FR2894953B1 - Systeme micro-electromecanique comprenant une partie deformable et un detecteur de contrainte - Google Patents

Systeme micro-electromecanique comprenant une partie deformable et un detecteur de contrainte

Info

Publication number
FR2894953B1
FR2894953B1 FR0512740A FR0512740A FR2894953B1 FR 2894953 B1 FR2894953 B1 FR 2894953B1 FR 0512740 A FR0512740 A FR 0512740A FR 0512740 A FR0512740 A FR 0512740A FR 2894953 B1 FR2894953 B1 FR 2894953B1
Authority
FR
France
Prior art keywords
microelectromechanical system
deformable part
stress detector
stress
detector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0512740A
Other languages
English (en)
Other versions
FR2894953A1 (fr
Inventor
Alistair Rowe
Christoph Renner
Steve Arscott
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ecole Polytechnique
Original Assignee
Ecole Polytechnique
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ecole Polytechnique filed Critical Ecole Polytechnique
Priority to FR0512740A priority Critical patent/FR2894953B1/fr
Priority to JP2008545040A priority patent/JP2009519454A/ja
Priority to US12/096,314 priority patent/US20090301176A1/en
Priority to PCT/FR2006/002713 priority patent/WO2007080259A1/fr
Priority to EP06841917A priority patent/EP1960307A1/fr
Publication of FR2894953A1 publication Critical patent/FR2894953A1/fr
Application granted granted Critical
Publication of FR2894953B1 publication Critical patent/FR2894953B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01LMEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L1/00Measuring force or stress, in general
    • G01L1/20Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
    • G01L1/22Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
    • G01L1/2287Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges constructional details of the strain gauges
    • G01L1/2293Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges constructional details of the strain gauges of the semi-conductor type
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y35/00Methods or apparatus for measurement or analysis of nanostructures
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01LMEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L9/00Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
    • G01L9/0041Transmitting or indicating the displacement of flexible diaphragms
    • G01L9/0051Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance
    • G01L9/0052Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance of piezoresistive elements
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P15/12Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by alteration of electrical resistance
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01QSCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q20/00Monitoring the movement or position of the probe
    • G01Q20/04Self-detecting probes, i.e. wherein the probe itself generates a signal representative of its position, e.g. piezoelectric gauge
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01QSCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/24AFM [Atomic Force Microscopy] or apparatus therefor, e.g. AFM probes
    • G01Q60/38Probes, their manufacture, or their related instrumentation, e.g. holders
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P2015/0805Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration
    • G01P2015/0822Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass
    • G01P2015/0825Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass for one single degree of freedom of movement of the mass
    • G01P2015/0828Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass for one single degree of freedom of movement of the mass the mass being of the paddle type being suspended at one of its longitudinal ends

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Radiology & Medical Imaging (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Micromachines (AREA)
  • Measurement Of Force In General (AREA)
FR0512740A 2005-12-15 2005-12-15 Systeme micro-electromecanique comprenant une partie deformable et un detecteur de contrainte Expired - Fee Related FR2894953B1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
FR0512740A FR2894953B1 (fr) 2005-12-15 2005-12-15 Systeme micro-electromecanique comprenant une partie deformable et un detecteur de contrainte
JP2008545040A JP2009519454A (ja) 2005-12-15 2006-12-12 変形可能な部分および応力センサを備えるマイクロ電気機械システム
US12/096,314 US20090301176A1 (en) 2005-12-15 2006-12-12 Microelectromechanical System Comprising a Deformable Portion and a Stress Sensor
PCT/FR2006/002713 WO2007080259A1 (fr) 2005-12-15 2006-12-12 Systeme micro-electromecanique comprenant une partie deformable et un detecteur de contrainte
EP06841917A EP1960307A1 (fr) 2005-12-15 2006-12-12 Systeme micro-electromecanique comprenant une partie deformable et un detecteur de contrainte

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0512740A FR2894953B1 (fr) 2005-12-15 2005-12-15 Systeme micro-electromecanique comprenant une partie deformable et un detecteur de contrainte

Publications (2)

Publication Number Publication Date
FR2894953A1 FR2894953A1 (fr) 2007-06-22
FR2894953B1 true FR2894953B1 (fr) 2008-03-07

Family

ID=36910789

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0512740A Expired - Fee Related FR2894953B1 (fr) 2005-12-15 2005-12-15 Systeme micro-electromecanique comprenant une partie deformable et un detecteur de contrainte

Country Status (5)

Country Link
US (1) US20090301176A1 (fr)
EP (1) EP1960307A1 (fr)
JP (1) JP2009519454A (fr)
FR (1) FR2894953B1 (fr)
WO (1) WO2007080259A1 (fr)

