished with the polishing composition. The polishing composition can be suitably used for the manufacture of a magnetic disk substrate for high-quality hard disks and the like.
TW093121651A 2003-08-08 2004-07-20 Polishing composition for magnetic disk TWI343943B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003290690A JP4206313B2 (en) 2003-08-08 2003-08-08 Polishing liquid composition for magnetic disk

Publications (2)

Publication Number Publication Date
TW200517479A true TW200517479A (en) 2005-06-01
TWI343943B TWI343943B (en) 2011-06-21

Family

ID=32906131

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093121651A TWI343943B (en) 2003-08-08 2004-07-20 Polishing composition for magnetic disk

Country Status (6)

Country Link
US (2) US20050032463A1 (en)
JP (1) JP4206313B2 (en)
CN (1) CN100460478C (en)
GB (1) GB2404921B (en)
MY (1) MY139590A (en)
TW (1) TWI343943B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI506621B (en) * 2005-12-22 2015-11-01 Kao Corp Polishing composition for hard disk substrate
US8247326B2 (en) 2008-07-10 2012-08-21 Cabot Microelectronics Corporation Method of polishing nickel-phosphorous
US9039914B2 (en) 2012-05-23 2015-05-26 Cabot Microelectronics Corporation Polishing composition for nickel-phosphorous-coated memory disks
JP6366308B2 (en) * 2014-03-12 2018-08-01 株式会社ディスコ Processing method
US10144850B2 (en) * 2015-09-25 2018-12-04 Versum Materials Us, Llc Stop-on silicon containing layer additive

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6039891A (en) * 1996-09-24 2000-03-21 Cabot Corporation Multi-oxidizer precursor for chemical mechanical polishing
US5958288A (en) * 1996-11-26 1999-09-28 Cabot Corporation Composition and slurry useful for metal CMP
US6149696A (en) * 1997-11-06 2000-11-21 Komag, Inc. Colloidal silica slurry for NiP plated disk polishing
US6569216B1 (en) * 1998-11-27 2003-05-27 Kao Corporation Abrasive fluid compositions
JP2000212776A (en) * 1999-01-18 2000-08-02 Jsr Corp Aqueous dispersion for mechanochemical polishing
KR20010087485A (en) * 2000-03-07 2001-09-21 김순택 Method for driving plasma display panel
US6569215B2 (en) * 2000-04-17 2003-05-27 Showa Denko Kabushiki Kaisha Composition for polishing magnetic disk substrate
US6976905B1 (en) * 2000-06-16 2005-12-20 Cabot Microelectronics Corporation Method for polishing a memory or rigid disk with a phosphate ion-containing polishing system
JP4009986B2 (en) * 2000-11-29 2007-11-21 株式会社フジミインコーポレーテッド Polishing composition and polishing method for polishing memory hard disk using the same
EP1211024A3 (en) * 2000-11-30 2004-01-02 JSR Corporation Polishing method
JP4231632B2 (en) * 2001-04-27 2009-03-04 花王株式会社 Polishing liquid composition
MY144587A (en) * 2001-06-21 2011-10-14 Kao Corp Polishing composition
MY133305A (en) * 2001-08-21 2007-11-30 Kao Corp Polishing composition
JP2003151928A (en) * 2001-11-12 2003-05-23 Sumitomo Bakelite Co Ltd Polishing composition
KR100449614B1 (en) * 2001-12-28 2004-09-22 제일모직주식회사 Slurry composition of low erosion for chemical mechanical polishing of metal lines
JP2003218071A (en) * 2002-01-28 2003-07-31 Sumitomo Bakelite Co Ltd Composition for polishing
US7147682B2 (en) * 2002-12-26 2006-12-12 Kao Corporation Polishing composition

Also Published As

Publication number Publication date
US20050136807A1 (en) 2005-06-23
GB2404921A (en) 2005-02-16
JP4206313B2 (en) 2009-01-07
US20050032463A1 (en) 2005-02-10
TWI343943B (en) 2011-06-21
JP2005063531A (en) 2005-03-10
GB2404921B (en) 2007-09-12
MY139590A (en) 2009-10-30
GB0415976D0 (en) 2004-08-18
CN100460478C (en) 2009-02-11
CN1580173A (en) 2005-02-16

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