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EP2131169A1 (fr) 2008-06-05 2009-12-09 Ecole Polytechnique Capteur de contrainte à facteur de jauge élevé
JP5595721B2 (ja) * 2009-12-24 2014-09-24 アンリツ産機システム株式会社
US9403671B2 (en) 2011-06-30 2016-08-02 Hewlett-Packard Development Company, L.P. Calibration of MEMS sensor
US20130047710A1 (en) * 2011-08-26 2013-02-28 Purdue Research Foundation Nonlinear, bifurcation-based mass sensor
US9105492B2 (en) * 2012-05-08 2015-08-11 LuxVue Technology Corporation Compliant micro device transfer head
US8415768B1 (en) 2012-07-06 2013-04-09 LuxVue Technology Corporation Compliant monopolar micro device transfer head with silicon electrode
US8791530B2 (en) * 2012-09-06 2014-07-29 LuxVue Technology Corporation Compliant micro device transfer head with integrated electrode leads
US9236815B2 (en) 2012-12-10 2016-01-12 LuxVue Technology Corporation Compliant micro device transfer head array with metal electrodes
KR101737717B1 (ko) 2012-12-13 2017-05-29 애플 인크. 주사 미러의 고장 검출
US20160329173A1 (en) 2013-06-12 2016-11-10 Rohinni, LLC Keyboard backlighting with deposited light-generating sources
US9716446B2 (en) 2013-07-05 2017-07-25 Texas Instruments Incorporated Self-powered piezoelectric energy harvesting microsystem
US10225629B2 (en) * 2013-11-25 2019-03-05 Chi Hung Louis Lam System for monitoring condition of adjustable construction temporary supports
CN108770368B (zh) 2016-01-15 2022-04-12 罗茵尼公司 透过设备上的罩盖进行背光照明的设备和方法
KR101682141B1 (ko) * 2016-03-16 2016-12-02 부산대학교 산학협력단 온도 및 압력 동시 측정용 시편과 그의 제조 방법
US10866203B2 (en) 2016-03-31 2020-12-15 Kyocera Corporation Stress sensor
JP6882849B2 (ja) * 2016-03-31 2021-06-02 京セラ株式会社 応力センサ
JP6908355B2 (ja) * 2016-03-31 2021-07-28 京セラ株式会社 応力センサ
JP2017181434A (ja) * 2016-03-31 2017-10-05 京セラ株式会社 応力センサ
JP6694747B2 (ja) * 2016-03-31 2020-05-20 京セラ株式会社 応力センサ及びその製造方法
WO2019031381A1 (fr) * 2017-08-10 2019-02-14 株式会社村田製作所 Capteur de contrainte et son procédé de fabrication
CN117387819B (zh) * 2023-12-11 2024-04-09 国科大杭州高等研究院 微推力测量装置

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US3525262A (en) * 1969-02-05 1970-08-25 Ford Motor Co Electric pressure gauge
US4317126A (en) * 1980-04-14 1982-02-23 Motorola, Inc. Silicon pressure sensor
JPH0337534A (ja) * 1989-07-05 1991-02-18 Nissan Motor Co Ltd 半導体歪検出装置
JP3323032B2 (ja) * 1995-06-07 2002-09-09 三菱電機株式会社 半導体圧力検出装置の設計方法
JPH11304618A (ja) * 1998-04-23 1999-11-05 Matsushita Electric Works Ltd 半導体歪みセンサ
JPH11326350A (ja) * 1998-05-13 1999-11-26 Canon Inc カンチレバー型プローブ、それによって構成したマルチ化プローブおよび走査型プローブ顕微鏡
JP2001013017A (ja) * 1999-06-28 2001-01-19 Matsushita Electric Ind Co Ltd 荷重検出器
EP1226437B1 (fr) * 1999-11-03 2004-08-11 International Business Machines Corporation Capteurs cantilever et transducteurs
US7082838B2 (en) * 2000-08-31 2006-08-01 Tdk Corporation Extraordinary piezoconductance in inhomogeneous semiconductors
JP4598307B2 (ja) * 2001-05-31 2010-12-15 エスアイアイ・ナノテクノロジー株式会社 自己検知型spmプローブ
WO2004017063A2 (fr) * 2002-07-19 2004-02-26 Siemens Aktiengesellschaft Dispositif et procede pour detecter une substance
JP2004198280A (ja) * 2002-12-19 2004-07-15 Hitachi Metals Ltd 加速度センサ
EP1692457A4 (fr) * 2003-12-11 2007-09-26 Proteus Biomedical Inc Capteurs de pression implantables
JP2005221233A (ja) * 2004-02-03 2005-08-18 Citizen Watch Co Ltd 電気機械変換器とその製造方法

Also Published As

Publication number Publication date
WO2007080259A1 (fr) 2007-07-19
EP1960307A1 (fr) 2008-08-27
US20090301176A1 (en) 2009-12-10
FR2894953A1 (fr) 2007-06-22
JP2009519454A (ja) 2009-05-14

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Effective date: 20110831